IP Library Patent Application 17795456
Patent Application
App. No. 17/795,456

SYSTEM FOR HAZARDOUS MATERIAL DESTRUCTION

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Quick Facts
Patent No.
US None
App. No.
17/795,456
Abstract

Embodiments of the present disclosure relate generally to a method, apparatus and system for the destruction of hazardous material including Per- and Polyfluoroalkyl substances. The method, apparatus and system can include non-concentrated hazardous material or the concentration of the hazardous material into granular activated charcoal or other absorbents and a vacuum controlled loading system for a re-usable or non-reusable container to minimize leakage of the hazardous material into the atmosphere.

Claims (18)

1 . A system for the destruction of a hazardous material, the system comprising:

a thermal chamber to break down the hazardous material via thermal processing; and

a vacuum controlled loading system configured to minimize a leakage of the hazardous material into a surrounding environment.

2 . A system for the destruction of a hazardous material, the system comprising:

a plasma assisted thermal chamber to break down the hazardous material;

and a vacuum controlled loading system configured to minimize a leakage of the hazardous material into a surrounding environment.

3 . The system as in any one of claim 1 or 2 , wherein the hazardous material includes at least one of Perfluoroalkyl and Polyfluoroalkyl substances.

4 . The system as in any one of claim 1 or 2 , wherein the hazardous material includes at least one of Perfluoroalkyl and Polyfluoroalkyl substances that have been stripped and concentrated from a carrier media into an absorbent material.

5 . The system of claim 4 , wherein the carrier media is a fluid.

6 . The system of claim 4 , wherein the carrier media includes water.

7 . The system of claim 4 , wherein the absorbent material includes activated charcoal.

8 . The system of claim 4 , wherein the absorbent material includes granular activated charcoal.

9 . The system as in any one of claim 1 or 2 , wherein the hazardous material includes at least one of Perfluoroalkyl and Polyfluoroalkyl substances that have been stripped and concentrated from a carrier media into an absorbent material and processed for destruction in a re-usable vessel.

10 . The system as in any one of claim 1 or 2 , wherein the hazardous material includes at least one of Perfluoroalkyl and Polyfluoroalkyl substances, the at least one of the Perfluoroalkyl and Polyfluoroalkyl substances being stripped and concentrated from a carrier media into an absorbent material and processed for destruction in a non-reusable vessel, wherein the vessel is fed into and processed for destruction in the thermal chamber.

11 . The system as in any one of claim 1 or 2 , wherein the hazardous material includes at least one of Perfluoroalkyl and Polyfluoroalkyl substances that are stripped and concentrated from a carrier media into an absorbent material and processed for destruction in a non-reusable vessel which is punctured to aid in its pressure release during the thermal processing.

12 . The system as in any one of claim 1 or 2 , wherein the hazardous material includes at least one of Perfluoroalkyl and Polyfluoroalkyl substances, and wherein the hazardous material is not concentrated from a carrier media before being processed for destruction in a re-usable vessel.

13 . The system as in any one of claim 1 or 2 , wherein the hazardous material includes at least one of Perfluoroalkyl and Polyfluoroalkyl substances, and wherein the hazardous material is not concentrated from a carrier media before being processed for destruction in a non-reusable vessel.

14 . The system as in any one of claim 1 or 2 , wherein the hazardous material includes at least one of Perfluoroalkyl and Polyfluoroalkyl substances, wherein the hazardous material is not concentrated from a carrier media before being processed for destruction in a non-reusable vessel, wherein the non-reusable vessel is punctured to aid in thermal processing before it is fed into the thermal chamber and processed for destruction.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 21, 2024
From: HELIOS ENVIRONMENTAL ADVANCED TECHNOLOGIES, LLC; XDI HOLDINGS, LLC; RADWASTE TECHNOLOGIES, LLC; PLASMA TECH HOLDINGS, LLC; PLASMA POWER, LLC; ADVANCED PETRO TECHNOLOGIES, LLC; CRU TECHNOLOGIES, LLC
To: HEAT IP HOLDCO, LLC
Reel/Frame 067484/0316 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 27, 2022
From: JURANITCH, JAMES CHARLES
To: PLASMA TECH HOLDINGS, LLC
Reel/Frame 061229/0412 →