Distribution system for a process fluid for chemical and/or electrolytic surface treatment of a substrate
The present disclosure relates to a distribution system for a process fluid for chemical and/or electrolytic surface treatment of a substrate, a device for chemical and/or electrolytic surface treatment of a substrate in a process fluid, a use of the distribution system, and a method for manufacturing the distribution system. The distribution system comprises: a first distribution body, a substitute body, and a framework. The first distribution body is configured to direct a flow of the process fluid and/or an electrical current to the substrate. The first distribution body and the substitute body are arranged to insert the substrate between them. The framework is configured to mount the first distribution body and the substitute body relative to each other. The framework is further configured to form, together with the first distribution body and the substitute body, a casing surrounding the substrate.
1. A distribution system for a process fluid for chemical and/or electrolytic surface treatment for a substrate, comprising:
a first distribution body,
a substitute body, and
a framework,
wherein the first distribution body is configured to direct a flow of the process fluid towards the substrate and configured to direct an electrical current towards the substrate,
wherein the first distribution body and the substitute body are arranged to insert the substrate between them,
wherein the framework is configured to mount the first distribution body and the substitute body relative to each other,
wherein the framework comprises a distribution frame element comprising at least a process fluid inlet and/or a process fluid outlet, the process fluid inlet and the process fluid outlet opening directly to the first distribution body for the process fluid entering inside the first distribution body to flow through the first distribution body and leave the first distribution body from several holes provided on the first distribution body facing the substitute body for the process fluid to be directed towards the substrate, the holes being distributed along a height direction of the first distribution body for providing an equal distribution of the process fluid on the substrate,
wherein the framework is further configured to form, together with the first distribution body and the substitute body, a casing surrounding the substrate, and
wherein the casing is insertable into the distribution system as an independent unit.
2. The distribution system according to claim 1 , further comprising a tank configured to receive the casing and configured to receive an anode.
3. The distribution system according to claim 1 , further comprising two chambers, each chamber mounted to one side face of the casing, wherein each chamber is configured to receive an anode.
4. The distribution system according to claim 1 , wherein the substitute body is a second distribution body also configured to direct a flow of the process fluid and/or an electrical current to the substrate.