IP Library Granted Patent US 11,975,995
Granted Patent B2
US 11,975,995 · App. 17/696,425 · Granted May 7, 2024

Wash water processing apparatus and sterilization and purification unit, and wash water processing method of semiconductor element or liquid-crystal glasses

Inventors: Katsuhisa Yata (Chino, JP); Takako Sakurai (Chino, JP); Satoshi Ito (Chino, JP); Toshiharu Tanaka (Chino, JP)
Assignees: KITZ CORPORATION; TOYO VALVE CO., LTD.
C02F9/00C02F1/32C02F1/42C02F1/44C02F1/725C02F1/78C02F2101/301C02F2103/346C02F2303/04C02F2305/10
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Quick Facts
Patent No.
US 11,975,995
App. No.
17/696,425
Granted
May 7, 2024
Kind
B2
Abstract

A wash water processing apparatus of reusing wash water includes: a washing processing part washing a subject to be washed; a wash water accommodation part into which processed water used in a washing process in the washing processing part is once accommodated; a sterilization and purification unit causing, while acting with an ozone supply function, ozone water to be contained in the processed water flowing through the wash water accommodation part in a circular manner; and a filtration mechanism part configured to include a filter and an ion-exchange resin and sequentially filtrating the processed water to be reused as wash water in the washing processing part, as the ozone water is supplied as the processed water is mixed to dilute an ozone concentration in the wash water accommodation part. In a state where the ozone concentration is adjusted, the processed water is passed through the filter and the ion-exchange resin.

Claims (22)

1. A wash water processing apparatus of reusing wash water for use in an industrial product washing step, the apparatus comprising:

a washing processing part which washes a subject to be washed;

a wash water accommodation part into which processed water used in a washing process in the washing processing part is once accommodated;

a sterilization and purification unit which causes, while acting with an ozone supply function, ozone water to be contained in the processed water flowing through the wash water accommodation part in a circular manner; and

a filtration mechanism part configured to include a filter and an ion-exchange resin, the filtration mechanism part which sequentially filtrates the processed water to be reused as wash water in the washing processing part, as the ozone water is supplied as the processed water is mixed to dilute an ozone concentration in the wash water accommodation part, wherein

the sterilization and purification unit is connected to the wash water accommodation part so that the processed water is circulated in the wash water accommodation part and the sterilization and purification unit, and controls operation of ozone supply of the sterilization and purification unit to adjust an ozone concentration of the processed water in the wash water accommodation part, and

the processed water containing the ozone water with the diluted ozone concentration is passed through both of the filter and the ion-exchange resin, thereby suppressing growth of bacteria in the filter and the ion-exchange resin and also suppressing oxidative degradation thereof.

2. A sterilization and purification apparatus for use in a wash water processing apparatus including:

a washing processing part which washes a subject to be washed;

a wash water accommodation part into which processed water used in a washing process in the washing processing part is once accommodated;

a sterilization and purification unit which causes, while acting with an ozone supply function, ozone water to be contained in the processed water flowing through the wash water accommodation part in a circular manner; and

a filtration mechanism part configured to include a filter and an ion-exchange resin, the filtration mechanism part which sequentially filtrates the processed water in the wash water accommodation part to be reused as wash water in the washing processing part,

the sterilization and purification unit comprising:

an ozone supply part which supplies ozone, wherein

the sterilization and purification unit is connected to the wash water accommodation part so that the processed water is circulated in the wash water accommodation part and the sterilization and purification unit; controls operation of ozone supply; mixes the processed water flowing in from the wash water accommodation part with ozone for sterilization and purification and then returns the processed water to the wash water accommodation part for circulation in order to dilute an ozone concentration of the processed water accommodated in the wash water accommodation part; and sends the processed water containing the ozone water with the diluted ozone concentration to the filtration mechanism part to pass through both of the filter and the ion-exchange resin, thereby suppressing growth of bacteria in the filter and the ion-exchange resin and also suppressing oxidative degradation thereof.

3. A method of manufacturing a semiconductor element or liquid crystal glass, the method comprising a washing process step of washing the semiconductor element or liquid crystal glass by using a wash water processing apparatus including:

a washing processing part which washes a subject to be washed;

a wash water accommodation part into which processed water used in a washing process in the washing processing part is once accommodated;

a sterilization and purification unit which causes, while acting with an ozone supply function, ozone water to be contained in the processed water flowing through the wash water accommodation part in a circular manner; and

a filtration mechanism part configured to include a filter and an ion-exchange resin, the filtration mechanism part which sequentially filtrates the processed water in the wash water accommodation part to be reused as wash water in the washing processing part, wherein

in the washing process step,

in a state in which operation of ozone supply of the sterilization and purification unit is controlled to adjust an ozone concentration of the processed water in the wash water accommodation part, the processed water containing the ozone water with the diluted ozone concentration is passed through both of the filter and the ion-exchange resin, thereby suppressing growth of bacteria in the filter and the ion-exchange resin and also suppressing oxidative degradation thereof.

Assignments (3)
MERGER Recorded Apr 22, 2025
From: TOYO VALVE CO., LTD.
To: KITZ CORPORATION
Reel/Frame 070920/0581 →
CHANGE OF ASSIGNEE ADDRESS Recorded Apr 19, 2024
From: TOYO VALVE CO., LTD.
To: TOYO VALVE CO., LTD.
Reel/Frame 067171/0125 →
CHANGE OF ASSIGNEE ADDRESS Recorded Feb 15, 2024
From: KITZ CORPORATION
To: KITZ CORPORATION
Reel/Frame 066600/0551 →
Priority Claims (1)
JP 2017-211281 · Oct 31, 2017 · national
Continuity (2)
Continuation 16760281
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