IP Library Granted Patent US 12,280,395
Granted Patent B2
US 12,280,395 · App. 17/906,496 · Granted Apr 22, 2025

Process for forming a coating

Inventors: Miguel Galvez (Danvers, MA); Bong June Zhang (Chestnut Hill, MA)
Assignee: Henkel AG & Co. KGaA
B05D1/02B05D3/0272B05D3/107C03C17/30C08G77/045C09D5/021C09D7/20C09D183/06C03C2217/70C03C2218/112
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Quick Facts
Patent No.
US 12,280,395
App. No.
17/906,496
Granted
Apr 22, 2025
Kind
B2
Abstract

A process for forming a coating on a substrate including atomizing a formulation and applying the formulation to a substrate to form a coating on a substrate.

Claims (25)

1. A process for forming a coating on a substrate, the process comprising,

(a) providing a substrate having a substrate surface;

(b) providing a formulation comprising a halogenated alkyl silane and a solvent;

(c) atomizing the formulation with a nozzle at an atomization pressure of about 150 kPa to about 300 kPa and at a flow rate of about 1 ml/min to about 50 ml/min to form an atomized formulation; and

(d) applying the atomized formulation to the substrate surface at a distance of about 8 cm to about 50 cm from the nozzle,

wherein the coating has a water contact angle less than 100°; and

wherein the halogenated alkyl silane is of the formula

(R A ) 3 SiR B ,

wherein each R A is independently —OC 1 -C 6 alkyl, —OC 2 -C 6 alkenyl, or —OC 2 -C 6 alkynyl; and

R B is C 1 -C 20 alkyl, C 2 -C 20 alkenyl, or C 2 -C 20 alkynyl.

2. The process of claim 1 , wherein the substrate comprises glass, anti-reflective coated glass, adhesion-primed glass, metal, coated metal, plastic, or coated plastic.

3. The process of claim 1 , wherein the coating is about 0.1 nm to about 500 nm thick.

4. The process of claim 1 , wherein the coating is about 0.1 nm to about 100 nm thick.

5. The process of claim 1 , the coating is about 0.1 nm to about 30 nm thick.

6. The process of claim 1 , wherein the coating has a diiodomethane contact angle of less than 50°.

7. The process of claim 1 , wherein the coating has a diiodomethane contact angle of about 25° to about 45°.

8. The process of claim 1 , wherein the water contact angle is greater than 65°.

9. The process of claim 1 , wherein the coating maintains a water contact angle above 50 degrees after 3,000 cycles of eraser abrasion.

10. The process of claim 1 , wherein the halogenated alkyl silane is present in the formulation at about 0.1% to about 10% by weight of the formulation.

11. The process of claim 1 , wherein the halogenated alkyl silane is present in the formulation at about 0.1% to about 5% by weight of the formulation.

12. The process of claim 1 , wherein the halogenated alkyl silane is present in the formulation at about 0.1% to about 1% by weight of the formulation.

13. The process of claim 1 , wherein the step of providing is performed at a flow rate of about 5 ml/min to about 20 ml/min.

14. The process of claim 1 , wherein the step of providing is performed at a flow rate of about 8 ml/min to about 15 ml/min.

15. The process of claim 1 , wherein the solvent comprises an alcohol.

16. The process of claim 1 , wherein the solvent is ethanol.

Assignments (3)
CORRECTIVE ASSIGNMENT TO REMOVE U.S. PATENT NOS. 10,525,504 AND U.S. PATENT APPLICATION NO. 14/268,757 PREVIOUSLY RECORDED AT REEL: 065406 FRAME: 0320. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Mar 13, 2025
From: NBD NANOTECHNOLOGIES INC.
To: HENKEL AG & CO. KGAA
Reel/Frame 070510/0967 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 19, 2024
From: GALVEZ, MIGUEL; ZHANG, BONG JUNE
To: NBD NANOTECHNOLOGIES, INC.
Reel/Frame 066178/0347 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 31, 2023
From: NBD NANOTECHNOLOGIES INC.
To: HENKEL AG & CO. KGAA
Reel/Frame 065406/0320 →
Priority Claims (1)
CN 202010191195.8 · Mar 18, 2020 · national
Continuity (1)
Related Publication 20230057529A1 · Feb 23, 2023
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