SACRIFICIAL LAYER FOR ELECTROCHROMIC DEVICE FABRICATION
Methods for protecting transparent electronically conductive layers on glass substrates are described herein. Methods include depositing a sacrificial coating during deposition of the transparent electronically conductive layer, before packing the glass substrate for storage or shipping, after unpacking glass substrates from a stack of glass substrates, and/or after a washing operation prior to fabricating an electrochromic stack on the transparent electronically conductive layer. Methods also include removing the sacrificial coating during a washing operation, during tempering, or prior to depositing an electrochromic stack by, e.g., heating the sacrificial coating or exposing the sacrificial coating to an inert plasma.
1 .- 43 . (canceled)
44 . A method of processing a glass substrate having a solid state electrochromic device thereon, the method comprising:
(a) covering the solid state electrochromic device with a sacrificial coating;
(b) laminating the glass substrate to a second glass substrate to form a laminate;
(c) removing the sacrificial coating; and
(d) fabricating an insulated glass unit (IGU) using the laminate as one pane and a third pane as a mate lite of the IGU.
45 . The method of claim 44 , wherein the sacrificial coating is removed by peeling.
46 . The method of claim 44 , wherein the sacrificial coating is removed in a downstream facility.
47 . The method of claim 44 , further comprising, prior to covering the solid state electrochromic device with the sacrificial coating, fabricating the glass substrate by forming the solid state electrochromic device comprising an electrochromic stack between a first and a second transparent electronically conductive layer configured to deliver an electrical potential difference over surfaces of the electrochromic stack and thereby cause optical switching of the solid state electrochromic device.
48 . The method of claim 47 , wherein forming the solid state electrochromic device further comprises applying bus bars.
49 . The method of claim 47 , wherein the sacrificial coating is formed over the glass substrate in a first facility and the sacrificial coating is removed in a second facility.
50 . The method of claim 47 , wherein fabricating the glass substrate further comprises, after forming the solid state electrochromic device, depositing the sacrificial coating over the solid state electrochromic device.
51 . The method of claim 44 , wherein the sacrificial coating has a thickness between about 1 μm and about 3000 μm.
52 . A laminate comprising:
a first glass substrate having a solid state electrochromic device deposited thereon and a sacrificial coating over the solid state electrochromic device; and
a second glass substrate.
53 . The laminate of claim 52 , wherein the sacrificial coating is removable.
54 . The laminate of claim 53 , wherein the sacrificial coating is removable by peeling.
55 . The laminate of claim 52 , wherein the sacrificial coating comprises an organic coating selected from the group consisting of acrylic materials, adhesive materials, and vinyl material.
56 . The laminate of claim 52 , wherein the solid state electrochromic device comprises an electrochromic stack between a first and a second transparent electronically conductive layer configured to deliver an electrical potential difference over surfaces of the electrochromic stack and thereby cause optical switching of the solid state electrochromic device.
57 . The laminate of claim 52 , wherein the first glass substrate has bus bars thereon.
58 . The laminate of claim 52 , wherein the sacrificial coating has a thickness of about 1 μm to about 3000 μm.
59 . The laminate of claim 52 , wherein the second glass substrate comprises a second solid state electrochromic device deposited thereon.
60 . An integrated glass unit having a third glass substrate laminated with the laminate of claim 52 .
61 . The integrated glass unit of claim 60 , comprises a spacer, primary seal, and secondary seal.