ACIDIC CIP COMPOSITIONS
An aqueous acidic CIP composition comprising: an acidic component; a surfactant; and an organic solvent; wherein said composition has an advancing contact angle (θ A ) of less than 80 degrees and a receding contact angle (θ R ) of less than 20 degrees.
1 . An aqueous acidic composition comprising:
an acidic component;
a surfactant; and
an organic solvent;
wherein said composition has an advancing contact angle (θ A ) of less than 80 degrees and a receding contact angle (θ R ) of less than 20 degrees.
2 . A composition according to claim 1 wherein said composition has a surface tension (SFT) when measured using a Wilhelmy plate with a tensiometer of less than 40 mN/m.
3 . A composition according to claim 1 wherein said acidic component is selected from the group consisting of: alkanolamine-HCl; amino acid-HCl; and HCl, as well as combinations thereof.
4 . A composition according to claim 3 wherein said alkanolamine is selected from the group consisting of: monoethanolamine; diethanolamine; triethanolamine; and combinations thereof.
5 . A composition according to claim 4 wherein said alkanolamine is monoethanolamine.
6 . A composition according to claim 3 wherein said amino acid is selected from the group consisting of: lysine; arginine; histidine; and combinations thereof.
7 . A composition according to claim 3 wherein said amino acid is selected from the group consisting of: lysine; a hydrate of lysine; and a salt of lysine.
8 . A composition according to claim 1 wherein said acidic component is present in an amount ranging from 70 to 100 weight % of the total weight of the composition.
9 . A composition according to claim 1 wherein said acidic component is present in an amount ranging from 90 to 100 weight % of the total weight of the composition.
10 . A composition according to claim 1 wherein said surfactant is present in a concentration ranging from 1 to 20 weight % of the total weight of the composition.
11 . A composition according to claim 1 wherein said surfactant is present in a concentration ranging from 1 to 5 weight % of the total weight of the composition.
12 . A composition according to claim 1 wherein said surfactant is a low foaming non-ionic surfactant selected from the group consisting of: methyl ether; and C12-15 pareth-12 a polyethylene glycol ether; and combinations thereof.
13 . The composition according to claim 1 wherein said the surfactant comprises a Guerbet alcohol.
14 . The composition according to claim 1 wherein said surfactant is selected from the group consisting of: Plurafac® D250; Plurafac® LF 431; Lutensol® XL80; Lutensol® XP80; and combinations thereof.
15 . The composition according to claim 1 wherein said surfactant is Plurafac D250.
16 . The composition according to claim 1 wherein said an organic solvent selected from the group consisting of: ethylene glycol monoalkyl ether; ethylene glycol monoaryl ether; diethylene glycol monoalkyl ether; diethylene glycol monoaryl ether; and propylene glycol methyl ether and combinations thereof.
17 . The composition according to claim 1 wherein said organic solvent selected from the group consisting of: ethylene glycol monomethyl ether; ethylene glycol monoethyl ether; ethylene glycol monopropyl ether; ethylene glycol monoisopropyl ether; ethylene glycol monobutyl ether; ethylene glycol monophenyl ether; ethylene glycol monobenzyl ether; propylene glycol methyl ether; diethylene glycol monomethyl ether (Methyl Carbitol™); diethylene glycol monoethyl ether (Carbitol™ Cellosolve™); diethylene glycol mono-n-butyl ether (Butyl Carbitol™); dipropyleneglycol; and combinations thereof.
18 . A process for removing a residue from a substrate, comprising the steps of:
preparing a diluted cleaning solution, said diluted cleaning solution made by adding water to a concentrated cleaning solution so that the amount of acid contained in said diluted solution ranges from about 0.05% to about 5% by weight of said cleaning solution, said concentrated cleaning solution comprising:
an acidic component;
a surfactant; and
an organic solvent; and
water;
wherein said composition has an advancing contact angle (θ A ) of less than 80 degrees and a receding contact angle (θ R ) of less than 20 degrees,
applying said diluted cleaning solution to the residue; and
removing said residue by rinsing with a fluid.
19 . Use of an aqueous acidic composition for the removal of organic contaminants residue from a substrate, said aqueous acidic composition comprising:
an acidic component;
a surfactant; and
an organic solvent;
wherein said composition has an advancing contact angle (θ A ) of less than 80 degrees and a receding contact angle (θ R ) of less than 20 degrees.