Nitride semiconductor ultraviolet light-emitting element
A nitride semiconductor ultraviolet light-emitting element is provided. The element includes a light-emitting element structure part with an n-type layer, an active layer, and a p-type layer stacked vertically, which are made of AlGaN-based semiconductors with wurtzite structure. The n-type layer has an n-type AlGaN-based semiconductor, the active layer has well layers including an AlGaN based semiconductor, and the p-type layer has a p-type AlGaN-based semiconductor. Each semiconductor layer in the n-type and the active layers is an epitaxially grown layer having a surface on which multi-step terraces parallel to the (0001) plane are formed. The n-type layer has first Ga-rich regions which include n-type AlGaN regions in which an AlGaN composition ratio is an integer ratio of Al 7 Ga 5 N 12 , and each extending direction of the stratiform regions is inclined with respect to the upper surface of the n-type layer.
1. A nitride semiconductor ultraviolet light-emitting element with a peak emission wavelength within a range of 265 nm to 300 nm comprising:
a light-emitting element structure part in which an n-type layer, an active layer, and a p-type layer made of an AlGaN-based semiconductor of wurtzite structure are stacked vertically, wherein
the n-type layer is composed of an n-type AlGaN-based semiconductor,
the active layer disposed between the n-type layer and the p-type layer has a quantum-well structure having one or more well layers composed of an AlGaN-based semiconductor, the p-type layer is composed of a p-type AlGaN-based semiconductor,
each semiconductor layer in the n-type layer and the active layer is an epitaxially grown layer having a surface on which multi-step terraces parallel to a (0001) plane are formed,
the n-type layer has a plurality of first Ga-rich regions, the plurality of first Ga-rich regions being stratiform regions uniformly distributed in the n-type layer with locally lower AlN mole fraction and including n-type AlGaN regions in which an AlGaN composition ratio is an integer ratio of Al 7 Ga 5 N 12 ,
each extending direction of the stratiform regions on a first plane perpendicular to an upper surface of the n-type layer has a portion inclined with respect to an intersection line between the upper surface of the n-type layer and the first plane,
boundary region parts between adjacent terraces of the multi-step terraces of a well layer have a second Ga-rich region with locally lower AlN mole fraction in the same well layer, and
the second Ga-rich region includes an AlGaN region in which an AlGaN composition ratio is an integer ratio of Al 1 Ga 1 N 2 or Al 5 Ga 7 N 12 or Al 1 Ga 2 N 3 .
2. The nitride semiconductor ultraviolet light-emitting element according to claim 1 , wherein an AlN mole fraction of an n-type body region other than the stratiform regions in the n-type layer is within a range of 60% to 66%.
3. The nitride semiconductor ultraviolet light-emitting element according to claim 1 , wherein
the second Ga-rich region includes an AlGaN region in which an AlGaN composition ratio is an integer ratio of Al 1 Ga 1 N 2 , and
an AlN mole fraction other than the boundary region parts in the well layer is within a range of 50.1% to 54%.
4. The nitride semiconductor ultraviolet light-emitting element according to claim 1 , wherein
the second Ga-rich region includes an AlGaN region in which an AlGaN composition ratio is an integer ratio of Al 5 Ga 7 N 12 , and
an AlN mole fraction other than the boundary region parts in the well layer is within a range of 41.8% to 46%.
5. The nitride semiconductor ultraviolet light-emitting element according to claim 1 , wherein
the second Ga-rich region includes an AlGaN region in which an AlGaN composition ratio is an integer ratio of Al 1 Ga 2 N 3 , and
an AlN mole fraction other than the boundary region parts in the well layer is within a range of 33.4% to 37%.
6. The nitride semiconductor ultraviolet light-emitting element according to claim 1 , wherein
the active layer has a multi-quantum-well structure including two or more well layers, and
a barrier layer composed of an AlGaN-based semiconductor is present between two of the well layers.
7. The nitride semiconductor ultraviolet light-emitting element according to claim 6 , wherein
boundary region parts between adjacent terraces of the multi-step terraces of at least one barrier layer located on the most p-type layer side within one or more barrier layers located individually between each adjacent pair of the well layers have a third Ga-rich region with a locally lower AlN mole fraction within the same barrier layer.
8. The nitride semiconductor ultraviolet light-emitting element according to claim 7 , wherein
an AlGaN region in which an AlGaN composition ratio is an integer ratio of Al 2 Ga 1 N 3 , Al 3 Ga 1 N 4 or Al 5 Ga 1 N 6 exists in the third Ga-rich region of the barrier layer.
9. The nitride semiconductor ultraviolet light-emitting element according to claim 1 , comprising an underlying part containing a sapphire substrate, wherein
the sapphire substrate has a main surface inclined by a predetermined angle with respect to the (0001) plane,
the light-emitting element structure part is formed above the main surface, and
each semiconductor layer at least from the main surface of the sapphire substrate to the surface of the active layer is an epitaxially grown layer having a surface on which multi-step terraces parallel to the (0001) plane are formed.
10. A nitride semiconductor ultraviolet light-emitting element with a peak emission wavelength within a range of 265 nm to 300 nm comprising:
a light-emitting element structure part in which an n-type layer, an active layer, and a p-type layer made of an AlGaN-based semiconductor of wurtzite structure are stacked vertically, wherein
the n-type layer is composed of an n-type AlGaN-based semiconductor,
the active layer disposed between the n-type layer and the p-type layer has a quantum-well structure having two or more well layers composed of an AlGaN-based semiconductor,
a barrier layer composed of an AlGaN-based semiconductor is present between two of the well layers,
the p-type layer is composed of a p-type AlGaN-based semiconductor,
each semiconductor layer in the n-type layer and the active layer is an epitaxially grown layer having a surface on which multi-step terraces parallel to a (0001) plane are formed,
the n-type layer has a plurality of first Ga-rich regions, the plurality of first Ga-rich regions being stratiform regions uniformly distributed in the n-type layer with locally lower AlN mole fraction and including n-type AlGaN regions in which an AlGaN composition ratio is an integer ratio of Al 7 Ga 5 N 12 ,
each extending direction of the stratiform regions on a first plane perpendicular to an upper surface of the n-type layer has a portion inclined with respect to an intersection line between the upper surface of the n-type layer and the first plane, and
boundary region parts between adjacent terraces of the multi-step terraces of at least one barrier layer located on the most p-type layer side within one or more barrier layers located individually between each adjacent pair of the well layers have a third Ga-rich region with a locally lower AlN mole fraction within the same barrier layer.
11. The nitride semiconductor ultraviolet light-emitting element according to claim 10 , wherein
an AlGaN region in which an AlGaN composition ratio is an integer ratio of Al 2 Ga 1 N 3 , Al 3 Ga 1 N 4 or Al 5 Ga 1 N 6 exists in the third Ga-rich region of the barrier layer.
12. The nitride semiconductor ultraviolet light-emitting element according to claim 10 , comprising an underlying part containing a sapphire substrate, wherein
the sapphire substrate has a main surface inclined by a predetermined angle with respect to the (0001) plane,
the light-emitting element structure part is formed above the main surface, and
each semiconductor layer at least from the main surface of the sapphire substrate to the surface of the active layer is an epitaxially grown layer having a surface on which multi-step terraces parallel to the (0001) plane are formed.