METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
According to one embodiment, a method of manufacturing a semiconductor device comprises forming an oxide semiconductor layer, forming a gate insulating layer in contact with the oxide semiconductor layer and covering the oxide semiconductor layer, and forming a gate electrode on the gate insulating layer so as to overlap the oxide semiconductor layer, and injecting boron through the gate electrode and the gate insulating layer after forming the gate electrode, wherein a boron concentration included in a region of the gate insulating layer overlapping the gate electrode is in a range of 1E+16 [atoms/cm 3 ] or more.
1 . A method of manufacturing a semiconductor device comprising:
forming an oxide semiconductor layer;
forming a gate insulating layer in contact with the oxide semiconductor layer and covering the oxide semiconductor layer;
forming a gate electrode on the gate insulating layer so as to overlap the oxide semiconductor layer; and
injecting boron through the gate electrode and the gate insulating layer after forming the gate electrode, wherein
a boron concentration included in a region of the gate insulating layer overlapping the gate electrode is in a range of 1E+16 [atoms/cm 3 ] or more.
2 . The method of manufacturing a semiconductor device according to claim 1 , wherein the gate insulating layer is a silicon oxide film.
3 . The method of manufacturing a semiconductor device according to claim 1 , wherein an applied voltage at injecting the boron is in a range of 30 keV or more and 40 keV or less.
4 . A method of manufacturing a semiconductor device comprising:
forming a first insulating layer;
injecting boron into the first insulating layer;
forming an oxide semiconductor layer in contact with the first insulating layer into which the boron is injected;
forming a second insulating layer in contact with the oxide semiconductor layer and covering the first insulating layer and the oxide semiconductor layer;
injecting boron into the second insulating layer; and
forming a gate electrode on the second insulating layer into which the boron is injected, the gate electrode being overlapping the oxide semiconductor layer, wherein
a boron concentration included in the first insulating layer and the second insulating layer is in a range of 1E+16 [atoms/cm 3 ] or more.
5 . The method of manufacturing a semiconductor device according to claim 4 , wherein the first insulating layer and the second insulating layer are a silicon oxide film.
6 . The method of manufacturing a semiconductor device according to claim 4 , wherein an applied voltage at which the boron is injected is in a range of 30 keV or more and 40 keV or less.
7 . A method of manufacturing a semiconductor device comprising:
forming a gate electrode;
forming a first insulating layer covering the gate electrode;
injecting boron into the first insulating layer;
forming an oxide semiconductor layer in contact with the first insulating layer into which the boron is injected;
forming a source electrode and a drain electrode overlapping a part of the oxide semiconductor layer;
forming a second insulating layer in contact with the oxide semiconductor layer and covering the oxide semiconductor layer, the source electrode, and the drain electrode; and
injecting boron into the second insulating layer, wherein
a boron concentration included in the first insulating layer and the second insulating layer is in a range of 1E+16 [atoms/cm 3 ] or more.
8 . The method of manufacturing a semiconductor device according to claim 7 , wherein the first insulating layer and the second insulating layer are a silicon oxide film.
9 . The method of manufacturing a semiconductor device according to claim 7 , wherein an applied voltage at which injecting the boron is in a range of 30 keV or more and 40 keV or less.