Ridge type semiconductor optical device
A device includes: a laminate including first and second regions adjacent to respective both sides of an isolation groove; a mesa stripe structure adjacent to the first region on the laminate and extending in the first direction; a bank structure adjacent to the second region on the laminate and extending in the first direction; and an electrode pattern. The isolation groove has an inner surface including a first wall surface adjacent to the first region, a second wall surface adjacent to the second region, and a bottom surface between the first and second regions. The ridge electrode extends from the side of the mesa stripe structure, along a second direction, toward the bank structure, and not beyond the second wall surface. The connection electrode is narrower in width in the first direction than any one of the ridge electrode and the pad electrode.
1 . A ridge type semiconductor optical device comprising:
a mesa stripe structure extending in a first direction;
a laminate including:
an active layer or an absorption layer,
a first isolation groove extending in the first direction to separate the active layer or the absorption layer,
a first planar region adjacent to a first side of the first isolation groove and adjacent to a first side of the mesa stripe structure,
a second planar region adjacent to a second side of the first isolation groove,
wherein the first isolation groove has a first wall surface adjacent to the first planar region, a second wall surface adjacent to the second planar region, and
a bottom surface between the first wall surface and the second wall surface,
a second isolation groove,
a third planar region adjacent to a second side of the mesa stripe structure and adjacent to a first side of the second isolation groove, and
a fourth planar region adjacent to a second side of the second isolation groove,
wherein the second isolation groove has a third wall surface adjacent to the third planar region, a fourth wall surface adjacent to the fourth planar region, and a bottom surface between the third wall surface and the fourth wall surface;
a bank structure adjacent to the second planar region and extending in the first direction; and
an electrode pattern including:
a ridge electrode on a top of the mesa stripe structure, on the first side of the mesa stripe structure, and on the second side of the mesa stripe structure,
a pad electrode on a top of the bank structure, and
a connection electrode connecting the ridge electrode and the pad electrode,
wherein the ridge electrode, on the first side of the mesa stripe structure, extends from the first side of the mesa stripe structure, along a second direction orthogonal to the first direction, toward the bank structure, and not beyond the second wall surface,
wherein the ridge electrode, on the second side of the mesa stripe structure, extends from the second side of the mesa stripe structure on the third planar region along a third direction opposite to the second direction,
wherein at least a portion of the ridge electrode, on the second side of the mesa stripe structure, extends on to the third wall surface,
wherein the electrode pattern, on the second side of the mesa stripe structure, does not extend beyond the fourth wall surface, and
wherein the connection electrode has a width in the first direction that is less than a width of the ridge electrode and a width of the pad electrode.
2 . The ridge type semiconductor optical device of claim 1 , wherein the ridge electrode, on the first side of the mesa stripe structure, extends over the first planar region and does not extend on to the first wall surface.
3 . The ridge type semiconductor optical device of claim 1 , wherein the ridge electrode, on the first side of the mesa stripe structure, has a portion on the first wall surface.
4 . The ridge type semiconductor optical device of claim 3 , wherein the portion is a first portion; and
wherein the ridge electrode, on the first side of the mesa stripe structure, has a second portion on the bottom surface of the first isolation groove.
5 . The ridge type semiconductor optical device of claim 4 , wherein the ridge electrode, on the first side of the mesa stripe structure, has a third portion on the second wall surface.
6 . The ridge type semiconductor optical device of claim 4 , wherein the ridge electrode, on the first side of the mesa stripe structure, has no portion on the second wall surface.
7 . The ridge type semiconductor optical device of claim 1 , wherein the ridge electrode comprises multiple layers including a first laminated layer and a second laminated layer.
8 . The ridge type semiconductor optical device of claim 7 , wherein the second laminated layer overlaps a portion of the first laminated layer.
9 . The ridge type semiconductor optical device of claim 8 , wherein the first laminated layer has a portion on the first wall surface, and
the second laminated layer has no portion on the first wall surface.
10 . The ridge type semiconductor optical device of claim 8 , wherein the first laminated layer has a portion on the third wall surface, and
the second laminated layer has no portion on the third wall surface.
11 . The ridge type semiconductor optical device of claim 7 , wherein the first laminated layer is a lower layer and the second laminated layer is an upper layer.
12 . The ridge type semiconductor optical device of claim 7 , wherein the first laminated layer is an upper layer and the second laminated layer is a lower layer.
13 . The ridge type semiconductor optical device of claim 7 , wherein the second laminated layer extends past the first laminated layer.
14 . The ridge type semiconductor optical device of claim 13 , wherein the second laminated layer has a portion on the third wall surface, and
the first laminated layer has no portion on the third wall surface.
15 . The ridge type semiconductor optical device of claim 13 , wherein the second laminated layer has a portion on the bottom surface between the third wall surface and the fourth wall surface.
16 . The ridge type semiconductor optical device of claim 1 , further comprising a passivation film interposed between the laminate and the electrode pattern except for at least part of the top of the mesa stripe structure.
17 . The ridge type semiconductor optical device of claim 1 , wherein the width of the ridge electrode is constant along the first direction.
18 . The ridge type semiconductor optical device of claim 1 , further comprising:
another bank structure adjacent to the fourth planar region.
19 . A ridge type semiconductor optical device comprising:
a mesa stripe structure extending in a first direction;
a laminate including:
an active layer or an absorption layer,
a first isolation groove extending in the first direction to separate the active layer or the absorption layer,
a first planar region adjacent to a first side of the first isolation groove and adjacent to a first side of the mesa stripe structure,
a second planar region adjacent to a second side of the first isolation groove,
wherein the first isolation groove has a first wall surface adjacent to the first planar region, a second wall surface adjacent to the second planar region, and
a bottom surface between the first wall surface and the second wall surface,
a second isolation groove,
a third planar region adjacent to a second side of the mesa stripe structure and adjacent to a first side of the second isolation groove, and
a fourth planar region adjacent to a second side of the second isolation groove,
wherein the second isolation groove has a third wall surface adjacent to the third planar region, a fourth wall surface adjacent to the fourth planar region, and a bottom surface between the third wall surface and the fourth wall surface;
a bank structure adjacent to the second planar region and extending in the first direction; and
an electrode pattern including:
a ridge electrode on a top of the mesa stripe structure, on the first side of the mesa stripe structure, and on the second side of the mesa stripe structure,
a pad electrode on a top of the bank structure, and
a connection electrode connecting the ridge electrode and the pad electrode,
wherein the ridge electrode, on the first side of the mesa stripe structure, extends on to the first planar region along a second direction orthogonal to the first direction,
wherein the ridge electrode, on the second side of the mesa stripe structure, extends from the second side of the mesa stripe structure on the third planar region along a third direction opposite to the second direction,
wherein at least a portion of the ridge electrode, on the second side of the mesa stripe structure, extends on to the third wall surface,
wherein the electrode pattern, on the second side of the mesa stripe structure, does not extend beyond the fourth wall surface, and
wherein the connection electrode has a width in the first direction that is less than a width of the ridge electrode and a width of the pad electrode.
20 . A ridge type semiconductor optical device comprising:
a mesa stripe structure extending in a first direction;
a laminate including:
an active layer or an absorption layer,
a first isolation groove extending in the first direction to separate the active layer or the absorption layer,
a first planar region adjacent to a first side of the first isolation groove and adjacent to a first side of the mesa stripe structure,
a second planar region adjacent to a second side of the first isolation groove,
wherein the first isolation groove has a first wall surface adjacent to the first planar region, a second wall surface adjacent to the second planar region, and
a bottom surface between the first wall surface and the second wall surface,
a second isolation groove,
a third planar region adjacent to a second side of the mesa stripe structure and adjacent to a first side of the second isolation groove, and
a fourth planar region adjacent to a second side of the second isolation groove,
wherein the second isolation groove has a third wall surface adjacent to the third planar region, a fourth wall surface adjacent to the fourth planar region, and a bottom surface between the third wall surface and the fourth wall surface;
a bank structure adjacent to the second planar region and extending in the first direction; and
an electrode pattern including:
a ridge electrode on a top of the mesa stripe structure, on the first side of the mesa stripe structure, and on the second side of the mesa stripe structure,
a pad electrode on a top of the bank structure, and
a connection electrode connecting the ridge electrode and the pad electrode,
wherein the ridge electrode, on the first side of the mesa stripe structure, extends on to the first planar region along a second direction orthogonal to the first direction and on to the bottom surface of the first isolation groove, and does not extend on to the second wall surface,
wherein the ridge electrode, on the second side of the mesa stripe structure, extends from the second side of the mesa stripe structure on the third planar region along a third direction opposite to the second direction,
wherein at least a portion of the ridge electrode, on the second side of the mesa stripe structure, extends on to the third wall surface,
wherein the electrode pattern, on the second side of the mesa stripe structure, does not extend on to the fourth wall surface, and
wherein the connection electrode has a width in the first direction that is less than a width of the ridge electrode and a width of the pad electrode.