IP Library Patent Application 17733793
Patent Application
App. No. 17/733,793

SI-BASED ANODES WITH CROSS-LINKED CARBON NANOTUBES

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Patent No.
US None
App. No.
17/733,793
Abstract

Systems and methods are provided for Si-based anodes with cross-linked carbon nanotubes. A slurry for use in anodes may be mixed, with the slurry including an anode active material and a carbon-based additive, where the slurry may be used in forming an anode. The anode active material may yield a silicon-dominant anode when the slurry is used in forming the anode, and the carbon-based additive forms a mesh-like structure in the silicon-dominant anode. The carbon-based additive includes cross-linked carbon nanotubes (CNT).

Claims (35)

1 . An electrochemical cell comprising:

a silicon-dominant anode;

a cathode;

a separator; and

an electrolyte;

wherein the silicon-dominant anode comprises an anode active material and a carbon-based additive that forms a mesh or net structure comprising carbon fibers and/or tubes connected to each other.

2 . The electrochemical cell of claim 1 , wherein the carbon-based additive comprises cross-linked carbon nanotubes (CNTs).

3 . The electrochemical cell of claim 1 , wherein the carbon-based additive percolates and creates in the silicon-dominant anode a conductive network at low concentration, and wherein the low concentration is <1%, <0.5%, or <0.25%.

4 . The electrochemical cell of claim 1 , wherein the silicon-dominant anode has, as a result of forming of the mesh or net structure, an expansion of less than 1%, or less than 0.8%, with density higher than 1 gm/cm 3 , or higher than 1.1 g/cm 3 .

5 . The electrochemical cell of claim 1 , wherein the silicon-dominant anode has, as a result of forming of the mesh or net structure, resistance less than 5 Ω·m, less than 2 Ω·m, or less than 1.64 Ω·m.

6 . The electrochemical cell of claim 1 , wherein the silicon-dominant anode comprises a pyrolyzed carbon-based binder.

7 . The electrochemical cell of claim 6 , wherein the slurry comprises a precursor for the pyrolyzed carbon-based binder.

8 . The electrochemical cell of claim 7 , wherein the precursor for the pyrolyzed carbon-based binder is dispersed in an organic based solvent, an inorganic based solvent, or a mixture of organic and inorganic solvents.

9 . The electrochemical cell of claim 8 , wherein the organic based solvent used in the slurry comprises N-Methyl pyrrolidone (NMP) based solvent.

10 . The electrochemical cell of claim 6 , wherein the pyrolyzed carbon-based binder comprises a pyrolytic carbon derived from polyamide-imide (PAI).

11 . The electrochemical cell of claim 1 , wherein the slurry further comprises polyvinyl alcohol (PVA) solution in water.

12 . The electrochemical cell of claim 1 , wherein the slurry further comprises a surfactant.

13 . The slurry used to make electrodes of claim 1 , wherein a precursor for the carbon-based additive is dispersed in water.

14 . A method comprising:

mixing a slurry for use in anodes, the slurry comprising an anode active material and a carbon-based additive; and

forming an anode using the slurry;

wherein:

the anode active material yields a silicon-dominant anode when the slurry is used in forming the anode; and

the carbon-based additive forms a mesh or net structure in the silicon-dominant anode, the mesh or net structure comprising carbon fibers and/or tubes connected to each other.

15 . The method of claim 14 , wherein the carbon-based additive comprises cross-linked carbon nanotubes (CNT).

16 . The method of claim 14 , wherein the carbon-based additive percolates and creates in the final silicon-dominant anode a conductive network at low concentration, and wherein the low concentration is <1%, <0.5%, or <0.25%.

17 . The method of claim 14 , wherein the silicon-dominant anode has, as a result of forming of the mesh or net structure, an expansion of less than 1%, or less than 0.8%, with density higher than 1 gm/cm 3 , or higher than 1.1 g/cm 3 .

18 . The method of claim 14 , wherein the silicon-dominant anode has, as a result of forming of the mesh or net structure, resistance less than 2 Ω·m, or less than 1.64 Ω·m.

19 . The method of claim 14 , comprising forming the silicon-dominant anode using a direct coating process of the slurry on a current collector to provide a coated anode.

20 . The method of claim 19 , further comprising calendaring the coated anode.

21 . The method of claim 20 , further comprising calendaring the coated anode at 70° C.

22 . The method of claim 21 , further comprising pyrolyzing the coated anode at >500° C., 5° C./min ramp, and 60-120 min dwell time under Argon (Ar) atmosphere.

23 . The method of claim 21 , further comprising pyrolyzing the coated anode at >500° C., 5° C./min ramp, and 60-120 min dwell time under Ar/H 2 forming gas.

24 . The method of claim 21 , further comprising pyrolyzing the coated anode at >500° C., 5° C./min ramp, and 120-180 min dwell time under N 2 nitrogen gas.

25 . The method of claim 21 , further comprising pyrolyzing the coated anode at >500° C., 5° C./min ramp, and 120-180 min dwell time under Argon (Ar) atmosphere.

Assignments (2)
SECURITY INTEREST Recorded Mar 10, 2026
From: ENEVATE CORPORATION
To: MCANDREWS, HELD & MALLOY LTD.
Reel/Frame 075093/0935 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 29, 2022
From: ANSARI, YOUNES; ZHANG, QING; PARK, BENJAMIN YONG
To: ENEVATE CORPORATION
Reel/Frame 059717/0122 →