IP Library Granted Patent US 12,327,711
Granted Patent B2
US 12,327,711 · App. 17/790,762 · Granted Jun 10, 2025

Active gas generation apparatus

Inventors: Ren Arita (Tokyo, JP); Kensuke Watanabe (Tokyo, JP)
Assignee: TMEIC CORPORATION
H01J37/32568H01J37/32348H01J37/3244H01J37/32449H01J37/32522H01J2237/002H01J2237/038
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Quick Facts
Patent No.
US 12,327,711
App. No.
17/790,762
Granted
Jun 10, 2025
Kind
B2
Abstract

Provided in an active gas generation apparatus according to the present disclosure is a gas separation structure of separating a gas flow between an in-housing space and a discharge space by a cooling plate, an electrode holding member, and a high voltage apply electrode part. The active gas generation apparatus further includes an auxiliary metal electrode provided on an upper surface of an electrode dielectric film in the high voltage apply electrode part. The auxiliary metal electrode is provided to overlap with part of an active gas transmission path in a plan view, and set to ground potential.

Claims (38)

1. An active gas generation apparatus generating active gas obtained by activating material gas supplied to a discharge space, comprising:

a first electrode constituting part; and

a second electrode constituting part provided on a lower side of the first electrode constituting part, wherein

the first electrode constituting part includes a first electrode dielectric film and a first metal electrode formed on an upper surface of the first electrode dielectric film, the second electrode constituting part includes a second electrode dielectric film and a second metal electrode formed on a lower surface of the second electrode dielectric film, AC voltage is applied to the first metal electrode, the second metal electrode is set to ground potential, and a dielectric space where the first and second electrode dielectric films face each other includes a region where the first and second metal electrodes overlap with each other in a plan view as the discharge space, and

the second electrode dielectric film includes a gas ejection hole for ejecting the active gas to a lower side, and a path from the discharge space to the gas ejection hole is defined as an active gas transmission path,

the active gas generation apparatus further comprising

a base flange having conductivity, having a cross-section structure with a concave shape, and including a central bottom surface region and a peripheral protruding part provided along an outer periphery of the central bottom surface region to protrude in a height direction, wherein the second electrode constituting part is provided so that the second metal electrode has contact with the central bottom surface region,

the active gas generation apparatus further comprising:

a conductive structure with conductivity provided on the peripheral protruding part of the base flange and located above an upper side of the first electrode constituting part without having contact with the first electrode constituting part;

an insulating material provided between the conductive structure and the first electrode constituting part, having an upper surface having contact with a lower surface of the conductive structure, and having a lower surface having contact with the upper surface of the first metal electrode;

an electrode support member provided on the lower surface of the conductive structure to support the first electrode constituting part from a lower side; and

a metal housing provided on the peripheral protruding part of the base flange and having an in-housing space housing the conductive structure, wherein

the base flange includes:

a gas supply port receiving the material gas from outside;

a gas transmission path for supplying the material gas to the discharge space; and

a base flange gas ejection hole for ejecting the active gas ejected from the gas ejection hole to a lower side,

ground potential is supplied to the base flange,

provided is a gas separation structure of separating a gas flow between the in-housing space and the discharge space by the conductive structure, the electrode support member, and the first electrode constituting part,

the active gas generation apparatus further comprising

a third metal electrode provided on an upper surface of the first electrode dielectric film independently from the first metal electrode, wherein

the third metal electrode is provided to partially overlap with a part of the active gas transmission path in a plan view and set to ground potential.

2. The active gas generation apparatus according to claim 1 , wherein

the insulating material includes a through hole, and the through hole is provided in a region overlapping with the third metal electrode in a plan view, and

the third metal electrode is electrically connected to the conductive structure via the through hole.

3. The active gas generation apparatus according to claim 1 , wherein

the first metal electrode is annularly formed to have an opening part in a central portion in a plan view,

the third metal electrode is formed into a circular shape in a plan view, and

the third metal electrode is provided in a region overlapping with the gas ejection hole in a plan view.

4. The active gas generation apparatus according to claim 1 , further comprising

an active gas auxiliary structure provided in the dielectric space to fill part of the active gas transmission path between the discharge space and the gas ejection hole.

5. The active gas generation apparatus according to claim 4 , wherein

the second electrode dielectric film includes a dielectric protruding part protruding in a height direction to fill part of the active gas transmission path, and

the dielectric protruding part functions as the active gas auxiliary structure.

6. The active gas generation apparatus according to claim 1 , wherein

the base flange includes:

a cooling medium supply port receiving a cooling medium from outside; and

a cooling medium transmission hole for supplying the cooling medium to the conductive structure, and

the conductive structure includes a cooling medium path transmitting the cooling medium supplied through the cooling medium transmission hole to an inner portion.

Assignments (2)
CHANGE OF NAME Recorded Apr 26, 2024
From: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
To: TMEIC CORPORATION
Reel/Frame 067244/0359 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 5, 2022
From: ARITA, REN; WATANABE, KENSUKE
To: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
Reel/Frame 060395/0477 →
Priority Claims (1)
WO PCT/JP2020/045380 · Dec 7, 2020 · international
Continuity (1)
Related Publication 20230013017A1 · Jan 19, 2023
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