Granted Patent B2

US 12,203,164 · App. 17/717,642 · Granted Jan 21, 2025

Inventors: Tamara Heintz (Mömbris, DE); Stefan Bangert (Steinau, DE); Suresh Manikkoth Kollarath (Bangalore, IN); Ramgopal Chakkaravarthy Ramasamy (San Jose, CA)

Assignee: Applied Materials, Inc.

C23C14/541C23C14/24C23C14/562

Abstract

Claims (42)

1. A material deposition apparatus for depositing an evaporated material onto a substrate, the material deposition apparatus comprising:

a processing drum having a cooler configured to control a substrate temperature during processing of the substrate on the processing drum;

a roller guiding the substrate towards the processing drum;

a first heater assembly positioned to heat the substrate in a free-span area between the roller and the processing drum;

a second heater assembly positioned to heat the substrate while the substrate is supported on the processing drum;

at least one deposition source provided along a substrate transport path downstream of the second heater assembly;

a substrate speed sensor providing a speed signal correlating with a substrate transportation speed; and

a controller having an input for the speed signal configured to control at least the first heater assembly based on the speed signal, the controller further comprising:

a memory storing computer readable instructions; and

a processor coupled to the memory, the processor configured by the computer readable instructions that when executed by the processor perform a plurality of operations for depositing the evaporated material onto the substrate, the plurality of operations comprising:

guiding the substrate from the roller through the free-span area towards the processing drum at the substrate transportation speed;

receiving the speed signal from the substrate speed sensor;

heating the substrate from a first substrate temperature to a second substrate temperature with the first heater assembly, based on the speed signal, to provide a speed-dependent heating of the substrate in the free-span area before the substrate comes into contact with the processing drum; and

depositing the evaporated material onto the substrate using the at least one deposition source as the substrate travels along the substrate transport path on the processing drum.

2. The material deposition apparatus according to claim 1 , further comprising:

a first temperature sensor provided along the substrate transport path downstream of the first heater assembly.

3. The material deposition apparatus according to claim 2 , further comprising:

a second temperature sensor provided along the substrate transport path downstream of the second heater assembly.

4. The material deposition apparatus according to claim 2 , further comprising:

a transition heater assembly positioned to heat the substrate between the first heater assembly and the second heater assembly.

5. The material deposition apparatus according to claim 1 , further comprising:

a second temperature sensor provided along the substrate transport path downstream of the second heater assembly.

6. The material deposition apparatus according to claim 5 , further comprising:

a transition heater assembly positioned to heat the substrate between the first heater assembly and the second heater assembly.

7. The material deposition apparatus according to claim 1 , further comprising:

a transition heater assembly positioned to heat the substrate between the first heater assembly and the second heater assembly.

8. The material deposition apparatus according to claim 7 , further comprising:

a transition temperature sensor provided along the substrate transport path downstream of the transition heater assembly.

9. The material deposition apparatus according to claim 8 , further comprising:

a transition heater controller having an input for a signal from the transition temperature sensor to control the transition heater assembly dependent on the signal of the transition temperature sensor.

10. The material deposition apparatus according to claim 1 , further comprising:

a second heater controller having an input for a deposition rate signal.

11. The material deposition apparatus according to claim 1 , wherein the cooler is a gas cushion guiding a cooling gas between the processing drum and the substrate.

12. The material deposition apparatus according to claim 1 , wherein a lookup table is stored in the memory to correlate the substrate transportation speed with a power density of the first heater assembly.

13. The material deposition apparatus according to claim 12 , wherein the controller performs a bilinear interpolation of data in the lookup table to correlate the substrate transportation speed with the power density.

14. The material deposition apparatus according to claim 1 , the plurality of operations further comprising:

heating the substrate on the processing drum with the second heater assembly based on a deposition rate.

15. The material deposition apparatus according to claim 14 , the plurality of operations further comprising:

measuring a first substrate temperature by receiving a temperature signal from a first temperature sensor after heating the substrate with the first heater assembly, the first temperature sensor provided along the substrate transport path downstream of the first heater assembly; and

measuring a second substrate temperature by receiving a temperature signal from a second temperature sensor while the substrate is supported on the processing drum and before heating the substrate with the second heater assembly, the second temperature sensor provided along the substrate transport path downstream of the second heater assembly.

16. The material deposition apparatus according to claim 15 , the plurality of operations further comprising:

heating the substrate with a transition heater assembly depending on a difference between the first substrate temperature and the second substrate temperature.

Assignments (9)

Continuity (2)

References Cited (40)