SYSTEMS AND METHODS FOR FORMING MONOLITHIC ELECTRON MICROSCOPE COMPONENTS
A method of forming a monolithic electron optics component includes providing a dual-nozzle printing head having first and second printing nozzles, heating the dual-nozzle printing head to a desired temperature so that both the first nozzle and the second nozzle are heated to substantially the same, desired temperature, extruding a non-conductive filament material through the first nozzle, and withdrawing a conductive filament material through the second nozzle to form a device component. The desired temperature is typically above a melting temperature of the conductive filament material, above the melting temperature of the non-conducting filament material and lower than the temperature at which the printed device component or object sags under its own weight after printing and bleeding of the non-conducting filament material over the conducting filament material occurs.
1 . A monolithic electron optics component, for use in a vacuum environment in an electron microscope system, wherein the component includes a monolithic structure including a first non-conductive material and a second conductive material, wherein the first non-conductive material and the second conductive material each comprises a polylactic acid (PLA).
2 . The monolithic electron optics component according to claim 1 , wherein the component is an electrostatic quadrupole lens element.
3 . The monolithic electron optics component according to claim 1 , wherein the component is an electron beam deflector element.
4 . The monolithic electron optics component according to claim 1 , wherein the component is a focusing lens element.
5 . The monolithic electron optics component according to claim 4 , wherein the focusing lens element is a cylindrical focusing lens element.
6 . An electron microscope system, comprising:
a vacuum chamber structure configured to provide a vacuum pressure environment for elements housed within the vacuum chamber structure;
an electron beam source configured to emit an electron beam;
at least one monolithic electron optics component housed in the vacuum chamber structure and positioned in a path of the electron beam, wherein the at least one monolithic electron optics component is configured to deflect or guide the electron beam; and
a detection element positioned in the path of the electron beam; and
wherein the at least one monolithic electron optics component includes a monolithic structure including a first non-conductive material and a second conductive material, wherein the first non-conductive material and the second conductive material each comprises a polylactic acid (PLA).
7 . The system of claim 6 , wherein the at least one monolithic electron optics component includes a monolithic electron deflector element comprising two pairs of deflection plates configured to deflect the electron beam in response to voltage differences applied to each of the two pairs of plates.
8 . The system of claim 6 , wherein the at least one monolithic electron optics component includes a monolithic electrostatic quadrupole lens element configured to guide the electron beam in response to voltage difference applied to electrodes of the quadrupole lens.
9 . The system of claim 6 , wherein the at least one monolithic electron optics component includes both a monolithic electron deflector element comprising two pairs of deflection plates, and a monolithic electrostatic quadrupole lens element.
10 . The system of claim 6 , wherein the vacuum pressure environment includes a pressure of 10 −6 Torr.