Process to manufacture novel inhibited hydrofluoric acid composition
A process for controlling the heat generated during the manufacture an inhibited hydrofluoric acid aqueous composition comprising: hydrofluoric acid in solution; a weak base; and an alkanolamine; said process comprising the steps of: providing a pre-determined amount of weak base; adding a pre-determined amount of said hydrofluoric acid to said weak base and obtaining a solution; adding said alkanolamine to the resulting solution of hydrofluoric acid and weak base; mixing until all components are dissolved; wherein said alkanolamine and hydrofluoric acid are present in a molar ratio of at least 1:1.
1. An inhibited hydrofluoric acid aqueous composition comprising:
hydrofluoric acid in solution;
a weak base; and
an alkanolamine;
wherein the molar ratio of weak base and alkanolamine to hydrofluoric acid in the composition is at least 1:1, and
wherein the composition is produced by a process comprising:
combining a pre-determined amount of hydrofluoric acid with a predetermined amount of the weak base to obtain a first solution;
adding a predetermined amount of the alkanolamine to the first solution to obtain a second solution; and
mixing the second solution to form the inhibited hydrofluoric acid aqueous composition;
wherein the process is performed such that the inhibited hydrofluoric acid aqueous composition has an HF:alkanolamine:weak base ratio ranging from 1:1:0.02 to 1:1:0.5.
2. The inhibited hydrofluoric acid aqueous composition of claim 1 , wherein the molar ratio of weak base and alkanolamine to hydrofluoric acid in the composition is at least 1.05:1.
3. The inhibited hydrofluoric acid aqueous composition of claim 1 , wherein the molar ratio of weak base and alkanolamine to hydrofluoric acid in the composition is at least 1.1:1.
4. The inhibited hydrofluoric acid aqueous composition of claim 1 , wherein the alkanolamine is selected from the group consisting of monoethanolamine, diethanolamine, triethanolamine, and any combination thereof.
5. The inhibited hydrofluoric acid aqueous composition of claim 1 , wherein the alkanolamine is monoethanolamine.
6. The inhibited hydrofluoric acid aqueous composition of claim 1 , wherein the alkanolamine is diethanolamine.
7. The inhibited hydrofluoric acid aqueous composition of claim 1 , wherein the alkanolamine is triethanolamine.
8. The inhibited hydrofluoric acid aqueous composition of claim 1 , wherein the weak base is selected from the group consisting of lysine, triazole, imidazole, hydantoin, and n-methylimidazole.
9. The inhibited hydrofluoric acid aqueous composition of claim 1 , wherein the weak base is imidazole.
10. The inhibited hydrofluoric acid aqueous composition of claim 1 , wherein the weak base is present in an amount ranging from 0.05 to 0.2 moles for each mole of HF present.
11. The inhibited hydrofluoric acid aqueous composition of claim 1 , wherein the process is performed such that the inhibited hydrofluoric acid aqueous composition has an HF:alkanolamine:weak base ratio ranging from 1:1:0.05 to 1:1:0.1.
12. A glass etching composition comprising:
an inhibited hydrofluoric acid aqueous composition according to claim 1 ; and
a mineral acid.
13. The glass etching composition of claim 12 , wherein the mineral acid is HCl.
14. The glass etching composition of claim 12 , wherein
the alkanolamine is selected from the group consisting of monoethanolamine, diethanolamine, triethanolamine, and any combination thereof; and
the weak base is selected from the group consisting of lysine, triazole, imidazole, hydantoin, and n-methylimidazole.
15. An inhibited hydrofluoric acid aqueous composition comprising:
hydrofluoric acid in solution;
a weak base; and
an alkanolamine;
wherein the molar ratio of weak base and alkanolamine to hydrofluoric acid in the composition is at least 1:1, and
wherein the composition is produced by a process comprising:
preparing a first solution comprising a weak base;
combining a pre-determined amount of hydrofluoric acid with the first solution to obtain a second solution;
adding a predetermined amount of the alkanolamine to the second solution to obtain a third solution; and
mixing the third solution to form the inhibited hydrofluoric acid aqueous composition,
wherein the process is performed such that the inhibited hydrofluoric acid aqueous composition has an HF:alkanolamine:weak base ratio ranging from 1:1:0.02 to 1:1:0.5.
16. The inhibited hydrofluoric acid aqueous composition of claim 15 , wherein the process is performed such that the inhibited hydrofluoric acid aqueous composition has an HF:alkanolamine:weak base ratio ranging from 1:1:0.05 to 1:1:0.1.
17. the inhibited hydrofluoric acid aqueous composition of claim 15 , wherein the alkanolamine is selected from the group consisting of monoethanolamine, diethanolamine, triethanolamine, and any combination thereof.
18. The inhibited hydrofluoric acid aqueous composition of claim 15 , wherein the weak base is selected form the group consisting of lysine, triazole, imidazole, hydantoin, and n-methylimidazole.
19. A glass etching composition comprising:
an inhibited hydrofluoric acid aqueous composition according to claim 15 , and
a mineral acid.
20. The glass etching composition of claim 19 , wherein
the mineral acid is HCl;
the alkanolamine is selected form the group consisting of monoethanolamine, diethanolamine, triethanolamine, and any combination thereof; and
the weak base is selected from the group consisting of lysine, triazole, imidazole, hydantoin, and n-methylimidazole.