IP Library Granted Patent US 12,583,958
Granted Patent B2
US 12,583,958 · App. 17/653,886 · Granted Mar 24, 2026

Photopolymer for anti-yellowing and anti-thermal cracking applications

Inventors: Liang Zhang (Hong Kong, CN); Kin Cheung Chan (Hong Kong, CN); Chun Kwong Yeung (Hong Kong, CN); Jifan Li (Hong Kong, CN)
Assignee: Nano and Advanced Materials Institute Limited
C08F220/14C08F220/1804C08F220/1806C09D11/101C09D11/102C09D11/107C09D11/36H05K3/0076H05K3/0082H05K2203/0551
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Quick Facts
Patent No.
US 12,583,958
App. No.
17/653,886
Granted
Mar 24, 2026
Kind
B2
Abstract

An acrylate based photopolymer with high yellowing resistance, excellent photo sensitivity, high toughness, and high glass transition temperature, methods of preparation and used thereof, and solders comprising the same.

Claims (28)

1 . A photopolymer comprising: a monomer unit of Formula I, a monomer unit of Formula II, a monomer unit of Formula III, and a monomer unit of Formula IV:

wherein each R 1 for each occurrence is independently hydrogen or methyl;

R 2 is C 3 -C 12 cycloalkyl or C 6 -C 12 polycyclyl;

R 3 is C 1 -C 12 alkyl; and

R 4 is selected from the group consisting of

 or

R 4 is a mixture of

 wherein R 5 is hydrogen or methyl,

wherein the photopolymer has a weight average molecular weight between 10,000 to 40,000 amu, and

wherein the monomer unit of Formula I, the monomer unit of Formula II, the monomer unit of Formula III, and the monomer unit of Formula IV are present in the photopolymer between 1-15 mol %, 35-50 mol %, 15-25 mol %, and 30-55 mol %, respectively, relative to the total moles of the monomer unit of Formula I, the monomer unit of Formula II, the monomer unit of Formula III, and the monomer unit of Formula IV.

2 . The photopolymer of claim 1 , wherein R 2 is isobornyl, cyclohexyl, cyclopentyl, 3,3,5-trimethylcyclohexyl, tetrahydrofurfuryl, or 2-tetrahydropyranyl.

3 . The photopolymer of claim 1 , wherein R 3 is methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, hexyl, octyl, decyl, or 2-ethylhexyl.

4 . The photopolymer of claim 1 , wherein R 1 is methyl; R 2 is isobornyl or cyclohexyl; R 3 is methyl, isobutyl, or n-hexyl; and R 4 is:

a mixture of

5 . The photopolymer of claim 1 , wherein the monomer unit of Formula I is present in the photopolymer between 1-10 mol % relative to the total moles of the monomer unit of Formula I, the monomer unit of Formula II, the monomer unit of Formula III, and the monomer unit of Formula IV.

6 . The photopolymer of claim 1 , wherein the monomer unit of Formula II is present in the photopolymer between 20-55 mol % relative to the total moles of the monomer unit of Formula I, the monomer unit of Formula II, the monomer unit of Formula III, and the monomer unit of Formula IV.

7 . The photopolymer of claim 1 , wherein the monomer unit of Formula III is present in the photopolymer between 10-30 mol % relative to the total moles of the monomer unit of Formula I, the monomer unit of Formula II, the monomer unit of Formula III, and the monomer unit of Formula IV.

8 . The photopolymer of claim 1 , wherein the monomer unit of Formula IV is present in the photopolymer between 35-48 mol % relative to the total moles of the monomer unit of Formula I, the monomer unit of Formula II, the monomer unit of Formula III, and the monomer unit of Formula IV.

9 . The photopolymer of claim 1 , wherein the monomer unit of Formula I, the monomer unit of Formula II, the monomer unit of Formula III, and the monomer unit of Formula IV are present in the photopolymer between 1-10 mol %, 35-50 mol %, 15-25 mol %, and 35-48 mol %, respectively, relative to the total moles of the monomer unit of Formula I, the monomer unit of Formula II, the monomer unit of Formula III, and the monomer unit of Formula IV.

10 . The photopolymer of claim 4 , wherein the monomer unit of Formula I, the monomer unit of Formula II, the monomer unit of Formula III, and the monomer unit of Formula IV are present in the photopolymer between 1-10 mol %, 35-50 mol %, 15-25 mol %, and 35-48 mol %, respectively, relative to the total moles of the monomer unit of Formula I, the monomer unit of Formula II, the monomer unit of Formula III, and the monomer unit of Formula IV.

11 . The photopolymer of claim 1 , wherein the photopolymer is selected from the group consisting of:

a photopolymer, wherein R 1 is methyl; R 2 is cyclohexyl; R 3 is isobutyl; and R 4 is a mixture of

 or a photopolymer, wherein R 1 is methyl; R 2 is isobornyl; R 3 is n-hexyl; and R 4 is a mixture of

 wherein the monomer unit of Formula I, the monomer unit of Formula II, the monomer unit of Formula III, and the monomer unit of Formula IV are present in the photopolymer between 1-10 mol %, 35-50 mol %, 15-25 mol %, and 35-48 mol %, respectively, relative to the total moles of the monomer unit of Formula I, the monomer unit of Formula II, the monomer unit of Formula III, and the monomer unit of Formula IV.

12 . The photopolymer of claim 11 , wherein the photopolymer has a weight average molecular weight between 18,000 to 23,000 amu.

13 . A solder mask ink comprising the photopolymer of claim 1 and an epoxy resin.

14 . The solder mask ink of claim 13 further comprising a photoinitiator, a crosslinker, and a metal oxide.

15 . A method of applying the solder mask ink of claim 14 to a substrate, the method comprising: applying the solder mask ink to a surface of the substrate and irradiating the solder mask ink with ultraviolet radiation.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 17, 2026
From: NANO AND ADVANCED MATERIALS INSTITUTE LIMITED
To: HONG KONG APPLIED SCIENCE AND TECHNOLOGY RESEARCH INSTITUTE COMPANY LIMITED
Reel/Frame 075402/0553 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 8, 2022
From: ZHANG, LIANG; CHAN, KIN CHEUNG; YEUNG, CHUN KWONG; LI, JIFAN
To: NANO AND ADVANCED MATERIALS INSTITUTE LIMITED
Reel/Frame 059192/0119 →
Continuity (2)
Provisional Application 63200526 · Mar 12, 2021
Related Publication 20220289884A1 · Sep 15, 2022
References Cited (7)
US 6136506A · Hashimoto et al. · 2000 [cited by applicant]
US 20060229376A1 · Hayashi · 2006 [cited by examiner]
US 20110086309A1 · Nankawa · 2011 [cited by examiner]
CN 109415572A · 2019 [cited by applicant]
JP H11288620A · 1999 [cited by applicant]
Xiangfei Zheng et. al., “Synthesis of Methacrylic Copolymers Applied in Negative-Type Photoresist”, Polymer Materials Science and Engineering, vol. 30, Issue 12, pp. 34-38. [cited by applicant]
First Office Action of CN2022101704389 issued from the China National Intellectual Property Administration on Mar. 25, 2023. [cited by applicant]