Surface treatment of solar cells
Methods of fabricating emitter regions of solar cells using surface treatments, and the resulting solar cells, are described herein. In an example, a method of fabricating a solar cell includes treating a surface of a silicon substrate to form a lyophilic area between two lyophobic areas and depositing a liquid phase material containing a silicon material in the lyophilic area to form an emitter region.
1 . A solar cell fabricated according to a method, the method comprising:
treating a surface of a silicon substrate to form a lyophilic area between a first lyophobic area and a second lyophobic area;
subsequent to treating the surface of the silicon substrate to form the lyophilic area, depositing a liquid phase material on the surface in the lyophilic area to form an emitter region between the first lyophobic area and the second lyophobic area, wherein the liquid phase material does not form on the first and second lyophobic areas during the depositing; and
subsequent to forming the emitter region, forming a self-aligned dielectric on a surface of the emitter region, wherein the self-aligned dielectric forms only on the surface of the emitter region.
2 . The solar cell of claim 1 , wherein treating the surface to form the first lyophobic area and the second lyophobic area includes forming an oxide layer.
3 . The solar cell of claim 2 , wherein treating the surface to form the first lyophobic area and the second lyophobic area includes:
hydrogenating the surface; and
exposing the hydrogenated surface to an oxygen-containing atmosphere.
4 . The solar cell of claim 2 , wherein forming the oxide layer comprises using oxidation by energy supplied from UV-radiation or laser irradiation.
5 . The solar cell of claim 1 , wherein the liquid phase material includes one or more of a silane polymer or silicon nano-particles.
6 . The solar cell of claim 1 , wherein the surface of the silicon substrate is a surface of a silicon layer on a silicon oxide layer on a silicon wafer.
7 . The solar cell of claim 1 , wherein the surface of the silicon substrate is a surface of a monocrystalline silicon substrate.
8 . A solar cell fabricated according to a method, the method comprising:
treating a lyophilic surface of a silicon substrate to provide a lyophilic area between a first lyophobic area and a second lyophobic area;
subsequent to treating the surface of the silicon substrate to form the lyophilic area, depositing a liquid phase material on the surface in the lyophilic area to form an emitter region between the first lyophobic area and the second lyophobic area, wherein the liquid phase material does not form on the first and second lyophobic areas during the depositing; and
subsequent to forming the emitter region, forming a self-aligned dielectric on a surface of the emitter region, wherein the self-aligned dielectric forms only on the surface of the emitter region.
9 . The solar cell of claim 8 , wherein treating the lyophilic surface to form the first lyophobic area and the second lyophobic area includes forming an oxide layer.
10 . The solar cell of claim 9 , wherein treating the lyophilic surface to form the first lyophobic area and the second lyophobic area includes:
hydrogenating the lyophilic surface; and
exposing the hydrogenated surface to an oxygen-containing atmosphere.
11 . The solar cell of claim 9 , wherein forming the oxide layer comprises using oxidation by energy supplied from UV-radiation or laser irradiation.
12 . The solar cell of claim 8 , wherein the liquid phase material includes one or more of a silane polymer or silicon nano-particles.
13 . The solar cell of claim 8 , wherein the lyophilic surface of the silicon substrate is a surface of a silicon layer on a silicon oxide layer on a silicon wafer.
14 . The solar cell of claim 8 , wherein the lyophilic surface of the silicon substrate is a surface of a monocrystalline silicon substrate.