Self-cleaning nozzle plate

1. A nozzle plate of a fluid ejection head for a fluid ejection device, the nozzle plate comprising nozzle holes and a fluid channel layer attached to an exposed surface of the nozzle plate, wherein the fluid channel layer comprises a single rectangular fluid channel formed in the fluid channel layer for each of the nozzle holes and wherein the single rectangular fluid channel is configured to urge fluid in a lateral direction away from each of the nozzle holes through the rectangular fluid channel toward a non-functional area of the nozzle plate in the absence of a wiper or other maintenance device.

2. The nozzle plate of claim 1 , wherein the nozzle plate comprises a photoimageable layer.

3. The nozzle plate of claim 1 , wherein the fluid channel layer further comprises a single recessed area circumscribing each of the nozzle holes in fluid flow communication with the single rectangular fluid channel.

4. The nozzle plate of claim 3 , wherein the single recessed area comprises a rectangular recessed area.

5. The nozzle plate of claim 1 , wherein each single rectangular fluid channel has a size that promotes capillary action to urge fluid away from each of the nozzle holes in the lateral direction toward the non-functional area of the nozzle plate.

6. A fluid ejection head configured for an industrial printer devoid of a maintenance station comprising the nozzle plate of claim 1 .

7. A method for making an improved fluid ejection head for fluid ejection device, the method comprising the steps of:

applying a first negative photoresist layer to a device surface of a semiconductor substrate, wherein the first negative photoresist layer is derived from a composition comprising a multi-functional epoxy compound, a first di-functional epoxy compound, a photoacid generator, an adhesion enhancer, and an aryl ketone solvent;

imaging and developing the first negative photoresist layer to provide a plurality of flow features therein;

applying a second negative photoresist layer to an exposed surface of the first photoresist layer; the second negative photoresist layer having a thickness ranging from about 10 to about 30 microns and being derived from a second photoresist formulation comprising a second di-functional epoxy compound, a relatively high molecular weight polyhydroxy ether, the photoacid generator, the adhesion enhancer, and an aliphatic ketone solvent;

imaging and developing the second photoresist layer to provide a nozzle plate having nozzle holes therein;

applying a third negative photoresist layer to an exposed surface of the nozzle plate; and

imaging and developing the third negative photoresist layer to provide a single rectangular fluid channel therein for each of the nozzle holes wherein the single rectangular fluid channel is configured to urge fluid in a lateral direction away from each of the nozzle holes through the single rectangular fluid channel toward a non-functional area of the nozzle plate in the absence of a wiper or other maintenance device.

8. The method of claim 7 , wherein the nozzle plate comprises a photoimageable layer.

9. The method of claim 7 , further comprising imaging and developing the third photoresist layer to provide a single recessed area in the third photoresist layer circumscribing each of the nozzle holes in fluid flow communication with the single rectangular fluid channel.

10. The method of claim 9 , wherein the single recessed area comprises a rectangular recessed area.

11. The method of claim 7 , wherein each single rectangular fluid channel has a size that promotes capillary action to urge fluid away from each of the nozzle holes in the lateral direction toward the non-functional area of the nozzle plate.