IP Library Granted Patent US 12,477,900
Granted Patent B2
US 12,477,900 · App. 17/640,023 · Granted Nov 18, 2025

Mask plate, display substrate and manufacturing method thereof, and display device

Inventors: Zhe Xu (Beijing, CN); Wenxuan Zhang (Beijing, CN); Fei You (Beijing, CN); Fei Liao (Beijing, CN); Ce Li (Beijing, CN); Long Jiang (Beijing, CN)
Assignees: Chengdu BOE Optoelectronics Technology Co., Ltd.; Beijing BOE Technology Development Co., Ltd.
H10K59/122C23C14/042G03F1/26H10K59/1201H10K71/00
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Quick Facts
Patent No.
US 12,477,900
App. No.
17/640,023
Granted
Nov 18, 2025
Kind
B2
Abstract

A mask plate is used for manufacturing a pixel definition layer of the display substrate, which includes first transparent patterns and first opaque patterns, and further includes transition structures located between the first transparent patterns and the first opaque patterns. And the transition structures include a plurality of second transparent patterns and second opaque patterns alternately arranged, and a line width of each of the second transparent patterns and each of the second opaque patterns is less than the resolution of an exposure machine by using the mask plate for exposure.

Claims (20)

1 . A mask plate, wherein the mask plate is used for manufacturing a pixel definition layer of a display substrate, which comprises first transparent patterns and first opaque patterns, and further comprises transition structures located between the first transparent patterns and the first opaque patterns, wherein the transition structures include a plurality of second transparent patterns and second opaque patterns alternately arranged, and a line width of each of the second transparent patterns and each of the second opaque patterns is less than a resolution of an exposure machine by using the mask plate for exposure;

wherein the transition structures include a second transition structure, the first opaque patterns surround the first transparent patterns, the first transparent patterns have a rectangular shape, and include the first edge, the second edge, the third edge, and the fourth edge which are successively connected end-to-end in sequence, wherein the second transition structures are respectively arranged between the second edge and the fourth edge and the first opaque patterns, and the transition structures are not arranged between the first edge and the third edge and the first opaque patterns.

2 . The mask plate according to claim 1 , wherein the first opaque patterns have the same shape as an upper surface of the pixel definition layer, the first transparent patterns have the same shape as a pixel opening region defined by the pixel definition layer, and the transition structures have the same shape as an orthographic projection of the side surface of the pixel definition layer on the display substrate.

3 . The mask plate according to claim 2 , wherein the line width of the second transparent patterns gradually increases from the first opaque patterns to the first transparent patterns.

4 . The mask plate according to claim 1 , wherein the first transparent patterns have the same shape as the upper surface of the pixel definition layer, the first opaque patterns have the same shape as the pixel opening region defined by the pixel definition layer, and the transition structures have the same shape as the orthographic projection of the side surface of the pixel definition layer on the display substrate.

5 . The mask plate according to claim 1 , wherein the first opaque patterns surround the first transparent patterns, and the transition structures between part of the edges and the first opaque patterns in the plurality of edges of the first transparent patterns are the second opaque patterns or the second transparent patterns.

6 . The mask plate according to claim 5 , wherein the first opaque patterns surround the first transparent patterns, the first transparent patterns have a rectangular shape and include a first edge, a second edge, a third edge, and a fourth edge which are connected end-to-end in sequence, wherein the transition structures between the second edge and the fourth edge and the first opaque patterns are the opaque patterns or the transparent patterns.

7 . The mask plate according to claim 1 , wherein the transition structures include a number of three to five second transparent patterns and a number of three to five second opaque patterns.

8 . The mask plate according to claim 1 , wherein a line width of each of the second transparent patterns and each of the second opaque patterns is less than 2.5 μm.

9 . A method for manufacturing a display substrate, comprising:

forming a material layer of a photosensitive pixel definition layer on a driving substrate;

exposing the material layer of the pixel definition layer by using the mask plate as claimed in claim 1 , and

forming the pattern of the pixel definition layer after developing.

10 . A display substrate, wherein a pixel definition layer of the display substrate is obtained by patterning a material layer of the pixel definition layer using the mask plate as claimed in claim 1 .

11 . The display substrate according to claim 10 , wherein a slope angle of the pattern of the pixel definition layer is less than 20°.

12 . The display substrate according to claim 10 , wherein the pixel definition layer of the display substrate defines a pixel opening region.

13 . The display substrate according to claim 10 , wherein the pixel opening region has a rectangular shape, and the pattern of the pixel definition layer comprises a first side surface, a second side surface, a third side surface, and a fourth side surface surrounding the pixel opening region and are successively connected end-to-end in sequence, wherein the first side surface has the same slope angle as the third side surface, the second side surface has the same slope angle as the fourth side surface, and the first side surface has a greater slope angle than the second side surface.

14 . The display substrate according to claim 10 , wherein the pixel opening region has the same shape as the first transparent patterns; or

the shape of the pixel opening region is the same as the shape defined by the contours of the transition structures.

15 . A display device, comprising the display substrate as claimed in claim 10 .

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 11, 2025
From: BOE TECHNOLOGY GROUP CO., LTD.
To: BEIJING BOE TECHNOLOGY DEVELOPMENT CO., LTD.
Reel/Frame 072855/0052 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 3, 2022
From: XU, ZHE; ZHANG, WENXUAN; YOU, FEI; LIAO, FEI; LI, CE; JIANG, LONG
To: CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.; BOE TECHNOLOGY GROUP CO., LTD.
Reel/Frame 059158/0600 →
Priority Claims (1)
CN 202010362776.3 · Apr 30, 2020 · national
Continuity (1)
Related Publication 20220320206A1 · Oct 6, 2022
References Cited (18)
US 5725972A · Takeshita · 1998 [cited by examiner]
US 20060199114A1 · Sekiya et al. · 2006 [cited by applicant]
US 20190035866A1 · Mo et al. · 2019 [cited by applicant]
US 20200176702A1 · Hou · 2020 [cited by examiner]
US 20200264504A1 · Wu · 2020 [cited by examiner]
US 20210408490A1 · Zhang · 2021 [cited by examiner]
CN 104423084A · 2015 [cited by applicant]
CN 104714363A · 2015 [cited by applicant]
CN 105511221A · 2016 [cited by examiner]
CN 206133181U · 2017 [cited by applicant]
CN 107340683A · 2017 [cited by applicant]
CN 108761999A · 2018 [cited by applicant]
CN 108986676A · 2018 [cited by applicant]
CN 109136834A · 2019 [cited by applicant]
CN 111443565A · 2020 [cited by applicant]
WO WO2019127872A1 · 2019 [cited by examiner]
Smith et al., “Design, simulation, and fabrication of three-dimensional microsystem components using grayscale photolithography,” Journal of Micro/Nanolithography, MEMS, and MOEMS, 2019 (Year: 2019). [cited by examiner]
PCT/CN2021/079863 international search report and written opinion. [cited by applicant]