Extreme large grain (1 mm) lateral growth of Cd(Se,Te) alloy thin films by reactive anneals
Disclosed herein are compositions and methods for making polycrystalline thin films having very large grains sizes and exhibiting improved properties over existing thin films.
1. A method for making at least one polycrystalline CdSe x Te 1-x alloy film, comprising growing at least one CdSe x Te 1-x alloy film by liquid phase enhanced grain growth, wherein:
0≤x≤1,
the CdSe x Te 1-x alloy film comprises individual grains of about 100 um to about 1000 um in length and/or width, and
a median grain-size to thickness ratio of the film is greater than 10.
2. The method of claim 1 wherein the alloy film has a thickness of from about 0.5 to about 10 μm.
3. The method of claim 1 further comprising the step of depositing an interfacial layer upon a substrate wherein the surface energy of the interfacial layer is greater than the surface energy of the CdSe x Te 1-x alloy film, where 0≤x≤1.
4. The method of claim 3 wherein the surface energy of the interfacial layer is greater than 65 erg/cm 2 upon the substrate.
5. The method of claim 3 wherein the surface energy of the interfacial layer is greater than 200 erg/cm 2 upon the substrate.
6. The method of claim 3 wherein the interfacial layer comprises Al 2 O 3 , MgZnO, or SnO 2 .
7. The method of claim 3 wherein the interfacial layer has a thickness of from about 0.1 nm to about 100 nm.
8. The method of claim 3 further comprising depositing a polycrystalline film of CdSe x Te 1-x alloy, where 0≤x≤1, onto the interfacial layer.
9. The method of claim 8 wherein the alloy film composition is CdSe x Te 1-x where 0≤x≤0.1.
10. The method of claim 3 further comprising annealing the polycrystalline CdSe x Te 1-x alloy film, where 0≤x≤1, in an atmosphere comprising a material with a melting point of from about 220° C. to about 450° C., and a liquid phase surface energy of from about 115 erg/cm 2 to about 240 erg/cm 2 with the CdSe x Te 1-x alloy film, where 0≤x≤1.
11. The method of claim 10 wherein the atmosphere comprises an over-pressure of Se, Te, or a mixture of Se and Te such that Se, Te, or the Se and Te mixture diffuses into the polycrystalline film of CdSe x Te 1-x alloy film, where 0≤x≤1, and reduces Se, Te, or the mixture of Se and Te loss during the annealing compared to the atmosphere without an over-pressure of Se, Te, or a mixture of Se and Te.
12. The method of claim 10 wherein the annealing occurs in a blackbody environment between two graphite plates.
13. The method of claim 10 wherein the material forms liquid phases with melting temperatures between about 220° C. to about 450° C. and surface energies of about 115 ergs/cm 2 to about 240 ergs/cm 2 with the CdSe x Te 1-x alloy film, where 0≤x≤0.4.
14. The method of claim 10 wherein the temperature of the polycrystalline film is higher than the temperature of the material.
15. The method of claim 14 wherein the temperature of the polycrystalline film of CdSe x Te 1-x alloy, where 0≤x≤1, is from about 500 to about 650° C.
16. The method of claim 14 further comprising the deposition of at least one CdTe layer onto the annealed polycrystalline film of CdSe x Te 1-x alloy, where 0≤x≤1.
17. The method of claim 14 wherein the median grain size of the annealed polycrystalline film of CdSe x Te 1-x alloy, where 0≤x≤1, is greater than 500 μm in length or width.
18. The method of claim 14 wherein the median grain-size to thickness ratio of the film is greater than 100.
19. A photovoltaic device comprising a polycrystalline alloy film made by the method of claim 1 .
20. A polycrystalline CdSe x Te 1-x alloy film, where 0≤x≤1, comprising individual grains of about 100 μm to about 1000 μm in length or width.