IP Library Granted Patent US 12,463,014
Granted Patent B2
US 12,463,014 · App. 17/792,732 · Granted Nov 4, 2025

Active gas generator

Inventors: Ren Arita (Tokyo, JP); Kensuke Watanabe (Tokyo, JP)
Assignee: TMEIC CORPORATION
H01J37/32348H01J37/3244H01J37/32532
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Quick Facts
Patent No.
US 12,463,014
App. No.
17/792,732
Granted
Nov 4, 2025
Kind
B2
Abstract

A housing in an active gas generator according to the present disclosure includes a peripheral stepped region formed along an outer periphery of a central bottom region, the peripheral stepped region being higher in formed height than the central bottom region. A high-voltage-electrode dielectric film on the peripheral stepped region forms a gas separation structure for separating a gas stream into a feeding space and an active gas generating space including a discharge space. A vacuum pump disposed outside the housing sets the feeding space under vacuum.

Claims (54)

1 . An active gas generator that supplies a material gas to a discharge space where a dielectric barrier discharge occurs, to activate the material gas and generate active gas, the active gas generator comprising:

a first electrode dielectric film;

a second electrode dielectric film formed below the first electrode dielectric film;

a first feeder disposed on an upper surface of the first electrode dielectric film, the first feeder having conductivity; and

a second feeder disposed on a lower surface of the second electrode dielectric film,

wherein an AC voltage is applied to the first feeder, the second feeder is set to ground potential, and a dielectric space in which the first electrode dielectric film faces the second electrode dielectric film includes the discharge space,

the second electrode dielectric film includes a gas outlet for ejecting the active gas downward,

the active gas generator further comprises

a housing having conductivity and accommodating the first and second electrode dielectric films and the first and second feeders, the housing including a feeding space above the first feeder,

the housing including:

a material gas inlet receiving the material gas from outside;

a gas relay region for supplying the material gas to the discharge space; and

a housing gas outlet for ejecting the active gas from the gas outlet downward,

a space from the material gas inlet to the housing gas outlet through the gas relay region and the discharge space is defined as an active gas generating space,

the housing and the first electrode dielectric film form a gas separation structure for separating a gas stream into the active gas generating space and the feeding space, and

the active gas generator further comprises

a vacuum pump disposed outside the housing and setting the feeding space under vacuum.

2 . The active gas generator according to claim 1 ,

wherein the housing includes a cooling medium inlet receiving a cooling medium from outside, and a cooling medium outlet emitting the cooling medium to the outside,

the first feeder includes:

a cooling medium input port;

a cooling medium output port; and

a cooling medium path allowing the cooling medium supplied through the cooling medium input port to flow inside and outputting the cooling medium from the cooling medium output port,

the active gas generator further comprising:

a first cooling pipe between the cooling medium inlet and the cooling medium input port; and

a second cooling pipe between the cooling medium outlet and the cooling medium output port.

3 . The active gas generator according to claim 2 ,

wherein the housing includes:

a central bottom region; and

a peripheral stepped region formed along an outer periphery of the central bottom region, the peripheral stepped region being higher in formed height than the central bottom region,

the second feeder is disposed on the central bottom region, and application of the ground potential to the housing sets the second feeder to the ground potential through the central bottom region,

the first electrode dielectric film is disposed on the peripheral stepped region, and

the peripheral stepped region and the first electrode dielectric film form the gas separation structure for separating the gas stream into the feeding space and the active gas generating space.

4 . The active gas generator according to claim 2 ,

wherein the first cooling pipe includes:

a first pair of partial cooling pipes each having conductivity; and

a first insulated joint between the first pair of partial cooling pipes, the first insulated joint having insulating properties, and

the second cooling pipe includes:

a second pair of partial cooling pipes each having conductivity; and

a second insulated joint between the second pair of partial cooling pipes, the second insulated joint having insulating properties.

5 . The active gas generator according to claim 4 ,

wherein the housing includes:

a central bottom region; and

a peripheral stepped region formed along an outer periphery of the central bottom region, the peripheral stepped region being higher in formed height than the central bottom region,

the second feeder is disposed on the central bottom region, and application of the ground potential to the housing sets the second feeder to the ground potential through the central bottom region,

the first electrode dielectric film is disposed on the peripheral stepped region, and

the peripheral stepped region and the first electrode dielectric film form the gas separation structure for separating the gas stream into the feeding space and the active gas generating space.

6 . The active gas generator according to claim 1 ,

wherein the housing includes:

a central bottom region; and

a peripheral stepped region formed along an outer periphery of the central bottom region, the peripheral stepped region being higher in formed height than the central bottom region,

the second feeder is disposed on the central bottom region, and application of the ground potential to the housing sets the second feeder to the ground potential through the central bottom region,

the first electrode dielectric film is disposed on the peripheral stepped region, and

the peripheral stepped region and the first electrode dielectric film form the gas separation structure for separating the gas stream into the feeding space and the active gas generating space.

Assignments (2)
CHANGE OF NAME Recorded Apr 26, 2024
From: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
To: TMEIC CORPORATION
Reel/Frame 067244/0359 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 14, 2022
From: ARITA, REN; WATANABE, KENSUKE
To: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
Reel/Frame 060502/0059 →
Continuity (1)
Related Publication 20230025809A1 · Jan 26, 2023
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