Leached superabrasive elements and systems, methods and assemblies for processing superabrasive materials
Superabrasive elements may be produced by method includes providing a superabrasive element including a polycrystalline diamond table that includes a metallic material disposed in interstitial spaces defined within the polycrystalline diamond table. The polycrystalline diamond table includes a superabrasive face and a superabrasive side surface extending around an outer periphery of the superabrasive face. The method also includes leaching the metallic material from at least a volume of the polycrystalline diamond table to produce a leached volume in the polycrystalline diamond table by (1) exposing at least a portion of the polycrystalline diamond table to a processing solution, (2) exposing an electrode to the processing solution, and (3) applying a charge to the electrode.
1. A superabrasive element produced by a process comprising:
producing a leached volume in a polycrystalline diamond table of the superabrasive element, the polycrystalline diamond table comprising a metallic material disposed in interstitial spaces defined within the polycrystalline diamond table, the producing the leached volume comprising:
exposing at least a portion of the polycrystalline diamond table to a processing solution;
exposing an electrode to the processing solution;
applying a charge to the electrode to generate a voltage between the polycrystalline diamond table and the electrode via the processing solution;
leaching the metallic material from a portion of the polycrystalline diamond table to a first depth relative to a superabrasive face of the superabrasive element; and
leaching the metallic material from an external side region of the polycrystalline diamond table to a second depth relative to the superabrasive face of the superabrasive element, the second depth being greater than the first depth.
2. The superabrasive element of claim 1 , the process further comprising positioning the electrode relatively closer in proximity to the external side region of the superabrasive element than a central portion of the superabrasive face of the superabrasive element.
3. The superabrasive element of claim 2 , wherein the electrode comprises a ring shape.
4. The superabrasive element of claim 1 , the process further comprising surrounding at least a portion of the superabrasive element with a protective layer.
5. The superabrasive element of claim 4 , further comprising a substrate attached to the polycrystalline diamond table, the process further comprising surrounding at least the substrate with the protective layer.
6. The superabrasive element of claim 4 , the process further comprising contacting a portion of the polycrystalline diamond table with the protective layer.
7. The superabrasive element of claim 6 , the process further comprising contacting a portion of the external side region of the polycrystalline diamond table with the protective layer to form a seal between the protective layer and the superabrasive element.
8. The superabrasive element of claim 1 , the process further comprising disposing the superabrasive element in a processing vessel.
9. The superabrasive element of claim 1 , the process further comprising disposing the electrode near at least one of the superabrasive face and the external side region, wherein the electrode does not directly contact the superabrasive face or the external side region.
10. The superabrasive element of claim 9 , the process further comprising disposing the electrode in closer proximity to the external side region than to a central portion of the superabrasive face.
11. The superabrasive element of claim 1 , the process further comprising leaching the metallic material from the external side region of the polycrystalline diamond table to a third depth relative to a side surface of the superabrasive element, the third depth being greater than the first depth.
12. The superabrasive element of claim 1 , the process further comprising selecting the processing solution to exhibit a pH below approximately 1.