Energy control coatings, structures, devices, and methods of fabrication thereof
Multilayer metallo-dielectric energy control coatings are disclosed in which one or more layers are formed from a hydrogenated metal nitride dielectric, which may be hydrogenated during or after dielectric deposition. Properties of the multilayer coating may be configured by appropriately tuning the hydrogen concentration (and/or the spatial profile thereof) in one or more hydrogenated metal nitride dielectric layers. One or more metal layers of the multilayer coating may be formed on a hydrogenated nitride dielectric layer, thereby facilitating adhesion of the metal with a low percolation threshold and enabling the formation of thin metal layers that exhibit substantial transparency in the visible spectrum. Optical properties of the coating may be tuned through modulation of metal-dielectric interface roughness and dispersion of metal nanoparticles in the dielectric layer. Electrical busbars and micro-nano electrical grids may be integrated with one or more metal layers to provide functionality such as de-icing and defogging.
1 . A method of fabricating a metallo-dielectric coating on a transparent substrate, the method comprising:
depositing, onto the transparent substrate, a first transparent dielectric layer;
depositing a metal layer onto the first transparent dielectric layer; and
depositing a second transparent dielectric layer onto the metal layer;
wherein at least one of said first transparent dielectric layer and said second transparent dielectric layer is a hydrogenated metal nitride dielectric layer formed by the deposition of a metal nitride layer in the presence of hydrogen;
wherein a thickness of the metal layer, and a hydrogen concentration of each hydrogenated metal nitride dielectric layer, are selected such that the metallo-dielectric coating exhibits a transparency of at least 70% in at least a portion of the visible spectrum.
2 . The method according to claim 1 wherein the metal layer is deposited in the presence of hydrogen or exposed to hydrogen post-deposition.
3 . The method according to claim 2 wherein the metal layer is a silver layer.
4 . The method according to claim 2 wherein a concentration of hydrogen employed during deposition of the metal layer is controlled such that active electronic sites of an adjacent dielectric layer are passivated.
5 . The method according to claim 2 wherein a concentration of hydrogen employed during deposition of the metal layer is controlled such that one or more optical or electrical properties of the metal layer satisfy pre-selected criteria.
6 . The method according to claim 5 wherein the optical or electrical properties are selected from optical transmittance and electrical conductivity.
7 . The method according to claim 2 wherein a concentration of hydrogen employed during deposition of the metal layer or a given metal nitride layer is controlled such that the metal layer is absent of islands.
8 . A method of fabricating a metallo-dielectric coating on a transparent substrate, the method comprising:
depositing, onto the transparent substrate, a first transparent dielectric layer;
depositing a metal layer onto the first transparent dielectric layer; and
depositing a second transparent dielectric layer onto the metal layer;
wherein at least one of said first transparent dielectric layer and said second transparent dielectric layer is a metal nitride dielectric layer;
performing post-deposition hydrogenation such that at least one metal nitride dielectric layers becomes a hydrogenated metal nitride dielectric layer;
wherein a thickness of the metal layer, and a hydrogen concentration of each hydrogenated metal nitride dielectric layer, are selected such that the metallo-dielectric coating exhibits a transparency of at least 70% in at least a portion of the visible spectrum.
9 . The method according to claim 8 wherein the metal layer is deposited in the presence of hydrogen or exposed to hydrogen post-deposition.
10 . The method according to claim 9 wherein the metal layer is a silver layer.
11 . The method according to claim 9 wherein a concentration of hydrogen employed during deposition of the metal layer is controlled such that active electronic sites of an adjacent dielectric layer are passivated.
12 . The method according to claim 9 wherein a concentration of hydrogen employed during deposition of the metal layer is controlled such that one or more optical or electrical properties of the metal layer satisfy pre-selected criteria.
13 . The method according to claim 12 wherein the optical or electrical properties are selected from optical transmittance and electrical conductivity.
14 . The method according to claim 9 wherein a concentration of hydrogen employed during deposition of the metal layer is controlled such that the metal layer is absent of islands.