Detection device
A detection device includes a substrate, a plurality of photodiodes arranged on the substrate, a plurality of transistors provided correspondingly to each of the photodiodes, an insulating film that covers the transistors, and a plurality of lower electrodes each of which is provided above the insulating film correspondingly to each of the photodiodes, and is electrically coupled to the transistors. The lower electrodes and the photodiodes are stacked in this order above the insulating film, and one of the lower electrodes and one of the photodiodes are provided so as to overlap the transistors in a plan view from a direction orthogonal to the substrate.
1 . A detection device comprising:
a substrate;
a plurality of photodiodes arranged on the substrate;
a plurality of transistors provided correspondingly to each of the photodiodes;
an insulating film that covers the transistors; and
a plurality of lower electrodes each of which is provided above the insulating film correspondingly to each of the photodiodes, and is electrically coupled to the transistors, wherein
the lower electrodes and the photodiodes are stacked in this order above the insulating film,
one of the lower electrodes and one of the photodiodes are provided so as to overlap the transistors in a plan view from a direction orthogonal to the substrate,
the transistors comprise:
a reset transistor that comprises a first semiconductor layer, and is configured to supply a reset potential to the photodiode; and
a read transistor that comprises a second semiconductor layer, and is configured to output a signal generated by the photodiode to an output signal line,
the first semiconductor layer of the reset transistor and the second semiconductor layer of the read transistor are disposed in each area surrounded by two of the output signal lines adjacent to each other in a first direction and two of reset control scan lines adjacent to each other in a second direction crossing the first direction,
the first semiconductor layer of the reset transistor extends in the first direction crossing the output signal lines,
the second semiconductor layer of the read transistor extends in the second direction crossing the first direction, and
a width in the second direction intersecting an extending direction of the first semiconductor layer of the reset transistor is smaller than a width in the first direction intersecting an extending direction of the second semiconductor layer of the read transistor.
2 . The detection device according to claim 1 , wherein the reset transistor has a double-gate structure.
3 . The detection device according to claim 1 , wherein
the transistors further comprise a source follower transistor,
the read transistor and the source follower transistor comprise the common second semiconductor layer,
the second semiconductor layer is provided adjacent to the output signal line in the first direction, and
the second semiconductor layer and the output signal line extend in the second direction.
4 . The detection device according to claim 3 , wherein
the read transistor has a double-gate structure,
the source follower transistor has a single-gate structure, and
two gate electrodes included in the read transistor and one gate electrode included in the source follower transistor are arranged in the second direction so as to overlap the second semiconductor layer.
5 . The detection device according to claim 1 , comprising:
an upper electrode provided above the photodiode;
an element insulating film that is provided between the adjacent photodiodes, and has an opening in a region overlapping the upper electrode; and
reference potential supply wiring configured to supply a reference potential to the photodiode, wherein
the reference potential supply wiring is provided above the element insulating film between the adjacent photodiodes, and is electrically coupled to the upper electrode through the opening.
6 . The detection device according to claim 5 , wherein
the opening is provided at a coupling portion between the reference potential supply wiring and the upper electrode,
the element insulating film is provided above the upper electrode so as to cover around a portion where the upper electrode is coupled to the reference potential supply wiring, and
the detection device further comprises an overlapping insulating film that covers the element insulating film and the opening.
7 . The detection device according to claim 1 , wherein
the photodiode comprises an i-type semiconductor layer, a p-type semiconductor layer, and an n-type semiconductor layer, and
the n-type semiconductor layer, the i-type semiconductor layer, and the p-type semiconductor layer are stacked in this order above the lower electrode.
8 . The detection device according to claim 1 , comprising reference potential supply wiring that is provided between the substrate and the insulating film, and is configured to supply a reference potential to the photodiode, wherein
the photodiode comprises an i-type semiconductor layer, a p-type semiconductor layer, and an n-type semiconductor layer,
the p-type semiconductor layer, the i-type semiconductor layer, and the n-type semiconductor layer are stacked in this order above the lower electrode, and
the lower electrode is electrically coupled to the reference potential supply wiring through a contact hole provided in the insulating film.
9 . The detection device according to claim 8 , comprising:
an upper electrode provided above the photodiode;
an element insulating film that is provided between the adjacent photodiodes, and has an opening in a region overlapping the upper electrode; and
a relay electrode that is provided above the insulating film, and is located adjacent to the lower electrode so as to be separate from the lower electrode, wherein
the relay electrode is electrically coupled to the upper electrode through a contact hole provided in the element insulating film, and is also electrically coupled to the transistors through a contact hole provided in the insulating film.
10 . The detection device according to claim 1 , comprising:
an upper electrode provided above the photodiode;
an element insulating film that is provided between the adjacent photodiodes, has an opening in a region overlapping the upper electrode, and covers peripheries of the upper electrode; and
an overlapping electrode provided so as to cover the opening of the element insulating film and overlap the upper electrode.