IP Library Granted Patent US 11,916,161
Granted Patent B2
US 11,916,161 · App. 18/047,064 · Granted Feb 27, 2024

Semiconductor light-receiving element

Inventors: Takashi Toyonaka (Yokohama, JP); Hiroshi Hamada (Yokohama, JP); Shigehisa Tanaka (Tokyo, JP)
Assignee: Lumentum Japan, Inc.
H01L31/11H01L31/1035
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Quick Facts
Patent No.
US 11,916,161
App. No.
18/047,064
Granted
Feb 27, 2024
Kind
B2
Abstract

A semiconductor light-receiving element, includes: a semiconductor substrate; a high-concentration layer of a first conductivity type formed on the semiconductor substrate; a low-concentration layer of the first conductivity type formed on the high-concentration layer of the first conductivity type and in contact with the high-concentration layer of the first conductivity type; a low-concentration layer of a second conductivity type configured to form a PN junction interface together with the low-concentration layer of the first conductivity type; and a high-concentration layer of the second conductivity type formed on the low-concentration layer of the second conductivity type and in contact with the low-concentration layer of the second conductivity type. The low-concentration layers have a carrier concentration of less than 1×10 16 /cm 3 . The high-concentration layers have a carrier concentration of 1×10 17 /cm 3 or more. At least one of the low-concentration layers includes an absorption layer with a band gap that absorbs incident light.

Claims (121)

1. A semiconductor light-receiving element, comprising:

a semiconductor substrate;

a high-concentration layer of a first conductivity type formed on the semiconductor substrate;

a low-concentration layer of the first conductivity type formed on the high-concentration layer of the first conductivity type and in contact with the high-concentration layer of the first conductivity type;

a low-concentration layer of a second conductivity type configured to form a PN junction interface together with the low-concentration layer of the first conductivity type; and

a high-concentration layer of the second conductivity type formed on the low-concentration layer of the second conductivity type and in contact with the low-concentration layer of the second conductivity type, wherein:

the high-concentration layer of the first conductivity type has a carrier concentration that is higher than a carrier concentration of the low-concentration layer of the first conductivity type,

the high-concentration layer of the second conductivity type has a carrier concentration that is higher than a carrier concentration of the low-concentration layer of the second conductivity type, and

one or both of the low-concentration layer of the first conductivity type or the low-concentration layer of the second conductivity type includes an absorption layer with a band gap that absorbs incident light.

2. The semiconductor light-receiving element of claim 1 ,

wherein the low-concentration layer of the first conductivity type has a thickness that is 1.1 times a thickness Dn0 or less, the thickness Dn0 being defined by Equation 1, Equation 2, and Equation 3, and

wherein the low-concentration layer of the second conductivity type has a thickness that is 1.1 times a thickness Dp0 or less, the thickness Dp0 being defined by Equation 1, Equation 2, and Equation 3:

Dp

0

=

2

·

(

Vr

+

Vb

)

(

q

ε

p

)

·

Np

·

Rp

[

Equation

1

]

Rp

=

1

+

(

ε

n

/

ε

p

)

·

(

Np

/

Nn

)

[

Equation

2

]

Dn

0

=

(

Rp

-

1

)

·

Dp

0

[

Equation

3

]

wherein:

Vr: bias voltage applied from outside,

Vb: built-in potential,

q: elementary charge,

εp: dielectric constant of the low-concentration layer of the second conductivity type, and

εn: dielectric constant of the low-concentration layer of the first conductivity type.

3. The semiconductor light-receiving element of claim 2 ,

wherein the thickness of the low-concentration layer of the first conductivity type is the thickness Dn0 or less, and

wherein the thickness of the low-concentration layer of the second conductivity type is the thickness Dp0 or less.

4. The semiconductor light-receiving element of claim 1 , wherein:

the high-concentration layer of the first conductivity type is a contact layer of the first conductivity type,

the high-concentration layer of the second conductivity type is a contact layer of the second conductivity type, and

both of the low-concentration layer of the first conductivity type and the low-concentration layer of the second conductivity type include an absorption layer with a band gap that absorbs incident light.

5. The semiconductor light-receiving element of claim 4 , wherein, for each of the low-concentration layer of the first conductivity type and the low-concentration layer of the second conductivity type, the absorption layer is a low-concentration InGaAs absorption layer.

6. The semiconductor light-receiving element of claim 1 , wherein:

the high-concentration layer of the first conductivity type is a contact layer of the first conductivity type,

the low-concentration layer of the first conductivity type is a low-concentration wide band gap layer of the first conductivity type with a band gap that does not absorb incident light,

the high-concentration layer of the second conductivity type is a contact layer of the second conductivity type, and

one of the low-concentration layer of the first conductivity type or the low-concentration layer of the second conductivity type includes an absorption layer with a band gap that absorbs incident light,

wherein the one includes the low-concentration layer of the second conductivity type.

7. The semiconductor light-receiving element of claim 6 , wherein the absorption layer is a low-concentration InGaAs absorption layer.

8. The semiconductor light-receiving element of claim 6 , wherein the low-concentration wide band gap layer of the first conductivity type is made of one of InP, InAlAs, or InAlGaAs.

9. The semiconductor light-receiving element of claim 1 , wherein:

the high-concentration layer of the first conductivity type is a contact layer of the first conductivity type,

the low-concentration layer of the first conductivity type is a low-concentration wide band gap layer of the first conductivity type with a band gap that does not absorb incident light,

the high-concentration layer of the second conductivity type is a contact layer of the second conductivity type and is a first high-concentration layer of the second conductivity type,

one of the low-concentration layer of the first conductivity type or the low-concentration layer of the second conductivity type includes an absorption layer with a band gap that absorbs incident light,

wherein the one is the low-concentration layer of the second conductivity type; and

the semiconductor light-receiving element further comprises:

a second high-concentration layer of the second conductivity type formed on the first high-concentration layer of the second conductivity type and in contact with the first high-concentration layer of the second conductivity type.

10. The semiconductor light-receiving element of claim 9 , wherein the low-concentration wide band gap layer of the first conductivity type is made of one of InP, InAlAs, or InAlGaAs.

11. The semiconductor light-receiving element of claim 1 , wherein the first conductivity type is an n-type, and the second conductivity type is a p-type.

12. The semiconductor light-receiving element of claim 11 , wherein the low-concentration layer of the first conductivity type has a thickness that is less than a thickness of the low-concentration layer of the second conductivity type.

13. The semiconductor light-receiving element of claim 12 , wherein the carrier concentration of the low-concentration layer of the first conductivity type is greater than the carrier concentration of the low-concentration layer of the second conductivity type.

14. The semiconductor light-receiving element of claim 11 , wherein the low-concentration layer of the first conductivity type has a thickness that is greater than a thickness of the low-concentration layer of the second conductivity type.

15. The semiconductor light-receiving element of claim 14 , wherein the carrier concentration of the low-concentration layer of the first conductivity type is less than the carrier concentration of the low-concentration layer of the second conductivity type.

16. The semiconductor light-receiving element of claim 1 , wherein the low-concentration layer of the first conductivity type has a thickness that is different than a thickness of the low-concentration layer of the second conductivity type.

17. The semiconductor light-receiving element of claim 1 , wherein the carrier concentration of the low-concentration layer of the first conductivity type is different than the carrier concentration of the low-concentration layer of the second conductivity type.

18. The semiconductor light-receiving element of claim 1 , wherein the carrier concentration of each of the low-concentration layer of the first conductivity type and the low-concentration layer of the second conductivity type is less than 1×10 16 /cm 3 .

19. The semiconductor light-receiving element of claim 1 , wherein the carrier concentration of each of the high-concentration layer of the first conductivity type and the high-concentration layer of the second conductivity type is greater than or equal to 1×10 16 /cm 3 .

20. The semiconductor light-receiving element of claim 19 , wherein the carrier concentration of each of the low-concentration layer of the first conductivity type and the low-concentration layer of the second conductivity type is less than 1×10 16 /cm 3 .

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 17, 2025
From: LUMENTUM JAPAN, INC.
To: LUMENTUMRADIANT GMBH
Reel/Frame 073971/0379 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 17, 2022
From: TOYONAKA, TAKASHI; HAMADA, HIROSHI; TANAKA, SHIGEHISA
To: LUMENTUM JAPAN, INC.
Reel/Frame 061443/0383 →