Printing form precursor, a process for making the precursor, and a method for preparing a printing form from the precursor
The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features in which each feature an area between 5 to 750 square microns and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer. The printing form precursor having the integrated cell pattern layer facilitates the preparation of relief printing forms to have a print surface suitable for printing solids with uniform, dense coverage of ink.
1. A method of making a printing form precursor comprising:
a) applying a photopolymerizable composition comprising a first binder, a monomer, and a photoinitiator onto a support to form a photopolymerizable layer;
b) printing an ink onto a surface of the photopolymerizable layer opposite the support to form a pattern layer;
c) applying an infrared ablation composition forming an infrared ablation layer on the photopolymerizable layer over the printed pattern layer, the infrared ablation composition comprising (i) at least one infrared absorbing material; (ii) a radiation opaque material, wherein (i) and (ii) can be the same or different; and (iii) at least one second binder; wherein the infrared ablation layer is for forming an in-situ mask by infrared ablation during conversion of the printing form precursor to a relief printing form.
2. The method of claim 1 wherein the pattern layer comprises a plurality of features wherein each feature has an area between 5 to 750 square microns, and the ink is opaque to actinic radiation and transparent to infrared radiation.
3. The method of claim 2 wherein the ink is a cyan ink.
4. The method of claim 2 wherein the ink contains a UV absorbing material.
5. A method of making a printing form precursor comprising:
a) applying an infrared sensitive composition forming an infrared ablation layer on a temporary support,
b) printing a plurality of features with an ink onto a surface of the infrared ablation layer that is opposite the temporary support to form a pattern layer on the surface, wherein the pattern layer comprises a plurality of features wherein each feature has an area between 5 to 750 square microns, and the ink is opaque to actinic radiation and transparent to infrared radiation, thereby forming a digital coversheet;
c) applying a photopolymerizable composition comprising a first binder, a monomer, and a photoinitiator, forming a photopolymerizable layer between a support and the digital coversheet, wherein the pattern layer is disposed between the photopolymerizable layer and the infrared ablation layer; wherein the infrared ablation layer is for forming an in-situ mask by infrared ablation during conversion of the printing form precursor to a relief printing form.
6. The method of claim 5 wherein the infrared sensitive composition comprising (i) at least one infrared absorbing material; (ii) a radiation opaque material, wherein (i) and (ii) can be the same or different; and (iii) at least one second binder.
7. The method of claim 5 wherein the ink is a cyan ink.
8. A method of making a printing form precursor comprising:
a) printing a plurality of features with an ink onto a surface of a coversheet to form a pattern layer on the surface, wherein the pattern layer comprises a plurality of features wherein each feature has an area between 5 to 750 square microns, and the ink is opaque to actinic radiation and transparent to infrared radiation;
b) applying an infrared sensitive composition to the pattern layer to form an infrared ablation layer;
c) exposing to infrared radiation to cause ablation to the infrared ablation layer;
d) laminating onto a surface of a photopolymerizable layer comprising a first binder, a monomer, and a photoinitiator, that is opposite a support for the photopolymerizable layer, wherein the pattern layer is disposed between the infrared ablation layer and the coversheet; and wherein the infrared ablation layer is for forming an in-situ mask by infrared ablation during conversion of the printing form precursor to a relief printing form.
9. The method of claim 8 wherein the infrared sensitive composition comprising (i) at least one infrared absorbing material; (ii) a radiation opaque material, wherein (i) and (ii) can be the same or different; and (iii) at least one second binder.
10. The method of claim 9 wherein the ink is a cyan ink.