Method for birefringence patterning
A method includes providing a radiation with a predetermined intensity profile. The method also includes providing a photo-sensitive medium layer including a mixture of a photo-sensitive material and an absorbing additive. The absorbing additive has a predetermined non-uniform distribution in at least one of a direction within a film plane or a thickness direction of the photo-sensitive medium layer. The predetermined non-uniform distribution of the absorbing additive is configured to result in a predetermined non-uniform absorption of the radiation. The method also includes exposing the photo-sensitive medium layer to the radiation to form a polymer film. The optical film includes at least one predetermined birefringence variation in at least one of a direction within a film plane or a thickness direction of the polymer film.
1 . An optical film comprising:
a first substrate;
a second substrate;
a stack of photo-sensitive medium layer, disposed between the first substrate and the second substrate; and
an absorbing film disposed over the first substrate, the orbing film including an absorbing additive having a predetermined non-uniform distribution in one or more directions within a film plane of the absorbing film, wherein:
the predetermined non-uniform distribution of the absorbing additive is configured to result in a predetermined non-uniform absorption of radiation; and
the stack of the photo-sensitive medium layer is configured to form a polymer film upon exposure to a radiation, with a predetermined intensity profile, that is further configured to propagate through the absorbing film, the polymer film including at least one predetermined birefringence variation in one or more directions within a film plane of the polymer film.
2 . The optical film of claim 1 , wherein:
the radiation is configured with the predetermined intensity profile comprising a uniform intensity profile, such that upon exposure of the predetermined intensity profile to the stack of the photo-sensitive medium layer and the absorbing film, the absorbing film is configured to have
one or more predetermined concentration variations of the absorbing additive in the one or more directions within the film plane of the absorbing film.
3 . The optical film of claim 1 , wherein:
the radiation is configured with the predetermined intensity profile comprising a non-uniform intensity profile; and
the radiation for the non-uniform intensity profile is generated via a projector for an image light representing an image with a predetermined brightness variation.
4 . The optical fil method of claim 1 , wherein-providing the radiation is configured with the predetermined intensity profile, such that the radiation transmits a light with a spatially uniform intensity through a photomask that is further configured with a predetermined transmittance variation, wherein a light output from the photomask is the radiation with the predetermined intensity profile.
5 . The optical film of claim 1 , wherein the absorbing additive includes an absorption dye.
6 . The optical film of claim 1 , wherein the photo-sensitive medium layer includes a polymerizable liquid crystal material and a photo-initiator for polymerization, and the radiation is unpolarized or has a spatially uniform polarization direction.
7 . The optical film of claim 1 , wherein the photo-sensitive medium layer includes a photo-sensitive polymer and a photosensitizer, and the radiation has a three dimensional (“3D”) spatially uniform polarization direction of linear polarizations or 3D spatially varying polarization directions of linear polarizations.
8 . The optical film of claim 1 , wherein the polymer film is polarization hologram polymer film.
9 . The optical film of claim 1 , wherein the stack of the photo-sensitive medium layer comprises a first sub-layer including a photo-sensitive material and a second sub-layer including the absorbing additive.
10 . The optical film of claim 9 , wherein the second sub-layer comprising an absorption additive is distributed at a predetermined concentration variation within a film plane of the second sub-layer or along a thickness direction of the second sub-layer.
11 . A method, comprising:
providing a radiation with a predetermined intensity variation;
providing a stack of a photo-sensitive medium layer and an absorbing film, the absorbing film including an absorbing additive having a predetermined uniform distribution within a film plane of the absorbing film, wherein the predetermined uniform distribution of the absorbing additive is configured to result in a predetermined uniform absorption of the radiation; and
exposing the stack of the photo-sensitive medium layer and the absorbing film to the radiation, wherein after being exposed to the radiation propagating through the absorbing film, the photo-sensitive medium layer forms a polymer film including at least one predetermined birefringence variation in at least one of a direction within a film plane or a thickness direction of the polymer film.
12 . The method of claim 11 , wherein providing the radiation with the predetermined intensity variation comprises:
generating, via a projector, an image light representing an image with a predetermined brightness variation.
13 . The method of claim 11 , wherein providing the radiation with the predetermined intensity variation comprises:
transmitting a light with a spatially uniform intensity through a photomask configured with a predetermined transmittance variation, wherein a light output from the photomask is the radiation with the predetermined intensity variation.
14 . The method of claim 11 , wherein the absorbing additive includes an absorption dye.
15 . The method of claim 11 , wherein the photo-sensitive medium layer includes a polymerizable liquid crystal material and a photo-initiator for polymerization, or a photo-sensitive polymer and a photosensitizer.
16 . A method, comprising:
providing a radiation with a uniform intensity;
providing a stack of a photo-sensitive medium layer and an absorbing film, the absorbing film including an absorbing additive having a predetermined non-uniform distribution in one or more directions within a film plane of the absorbing film, wherein the predetermined non-uniform distribution of the absorbing additive is configured to result in a predetermined non-uniform absorption of the radiation; and
exposing the stack of the photo-sensitive medium layer and the absorbing film to the radiation, wherein after being exposed to the radiation propagating through the absorbing film, the photo-sensitive medium layer forms a polymer film including one or more predetermined birefringence variations in one or more directions within a film plane of the polymer film.
17 . The method of claim 16 , wherein providing the stack of the photo-sensitive medium layer and the absorbing film comprises:
configuring one or more predetermined concentration variations of the absorbing additive in the one or more directions within the film plane of the absorbing film.
18 . The method of claim 16 , wherein the absorbing additive includes an absorption dye.
19 . The method of claim 16 , wherein the photo-sensitive medium layer includes a polymerizable liquid crystal material and a photo-initiator for polymerization, or a photo-sensitive polymer and a photosensitizer.
20 . The method of claim 16 , wherein the polymer film includes one or more first predetermined birefringence variations in the one or more directions within the film plane of the polymer film, and a second predetermined birefringence variation in a thickness direction of the polymer film.