IP Library Granted Patent US 12,164,099
Granted Patent B2
US 12,164,099 · App. 17/849,263 · Granted Dec 10, 2024

Observation apparatus

Inventors: Kentaro Yamazaki (Tokyo, JP); Kenji Kawasaki (Tokyo, JP); Kenichi Kusaka (Tokyo, JP); Izumi Shomura (Tokyo, JP)
Assignee: Evident Corporation
G02B21/368G02B21/0032G02B21/0044
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Quick Facts
Patent No.
US 12,164,099
App. No.
17/849,263
Granted
Dec 10, 2024
Kind
B2
Abstract

An observation apparatus includes a display apparatus that displays a display pattern, a display projection optical system that projects a light beam from the display apparatus, and forms an image of the display pattern, a combining optical element that combines a light beam from a sample and a light beam from the display apparatus, and an eyepiece optical system that enables an observer to simultaneously observe an image of the sample and an image of the display pattern, in which a numerical aperture (NA) of a light beam from the display apparatus is smaller than a maximum value of an NA of a light beam from the sample, and is larger than a minimum value of an NA of a light beam from the sample, at a position of an image on an optical path that is formed after light beams are combined by the combining optical element.

Claims (88)

1. An observation apparatus comprising:

an observation optical system configured to image a light beam from a sample, and form an image of the sample;

a display apparatus configured to display a display pattern;

a display projection optical system configured to project a light beam from the display apparatus, and form an image of the display pattern at a position at which the image of the sample is formed;

a combining optical element configured to combine the light beam from the sample and the light beam from the display apparatus; and

an eyepiece optical system through which an image of the sample and an image of the display pattern are simultaneously observable by an observer,

wherein:

a numerical aperture (NA) of the light beam from the display apparatus is smaller than a maximum value of an NA of the light beam from the sample, and is larger than a minimum value of the NA of the light beam from the sample, at a position of an image on an optical path that is formed after the light beam from the sample and the light beam from the display apparatus are combined by the combining optical element, and

the observation apparatus satisfies the following conditional expression (1):

WD×α>R/ 10  (1),

where a distance from the display apparatus to an optical member of the display projection optical system that is closest to the display apparatus is denoted by WD, an NA of a light beam taken in by the display projection optical system from the display apparatus is denoted by a, and a circumradius of a display region of the display apparatus is denoted by R.

2. The observation apparatus according to claim 1 , wherein the image on the optical path that is formed after the light beam from the sample and the light beam from the display apparatus are combined by the combining optical element includes a virtual image formed by the eyepiece optical system.

3. The observation apparatus according to claim 1 , further comprising:

an image sensor configured to capture an image of the sample;

an image capturing optical system configured to image a light beam from the sample onto the image sensor; and

a splitting optical element configured to guide at least a part of light beams from the sample to the image sensor,

wherein the splitting optical element is arranged on an optical path between the sample and the combining optical element.

4. The observation apparatus according to claim 3 , wherein the observation apparatus satisfies the following conditional expression (2):

0.5< Dc/Do< 2.0  (2),

where an imaging range on the sample that is generated by the image sensor is denoted by Dc, and an observation range on the sample that is generated by the observation optical system is denoted by Do.

5. The observation apparatus according to claim 3 , wherein the observation apparatus satisfies the following conditional expression (3):

P pro× MG pro> Pc×MGo/MGc   (3),

where a size of each pixel of the display apparatus is denoted by Ppro, a size of each pixel of the image sensor is denoted by Pc, a projection magnification from the sample to the image sensor is denoted by MGc, a projection magnification from the display apparatus to a position of an image of the sample is denoted by MGpro, and a projection magnification from the sample to the position of the image of the sample is denoted by Mgo.

6. The observation apparatus according to claim 1 , wherein:

the observation optical system includes:

an objective optical system configured to convert light beams from the sample into approximately-parallel light beams; and

an imaging optical system configured to image the approximately-parallel light beams, and form the image of the sample that is formed by the observation optical system, and

the combining optical element is arranged on an optical path between the objective optical system and the imaging optical system.

7. The observation apparatus according to claim 1 , further comprising an eye separation optical element configured to split light beams to both left and right eyes of the observer,

wherein the eye separation optical element is arranged closer to the observer than the combining optical element.

8. The observation apparatus according to claim 6 , further comprising a display splitting optical element configured to split light beams from the display apparatus,

wherein the display splitting optical element is arranged closer to the display apparatus than the combining optical element.

9. The observation apparatus according to claim 1 , wherein the combining optical element is a refractive surface of a lens included in the observation optical system or the eyepiece optical system, and reflects a part of light beams from the display apparatus and lets through a part of light beams from the sample.

10. The observation apparatus according to claim 1 , wherein the combining optical element is a diffractive light guiding element arranged in approximately-parallel light beams.

11. The observation apparatus according to claim 10 , wherein:

the observation optical system includes:

an objective optical system configured to convert light beams from the sample into approximately-parallel light beams; and

an imaging optical system configured to image the approximately-parallel light beams, and form the image of the sample that is formed by the observation optical system, and

the combining optical element is arranged on an optical path between the objective optical system and the imaging optical system.

12. The observation apparatus according to claim 10 , wherein the combining optical element is arranged on an optical path between the eyepiece optical system and an eye of the observer.

13. The observation apparatus according to claim 1 , wherein the combining optical element is a dihedral corner reflector array (DCRA) arranged in approximately-parallel light beams.

14. The observation apparatus according to claim 1 , wherein the combining optical element is a diffuser panel configured to let through a part of light beams from the sample and reflect, in a scattering manner, a part of light beams from the display apparatus, and is arranged at a position of an image of the sample that is formed by the observation optical system, or a position conjugate with the position.

15. The observation apparatus according to claim 1 , wherein;

the observation optical system includes a plurality of objective lenses having different magnifications, and

an objective lens inserted into an optical path is selectable from among the plurality of objective lenses.

16. The observation apparatus according to claim 1 , wherein the observation optical system includes a zooming optical system.

17. The observation apparatus according to claim 1 , wherein the observation apparatus comprises a microscope.

18. An observation apparatus comprising:

an observation optical system configured to image a light beam from a sample, and form an image of the sample;

a display apparatus configured to display a display pattern;

a display projection optical system configured to project a light beam from the display apparatus, and form an image of the display pattern at a position at which the image of the sample is formed;

a combining optical element configured to combine the light beam from the sample and the light beam from the display apparatus; and

an eyepiece optical system through which an image of the sample and an image of the display pattern are simultaneously observable by an observer,

wherein:

a numerical aperture (NA) of the light beam from the display apparatus is smaller than a maximum value of an NA of the light beam from the sample, and is larger than a minimum value of the NA of the light beam from the sample, at a position of an image on an optical path that is formed after the light beam from the sample and the light beam from the display apparatus are combined by the combining optical element,

the observation optical system includes:

a primary imaging optical system configured to form an intermediate image conjugate with the image of the sample that is formed by the observation optical system;

a first field lens configured to convert light beams from the intermediate image into approximately-parallel light beams; and

a second field lens configured to image the approximately-parallel light beams, and form the image of the sample that is formed by the observation optical system, and

the combining optical element is arranged on an optical path between the first field lens and the second field lens.

19. The observation apparatus according to claim 18 , wherein:

the display projection optical system converts light beams from the display apparatus into approximately-parallel light beams, and

a focal length of the display projection optical system is shorter than a focal length of the second field lens.

20. An observation apparatus comprising:

an observation optical system configured to image a light beam from a sample, and form an image of the sample;

a display apparatus configured to display a display pattern;

a display projection optical system configured to project a light beam from the display apparatus, and form an image of the display pattern at a position at which the image of the sample is formed;

a combining optical element configured to combine the light beam from the sample and the light beam from the display apparatus; and

an eyepiece optical system through which an image of the sample and an image of the display pattern are simultaneously observable by an observer,

wherein:

a numerical aperture (NA) of the light beam from the display apparatus is smaller than a maximum value of an NA of the light beam from the sample, and is larger than a minimum value of the NA of the light beam from the sample, at a position of an image on an optical path that is formed after the light beam from the sample and the light beam from the display apparatus are combined by the combining optical element,

the observation optical system includes:

a primary imaging optical system configured to form an intermediate image conjugate with the image of the sample that is formed by the observation optical system;

a first field lens configured to convert light beams from the intermediate image into approximately-parallel light beams; and

a second field lens configured to image the approximately-parallel light beams that have been converted by the first field lens, and form the image of the sample that is formed by the observation optical system,

the primary imaging optical system includes:

an objective optical system configured to convert light beams from the sample into approximately-parallel light beams; and

an imaging optical system configured to image the approximately-parallel light beams that have been converted by the objective optical system, and form the intermediate image formed by the primary imaging optical system, and

the combining optical element is arranged on an optical path between the objective optical system and the imaging optical system.

21. An observation apparatus comprising:

an observation optical system configured to image a light beam from a sample, and form an image of the sample;

a display apparatus configured to display a display pattern;

a display projection optical system configured to project a light beam from the display apparatus, and form an image of the display pattern at a position at which the image of the sample is formed;

a combining optical element configured to combine the light beam from the sample and the light beam from the display apparatus; and

an eyepiece optical system through which an image of the sample and an image of the display pattern are simultaneously observable by an observer,

wherein:

a numerical aperture (NA) of the light beam from the display apparatus is smaller than a maximum value of an NA of the light beam from the sample, and is larger than a minimum value of the NA of the light beam from the sample, at a position of an image on an optical path that is formed after the light beam from the sample and the light beam from the display apparatus are combined by the combining optical element, and

the combining optical element is a turn-back optical system having an adjustable eye width.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 7, 2022
From: OLYMPUS CORPORATION
To: EVIDENT CORPORATION
Reel/Frame 061008/0214 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 24, 2022
From: YAMAZAKI, KENTARO; KAWASAKI, KENJI; KUSAKA, KENICHI; SHOMURA, IZUMI
To: OLYMPUS CORPORATION
Reel/Frame 060309/0930 →
Priority Claims (1)
JP 2021-108359 · Jun 30, 2021 · national
Continuity (1)
Related Publication 20230003990A1 · Jan 5, 2023