IP Library › Granted Patent US 12,312,674
Granted Patent B2
US 12,312,674 · App. 17/951,234 · Granted May 27, 2025

Sputtering target

Inventors: Masayoshi Shimizu (Ibaraki, JP); Yasuyuki Iwabuchi (Ibaraki, JP); Manami Masuda (Ibaraki, JP)
Assignee: JX Advanced Metals Corporation
C23C14/165C23C14/083C23C14/3407G11B5/658G11B5/70621G11B5/7353G11B5/851H01F41/18G11B5/73919G11B5/73921
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Quick Facts
Patent No.
US 12,312,674
App. No.
17/951,234
Granted
May 27, 2025
Kind
B2
Abstract

A sputtering target according to the present invention contains Co and Pt as metal components, wherein a molar ratio of a content of Pt to a content of Co is from 5/100 to 45/100, and wherein the sputtering target contains Nb 2 O 5 as a metal oxide component.

Claims (8)

1. A sputtering target containing Co and Pt as metal components, wherein a molar ratio of a content of Pt to a content of Co is from 5/100 to 45/100, wherein the sputtering target contains Ti, Nb, and O, wherein the sputtering target has a phase including all of Ti, Nb, and O, and wherein the phase has a complex oxide phase and/or a solid solution phase, wherein the complex oxide phase has a metal oxide component including Ti and Nb, wherein the solid solution phase has Nb oxide mixed with Ti and/or Ti oxide mixed with Nb, and wherein the sputtering target is free from Cr.

2. The sputtering target according to claim 1 , wherein the sputtering target comprises a structure having a metal phase including Co and Pt and an oxide particle.

3. The sputtering target according to claim 1 , wherein the sputtering target contains further Nb 2 O 5 of from 0.5 mol % to 5 mol %.

4. The sputtering target according to claim 1 , wherein the sputtering target contains TiO 2 as a metal oxide component and has a content of TiO 2 of from 0.5 mol % to 15 mol %.

5. The sputtering target according to claim 1 , wherein the sputtering target further contains at least one metal oxide of SiO 2 and B 2 O 3 as a metal oxide component, and wherein the sputtering target has a total content of metal oxides including Nb 2 O 5 of from 20 vol % to 40 vol %.

6. The sputtering target according to claim 1 , wherein the sputtering target has a molar ratio of a content of Pt to a content of Co of from 15/100 to 35/100.

7. The sputtering target according to claim 1 , wherein the sputtering target contains Pt in an amount of from 2 mol % to 25 mol %.

8. The sputtering target according to claim 1 , wherein the sputtering target further contains Ru as a metal component in an amount of from 0.5 mol % to 20 mol %.

Assignments (3)
CHANGE OF NAME Recorded Apr 17, 2025
From: JX METALS CORPORATION
To: JX ADVANCED METALS CORPORATION
Reel/Frame 070887/0151 →
CHANGE OF NAME Recorded Apr 15, 2025
From: JX NIPPON MINING & METALS CORPORATION
To: JX METALS CORPORATION
Reel/Frame 070850/0835 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 4, 2022
From: SHIMIZU, MASAYOSHI; IWABUCHI, YASUYUKI; MASUDA, MANAMI
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 061307/0234 →
Priority Claims (1)
JP 2017-180829 · Sep 21, 2017 · national
Continuity (2)
Division 16468769
Related Publication 20230019656A1 · Jan 19, 2023
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