Pretreatment and post-treatment of electrode surfaces

1. A method of forming a negative electrode structure, comprising:

exposing a negative electrode to a surface treatment process to activate a surface of the negative electrode, wherein the negative electrode comprises carbon, graphite, silicon, silicon oxide, or a combination thereof and the surface treatment process is selected from a corona treatment process, an atmospheric plasma treatment process, a low energy plasma treatment process, a plasma treatment process performed in a vacuum environment, or a combination thereof;

forming a lithium metal film on the surface of the negative electrode; and

exposing the lithium metal film to a post-deposition surface treatment process to accelerate absorption of the lithium metal film into the negative electrode to pre-lithiate the negative electrode, wherein the post-deposition surface treatment process comprises heating the lithium metal film with a laser in a controlled ambient, and optionally exposing the lithium metal film to thermal energy, annealing the lithium metal film in a vacuum environment, or a combination thereof.

2. The method of claim 1 , wherein the surface treatment process is the corona treatment process and the corona treatment process comprises generating an ionized corona discharge plasma.

3. The method of claim 2 , wherein the ionized corona discharge plasma comprises a positive or negatively charged plasma.

4. The method of claim 1 , wherein the surface treatment process is the atmospheric plasma treatment process and the atmospheric plasma treatment process is performed at or near atmospheric pressure.

5. The method of claim 4 , wherein the atmospheric plasma treatment process comprises a plasma source gas comprising a chemically reactive species and a chemically non-reactive species, wherein:

the chemically reactive species is selected from oxygen, nitrogen, hydrogen, or a combination thereof; and

the chemically non-reactive species is selected from argon, helium, or a combination thereof.

6. The method of claim 5 , wherein the plasma source gas comprises a concentration of at least 95% of the chemically non-reactive species and a concentration of the chemically reactive species of less than 5%.

7. The method of claim 5 , wherein the chemically reactive species is oxygen, nitrogen, or hydrogen and the chemically non-reactive species is argon.

8. The method of claim 5 , wherein the atmospheric plasma treatment process comprises generating an atmospheric pressure plasma using an RF frequency power source, wherein the RF frequency power source is from about 13.56 MHz to about 27 MHz.

9. The method of claim 1 , wherein the surface treatment process is the plasma treatment process performed in a vacuum environment.

10. The method of claim 9 , wherein the plasma treatment process comprises exposing the negative electrode to a reducing plasma.

11. The method of claim 10 , wherein the reducing plasma is formed from a reducing gas mixture comprising ammonia (NH 3 ), hydrazine (N 2 H 4 ), hydrogen (H 2 ), atomic hydrogen, hydrogen halides, hydrogen chalcogenides, radicals thereof, derivatives thereof, or a combination thereof.

12. The method of claim 11 , wherein the reducing gas mixture further comprises one or more inert gases and the reducing plasma is a remotely formed plasma, a capacitively coupled plasma, or an inductively coupled plasma.

13. The method of claim 9 , wherein the plasma treatment process comprises exposing the negative electrode to an oxidizing plasma.

14. The method of claim 13 , wherein the oxidizing plasma is formed from an oxidizing gas mixture comprises oxygen (O 2 ), ozone (O 3 ), nitrous oxide (N 2 O), fluorine (F 2 ), chlorine (Cl 2 ), carbon monoxide (CO), carbon dioxide (CO 2 ), water (H 2 O), radicals thereof, derivatives thereof, or a combination thereof.

15. The method of claim 13 , wherein the oxidizing plasma is a remotely formed plasma, a capacitively coupled plasma, or an inductively coupled plasma.

16. A method of forming a negative electrode structure, comprising:

forming a negative electrode in an atmospheric environment, wherein the negative electrode comprises carbon, graphite, silicon, silicon oxide, or a combination thereof;

exposing the negative electrode to a surface treatment process to activate a surface of the negative electrode, wherein the surface treatment process is selected from a corona treatment process, an atmospheric plasma treatment process, a low energy plasma treatment process, a plasma treatment process performed in a vacuum environment, or a combination thereof;

forming a lithium metal film on the surface of the negative electrode in a vacuum environment; and

exposing the lithium metal film to a post-deposition surface treatment process to accelerate absorption of the lithium metal film into the negative electrode to pre-lithiate the negative electrode, wherein the post-deposition surface treatment process comprises heating the lithium metal film with a laser in a controlled ambient, and optionally exposing the lithium metal film to thermal energy, annealing the lithium metal film in a vacuum environment, or a combination thereof.

17. The method of claim 16 , wherein the surface treatment process is the corona treatment process and the corona treatment process comprises generating an ionized corona discharge plasma.

18. The method of claim 16 , wherein the surface treatment process is the atmospheric plasma treatment process and the atmospheric plasma treatment process is performed at or near atmospheric pressure.

19. The method of claim 16 , wherein the surface treatment process is the plasma treatment process performed in a vacuum environment.

20. The method of claim 16 , wherein forming the negative electrode in the atmospheric environment comprises a slurry coating process.