IP Library › Granted Patent US 12,600,157
Granted Patent B2
US 12,600,157 · App. 17/910,404 · Granted Apr 14, 2026

Printing compositions and methods therefor

Inventors: Stanley Litman (Amherst, NY); Tom Huang (East Amherst, NY); Morgan Ashley Edwards (East Amherst, NY); Lawrence Albe Pilon (Hamburg, NY); Kevin John Hook (Grand Island, NY)
Assignee: Cryovac, LLC
B41M5/0047B41M5/0064B41M7/009C09D11/322C09D11/38B41M2205/12C08L2201/54
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,600,157
App. No.
17/910,404
Granted
Apr 14, 2026
Kind
B2
Abstract

According to one aspect, a printing composition of the present application comprises from about 10.00% to about 14.00% by weight of a pigment, from about 3.00% to about 7.00% by weight of a polymer, from about 15.00% to about 19.00% by weight of a co-solvent, from about 0.20% to about 0.40% by weight of a surfactant, and water.

Claims (24)

1 . A water-based printing composition for printing on a heat-shrinkable substrate, comprising:

from about 10.00% to about 14.00% by weight of a titanium dioxide pigment;

from about 3.00% to about 7.00% by weight of a polymer;

from about 15.00% to about 19.00% by weight of a co-solvent, wherein the co-solvent is 3-methoxy-3-methyl-1-butanol;

from about 0.20% to about 0.40% by weight of a surfactant; and

at least 50.00% water;

the water-based printing composition having a surface tension of at least 31.0 dynes/cm;

wherein the co-solvent has an evaporation profile that allows drying and adherence of the printing composition applied to the heat-shrinkable substrate at a temperature up to the threshold for dimensional integrity of the heat-shrinkable substrate.

2 . The printing composition of claim 1 , wherein the printing composition has a viscosity from about 2 cP to about 10 cP.

3 . The printing composition of claim 1 , wherein the pigment is an anionic pigment or pigment dispersion with a white color index.

4 . The printing composition of claim 3 , wherein the pigment dispersion comprises water.

5 . The printing composition of claim 1 , wherein the surfactant is a silicone surfactant.

6 . The printing composition of claim 5 , wherein the silicone surfactant is a polyether modified polysiloxane.

7 . The printing composition of claim 1 , wherein the polymer is anionic.

8 . The printing composition of claim 1 , wherein the polymer is a waterborne polyurethane dispersion.

9 . The printing composition of claim 1 , wherein the at least one of the pigment, the polymer, the co-solvent, and the surfactant when applied and dried on a substrate, release amounts of chemicals under the limits specified in Swiss Ordinance RS 817.023.21 of May 2017.

10 . The printing composition of claim 1 , wherein the pigment, the polymer, the co-solvent, and the surfactant when applied and dried on a substrate, release amounts of chemicals under the limits specified in Swiss Ordinance RS 817.023.21 of May 2017.

11 . The printing composition of claim 10 , wherein the pigment, the polymer, the co-solvent, and the surfactant are Swiss Ordinance RS 817.023.21 compliant.

12 . The printing composition of claim 1 , wherein the printing composition is an ink jet ink.

13 . A method of printing on a heat-shrinkable substrate, comprising:

providing a heat-shrinkable substrate;

applying a water-based printing composition to a surface of the substrate, the printing composition comprising from about 10.00% to about 14.00% by weight of a titanium dioxide pigment, from about 3.00% to about 7.00% by weight a of polymer, from about 15.00% to about 19.00% by weight of a co-solvent, wherein the co-solvent is 3-methoxy-3-methyl-1-butanol, from about 0.20% to about 0.40% by weight of a surfactant, and at least 50.00% water; and

drying the substrate, wherein the substrate remains below a temperature such to not exceed a threshold for dimensional integrity of the substrate; the water-based printing composition having a surface tension of at least 31.0 dynes/cm;

wherein the co-solvent has an evaporation profile that allows drying and adherence of the printing composition applied to the heat-shrinkable substrate at a temperature up to the threshold for dimensional integrity of the heat-shrinkable substrate.

Assignments (5)
SECURITY INTEREST Recorded Apr 13, 2026
From: SEALED AIR CORPORATION; CRYOVAC, LLC; SHANKLIN CORPORATION; SEALED AIR IP HOLDINGS, LLC; SEALED AIR CORPORATION (US)
To: WILMINGTON TRUST, NATIONAL ASSOCIATION
Reel/Frame 075384/0016 →
RELEASE OF SECURITY INTEREST Recorded Apr 10, 2026
From: BANK OF AMERICA, N.A., AS AGENT
To: CRYOVAC, LLC
Reel/Frame 075376/0973 →
SECURITY INTEREST Recorded Apr 9, 2026
From: SEALED AIR CORPORATION; CRYOVAC, LLC; SHANKLIN CORPORATION; SEALED AIR IP HOLDINGS, LLC; SEALED AIR CORPORATION (US)
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 075378/0512 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 6, 2025
From: LITMAN, STANLEY; HUANG, TOM; EDWARDS, MORGAN ASHLEY; PION, LAWRENCE ALBE; HOOK, KEVIN JOHN
To: CRYOVAC, LLC
Reel/Frame 072811/0120 →
SECURITY INTEREST Recorded Oct 31, 2025
From: CRYOVAC, LLC
To: BANK OF AMERICA, N.A., AS AGENT
Reel/Frame 073428/0495 →
Continuity (2)
Provisional Application 62988618 · Mar 12, 2020
Related Publication 20240010019A1 · Jan 11, 2024
References Cited (173)
US 3450791A · Sekmakas et al. · 1969 [cited by applicant]
US 5091444A · Bauer et al. · 1992 [cited by applicant]
US 5352283A · Beach et al. · 1994 [cited by applicant]
US 5397387A · Deng et al. · 1995 [cited by applicant]
US 5453122A · Lyor · 1995 [cited by applicant]
US 5556925A · Kousaka et al. · 1996 [cited by applicant]
US 5652286A · Deng · 1997 [cited by applicant]
US 5744519A · Heraud et al. · 1998 [cited by applicant]
US 5760123A · Vogt-Birnbrich et al. · 1998 [cited by applicant]
US 5800601A · Zou et al. · 1998 [cited by applicant]
US 5814701A · Catena et al. · 1998 [cited by applicant]
US 5825391A · Yang · 1998 [cited by applicant]
US 5874488A · Wang et al. · 1999 [cited by applicant]
US 5958169A · Titterington et al. · 1999 [cited by applicant]
US 6028126A · Wang et al. · 2000 [cited by applicant]
US 6060541A · Anderson et al. · 2000 [cited by applicant]
US 6069218A · Vogt-Birnbrich et al. · 2000 [cited by applicant]
US 6103780A · Matzinger et al. · 2000 [cited by applicant]
US 6136382A · Kamen et al. · 2000 [cited by applicant]
US 6136890A · Carlson et al. · 2000 [cited by applicant]
US 6179417B1 · Lowry et al. · 2001 [cited by applicant]
US 6312858B1 · Yacobucci · 2001 [cited by applicant]
US 6437041B1 · Bosch et al. · 2002 [cited by applicant]
US 6531228B1 · Bartelink et al. · 2003 [cited by applicant]
US 6670002B1 · Sekiguchi et al. · 2003 [cited by applicant]
US 6682779B1 · Wefringhaus et al. · 2004 [cited by applicant]
US 6780231B2 · Scholz et al. · 2004 [cited by applicant]
US 6794425B1 · Ellis et al. · 2004 [cited by applicant]
US 6852763B2 · Noda · 2005 [cited by applicant]
US 6863389B2 · Merz et al. · 2005 [cited by applicant]
US 6905732B1 · Dunshee et al. · 2005 [cited by applicant]
US 6986808B2 · Fu et al. · 2006 [cited by applicant]
US 7022385B1 · Nasser · 2006 [cited by applicant]
US 7132014B2 · Mizutani et al. · 2006 [cited by applicant]
US 7176248B2 · Valentini et al. · 2007 [cited by applicant]
US 7374605B2 · Chung et al. · 2008 [cited by applicant]
US 7513945B2 · Nakano et al. · 2009 [cited by applicant]
US 7637605B2 · Mukata et al. · 2009 [cited by applicant]
US 7649030B2 · Tu · 2010 [cited by applicant]
US 7740694B2 · Sharmin et al. · 2010 [cited by applicant]
US 7785410B2 · Renner et al. · 2010 [cited by applicant]
US 7828426B2 · Brust et al. · 2010 [cited by applicant]
US 7871467B2 · Sano et al. · 2011 [cited by applicant]
US 7872060B2 · Schmid et al. · 2011 [cited by applicant]
US 7942960B2 · Sano et al. · 2011 [cited by applicant]
US 7988777B2 · Tanoue et al. · 2011 [cited by applicant]
US 8025918B2 · Broguiere et al. · 2011 [cited by applicant]
US 8092003B2 · Sloan · 2012 [cited by applicant]
US 8142559B2 · Robertson et al. · 2012 [cited by applicant]
US 8187371B2 · Brust et al. · 2012 [cited by applicant]
US 8192008B2 · Brust et al. · 2012 [cited by applicant]
US 8227524B2 · Rolly · 2012 [cited by applicant]
US 8267505B2 · Jolly et al. · 2012 [cited by applicant]
US 8313572B2 · Oyanagi et al. · 2012 [cited by applicant]
US 8430492B2 · Falkner et al. · 2013 [cited by applicant]
US 8465580B2 · Tanoue et al. · 2013 [cited by applicant]
US 8476332B2 · Jeremic · 2013 [cited by applicant]
US 8480223B2 · Shibata · 2013 [cited by applicant]
US 8492456B2 · Chen et al. · 2013 [cited by applicant]
US 8563634B2 · Deiner et al. · 2013 [cited by applicant]
US 8573762B1 · Prasad · 2013 [cited by applicant]
US 8574356B2 · Kagata et al. · 2013 [cited by applicant]
US 8623126B1 · Brust et al. · 2014 [cited by applicant]
US 8664331B2 · Richards · 2014 [cited by applicant]
US 8716390B2 · Reisacher et al. · 2014 [cited by applicant]
US 8759418B2 · Li et al. · 2014 [cited by applicant]
US 8841357B2 · Nagahama et al. · 2014 [cited by applicant]
US 8939568B2 · Stoeva et al. · 2015 [cited by applicant]
US 8940821B2 · Brust et al. · 2015 [cited by applicant]
US 9085150B2 · Aoyama · 2015 [cited by applicant]
US 9090734B2 · Kraiter et al. · 2015 [cited by applicant]
US 9187665B2 · Vasudevan et al. · 2015 [cited by applicant]
US 9228096B2 · Overbeerk et al. · 2016 [cited by applicant]
US 9249326B2 · Robertson et al. · 2016 [cited by applicant]
US 9309438B2 · Lindekens et al. · 2016 [cited by applicant]
US 9375031B2 · Boccacci · 2016 [cited by applicant]
US 9376582B1 · Dannhauser et al. · 2016 [cited by applicant]
US 9434201B2 · Dannhauser et al. · 2016 [cited by applicant]
US 9446604B2 · Sarkisian et al. · 2016 [cited by applicant]
US 9493013B2 · Chen et al. · 2016 [cited by applicant]
US 9790380B2 · Verheggen et al. · 2017 [cited by applicant]
US 9868869B2 · Litman et al. · 2018 [cited by applicant]
US 10604667B2 · Pilon et al. · 2020 [cited by applicant]
US 10738208B2 · Ingle et al. · 2020 [cited by applicant]
US 20010037749A1 · Ogawa et al. · 2001 [cited by applicant]
US 20030144375A1 · Wu et al. · 2003 [cited by applicant]
US 20030184629A1 · Valentini · 2003 [cited by examiner]
US 20040085419A1 · Yau et al. · 2004 [cited by applicant]
US 20050025880A1 · Masuda · 2005 [cited by applicant]
US 20050182154A1 · Berge et al. · 2005 [cited by applicant]
US 20060001725A1 · Nagata et al. · 2006 [cited by applicant]
US 20060100308A1 · Yau et al. · 2006 [cited by applicant]
US 20060109327A1 · Diamond et al. · 2006 [cited by applicant]
US 20060257760A1 · Mori et al. · 2006 [cited by applicant]
US 20070142572A1 · Ogawa et al. · 2007 [cited by applicant]
US 20070289487A1 · Ham et al. · 2007 [cited by applicant]
US 20080006175A1 · King et al. · 2008 [cited by applicant]
US 20080081124A1 · Sano et al. · 2008 [cited by applicant]
US 20080207805A1 · Blease et al. · 2008 [cited by applicant]
US 20080207811A1 · Brust et al. · 2008 [cited by applicant]
US 20080226880A1 · Parra Pastor et al. · 2008 [cited by applicant]
US 20080227356A1 · Poruthoor et al. · 2008 [cited by applicant]
US 20080254228A1 · Kojima et al. · 2008 [cited by applicant]
US 20080282932A1 · Kiyomoto · 2008 [cited by examiner]
US 20080317957A1 · Overbeek et al. · 2008 [cited by applicant]
US 20090169748A1 · House et al. · 2009 [cited by applicant]
US 20090169749A1 · Brust et al. · 2009 [cited by applicant]
US 20090182098A1 · Sano et al. · 2009 [cited by applicant]
US 20090213151A1 · Dannhauser et al. · 2009 [cited by applicant]
US 20090246484A1 · Kumagai et al. · 2009 [cited by applicant]
US 20090306285A1 · Li et al. · 2009 [cited by applicant]
US 20100239761A1 · Haenen et al. · 2010 [cited by applicant]
US 20100304057A1 · Zeng et al. · 2010 [cited by applicant]
US 20110032303A1 · Li · 2011 [cited by applicant]
US 20110058006A1 · Kobayashi · 2011 [cited by applicant]
US 20110239903A1 · Sujeeth et al. · 2011 [cited by applicant]
US 20120001980A1 · Ichinose et al. · 2012 [cited by applicant]
US 20120004348A1 · Reisacher et al. · 2012 [cited by applicant]
US 20120021193A1 · Lecolley et al. · 2012 [cited by applicant]
US 20120108717A1 · Park et al. · 2012 [cited by applicant]
US 20120135209A1 · Becker et al. · 2012 [cited by applicant]
US 20120223999A1 · Kraiter et al. · 2012 [cited by applicant]
US 20120306976A1 · Kitagawa et al. · 2012 [cited by applicant]
US 20120314009A1 · Kashara · 2012 [cited by applicant]
US 20120321863A1 · O'Donnell et al. · 2012 [cited by applicant]
US 20120329921A1 · Vasudevan et al. · 2012 [cited by applicant]
US 20130021406A1 · Stoeva et al. · 2013 [cited by applicant]
US 20130162722A1 · Brust et al. · 2013 [cited by applicant]
US 20130165618A1 · Brust et al. · 2013 [cited by applicant]
US 20130201250A1 · Berge · 2013 [cited by applicant]
US 20130221288A1 · Liu et al. · 2013 [cited by applicant]
US 20130224445A1 · Donohoe et al. · 2013 [cited by applicant]
US 20130237661A1 · Brust et al. · 2013 [cited by applicant]
US 20130265376A1 · Gil-Torrente et al. · 2013 [cited by applicant]
US 20130286087A1 · Berge · 2013 [cited by applicant]
US 20130307914A1 · Chen et al. · 2013 [cited by applicant]
US 20140017461A1 · Matsuyama · 2014 [cited by applicant]
US 20140022321A1 · Komatsu · 2014 [cited by applicant]
US 20140037913A1 · Nagahama et al. · 2014 [cited by applicant]
US 20140118449A1 · Sarkisian et al. · 2014 [cited by applicant]
US 20140134337A1 · Overbeerk et al. · 2014 [cited by applicant]
US 20140161985A1 · Gane et al. · 2014 [cited by applicant]
US 20140240399A1 · Saito et al. · 2014 [cited by applicant]
US 20140364548A1 · Everhardus et al. · 2014 [cited by applicant]
US 20150038641A1 · Gobelt et al. · 2015 [cited by applicant]
US 20150118452A1 · Ohashi et al. · 2015 [cited by applicant]
US 20150119510A1 · Eliyahu et al. · 2015 [cited by applicant]
US 20150183192A1 · Bhattacharya et al. · 2015 [cited by applicant]
US 20150184010A1 · Okada · 2015 [cited by examiner]
US 20150191602A1 · Denda · 2015 [cited by applicant]
US 20150210859A1 · Denda et al. · 2015 [cited by applicant]
US 20150225285A1 · Domey et al. · 2015 [cited by applicant]
US 20150315393A1 · Xu et al. · 2015 [cited by applicant]
US 20150344708A1 · Niu et al. · 2015 [cited by applicant]
US 20160166446A1 · Warner et al. · 2016 [cited by applicant]
US 20170009092A1 · Gotou · 2017 [cited by examiner]
US 20170096570A1 · Litman et al. · 2017 [cited by applicant]
US 20170137648A1 · Seki et al. · 2017 [cited by applicant]
US 20170321084A1 · Huang et al. · 2017 [cited by applicant]
US 20180001669A1 · Furukawa · 2018 [cited by examiner]
US 20180016743A1 · Kido et al. · 2018 [cited by applicant]
US 20200047532A1 · Deighton et al. · 2020 [cited by applicant]
US 20200377762A1 · Deighton et al. · 2020 [cited by applicant]
US 20230030249A1 · Sugihara · 2023 [cited by examiner]
EP 2927287 · 2015 [cited by applicant]
WO 2017193039 · 2017 [cited by applicant]
WO 2018156195 · 2018 [cited by applicant]
Chemical Characterisation of Polyurethanes, May 14, 2018. [cited by applicant]
Kyocera Flexible Package Printer, Jul. 9, 2019. [cited by applicant]
Takelac WS-4000 Polyurethane Resin Technical Datasheet, Apr. 25, 2018. [cited by applicant]
Takelac WS-5000 Polyurethane Resin Technical Datasheet, Apr. 25, 2018. [cited by applicant]
Takelac WS-6021 Polyurethane Resin Technical Datasheet, Apr. 25, 2018. [cited by applicant]
Wang Duoren, New Adhesive and Coating Materials, Beijing China Building Materials Press, May 2000. [cited by applicant]