Ionomer components comprising selectively deposited catalysts and methods of making and using the same
Embodiments of ionomer components comprising selectively deposited catalysts are described. The ionomer component comprise a catalyst that is preferentially deposited on or in the vicinity of the ionomer component over other areas of electrochemical components that do not comprise the ionomer component. Also disclosed herein are novel methods and apparatus embodiments used to make the disclosed ionomer components and devices comprising the same.
1. A method, comprising:
providing an electrode comprising a gas diffusion layer, wherein the gas diffusion layer comprises (i) a microporous layer having an ionomer component embedded thereon and/or therein, and (ii) a base layer that does not comprise the ionomer component;
providing a catalyst precursor;
positioning the electrode adjacent to the catalyst precursor such that the catalyst precursor is positioned directly adjacent to the base layer of the gas diffusion layer such that the base layer is positioned between the catalyst precursor and the microporous layer;
heating the electrode and the catalyst precursor at a temperature sufficient to vaporize the catalyst precursor thereby providing a vaporized catalyst precursor; and
depositing a catalyst formed from the vaporized catalyst precursor on the ionomer component of the microporous layer of the gas diffusion layer of the electrode, wherein the catalyst is not deposited on the base layer.
2. The method of claim 1 , wherein the ionomer component is patterned onto or into the microporous layer.
3. The method of claim 1 , wherein the electrode comprises a low surface energy material in the microporous layer and wherein the catalyst is not deposited on the low surface energy material.
4. The method of claim 3 , wherein the low surface energy material is a conductive material selected from carbon fibers, carbon nanostructures, and/or carbon catalyst materials.
5. The method of claim 1 , wherein the catalyst precursor is positioned adjacent to the base layer of the gas diffusion layer but does not contact the base layer prior to heating and any vaporization of the catalyst precursor.
6. The method of claim 1 , wherein the temperature ranges from 110° C. to 300° C.
7. The method of claim 1 , further comprising exposing the catalyst precursor, the ionomer component, the gas diffusion layer, or any combination thereof to an active agent, an acid, or a combination thereof.