Integrated assemblies having transistor body regions coupled to carrier-sink-structures; and methods of forming integrated assemblies
Some embodiments include an integrated assembly having a carrier-sink-structure, and having digit lines over the carrier-sink-structure. Transistor body regions are over the digit lines. Extensions extend from the carrier-sink-structure to the transistor body regions. The extensions are configured to drain excess carriers from the transistor body regions. Lower source/drain regions are between the transistor body regions and the digit lines, and are coupled with the digit lines. Upper source/drain regions are over the transistor body regions, and are coupled with storage elements. Gates are adjacent the transistor body regions. The transistor body regions, lower source/drain regions and upper source/drain regions are together comprised a plurality of transistors. The transistors and the storage elements are together comprised by a plurality of memory cells of a memory array. Some embodiments include methods of forming integrated assemblies.
1. An integrated assembly, comprising:
a lower carrier-sink-structure;
first comparative digit lines over the lower carrier-sink-structure;
first source/drain regions over the first comparative digit lines and being coupled with the first comparative digit lines;
vertically-extending first pillars over the first source/drain regions; each of the first pillars comprising a first transistor body region and a second source/drain region;
capacitors coupled with the second source/drain regions;
vertically-extending second pillars over the capacitors; each of the second pillars comprising a third source/drain region and a second transistor body region over the third source/drain region; the third source/drain regions being coupled with capacitor nodes;
fourth source/drain regions over the second transistor body regions;
second comparative digit lines over the fourth source/drain regions and being coupled with the fourth source/drain regions; individuals of the first comparative digit lines being paired with individuals of the second comparative digit lines in a plurality of first/second comparative digit line sets; the first comparative digit lines and second comparative digit lines of each of the first/second comparative digit line sets extending to a sense amplifier configured to compare electrical properties of the first and second comparative digit lines within the first/second comparative digit line set;
an upper carrier-sink-structure over the second digit lines;
first extensions extending from the lower carrier-sink-structure to the first transistor body regions; the first extensions being configured to drain excess carriers from the first transistor body regions to the lower carrier-sink-structure;
second extensions extending from the upper carrier-sink-structure to the second transistor body regions; the second extensions being configured to drain excess carriers from the second transistor body regions to the upper carrier-sink-structure; and
gates having components adjacent the first and second transistor body regions.
2. The integrated assembly of claim 1 wherein the upper and lower carrier-sink-structures are coupled to a voltage source configured to provide a reference voltage to the upper and lower carrier-sink-structures.
3. The integrated assembly of claim 1 wherein the capacitors, first pillars and second pillars are together comprised by two-transistor-one-capacitor memory (2T-1C) memory cells of a memory array.
4. The integrated assembly of claim 3 wherein the memory array is within a tier; the tier being within a vertically-stacked arrangement of tiers and being over at least one other of the tiers within the vertically-stacked arrangement.
5. The integrated assembly of claim 1 wherein the upper and lower carrier-sink-structures are p-type.
6. The integrated assembly of claim 1 wherein the upper and lower carrier-sink-structures are n-type.
7. The integrated assembly of claim 1 wherein the first extensions directly contact the first transistor body regions; and wherein the second extensions directly contact the second transistor body regions.
8. The integrated assembly of claim 1 wherein the first extensions are spaced from the first transistor body regions by first intervening insulative regions; and wherein the second extensions are spaced from the second transistor body regions by second intervening insulative regions.