Load port module
A substrate loading device including a frame adapted to connect to a substrate processing apparatus, the frame having a transport opening through which substrates are transported to the processing apparatus, a cassette support connected to the frame for holding at least one substrate cassette container proximate the transport opening, the support configured so that a sealed internal atmosphere of the container is accessed from the support at predetermined access locations of the container, and the cassette support has a predetermined continuous steady state differential pressure plenum region, determined at least in part by boundaries of fluid flow generating differential pressure, so that the predetermined continuous steady state differential pressure plenum region defines a continuously steady state fluidic flow isolation barrier disposed on the support between the predetermined access locations of the container and another predetermined section of the support isolating the other predetermined section from the predetermined access locations.
1. A substrate loading device comprising:
a frame adapted to connect the substrate loading device to a substrate processing apparatus, the frame having a transport opening through which substrates are transported between the substrate loading device and processing apparatus;
a cassette support connected to the frame for holding at least one substrate cassette container proximate the transport opening, the cassette support being configured so that an internal atmosphere of the at least one substrate cassette container is accessed from the cassette support at predetermined access locations of the at least one substrate cassette container; and
the cassette support has impinging thereon a predetermined continuous steady state differential pressure plenum region that defines a continuously steady state fluidic isolation barrier disposed on the cassette support between the predetermined access locations of the at least one substrate cassette container and another predetermined section of the cassette support isolating the other predetermined section from the predetermined access locations.
2. The substrate loading device of claim 1 , wherein the predetermined continuous steady state differential pressure plenum region has a positive pressure relative to atmosphere.
3. The substrate loading device of claim 1 , wherein predetermined continuous steady state differential pressure plenum region has a positive pressure relative to a pressure of escapement gas from the internal atmosphere of the at least one substrate cassette container at the predetermined access locations.
4. The substrate loading device of claim 1 , wherein the predetermined continuous steady state differential pressure plenum region has a negative pressure relative to atmosphere.
5. The substrate loading device of claim 1 , wherein the predetermined continuous steady state differential pressure plenum region has a negative pressure relative to pressure of an escapement gas from the internal atmosphere of the at least one substrate cassette container at the predetermined access locations.
6. The substrate loading device of claim 1 , wherein the predetermined continuous steady state differential pressure plenum region is bounded at least on one side by a surface of the cassette support defining the predetermined continuous steady state differential pressure plenum region at least in part.
7. The substrate loading device of claim 6 , wherein the surface is a guide surface for the flow generating the differential pressure of the predetermined continuous steady state differential pressure plenum region.
8. The substrate loading device of claim 1 , wherein the continuously steady state fluidic isolation barrier of the continuous steady state differential pressure plenum region is generated to provide a predetermined offset from the other predetermined section of the cassette support isolated by the continuously steady state fluidic isolation barrier, and the predetermined offset is set by the flow generating the differential pressure of the continuous steady state differential pressure plenum region.
9. The substrate loading device of claim 1 , wherein the substrate loading device includes a controller that controls the predetermined continuous steady state differential pressure plenum region depending on a configuration of the at least one substrate cassette container.
10. A substrate loading device comprising:
a frame adapted to connect the device to a substrate processing apparatus, the frame having a transport opening through which substrates are transported between the device and processing apparatus;
a cassette support connected to the frame for holding at least one substrate cassette container proximate the transport opening, the support being configured so that an internal atmosphere of the container is accessed from the support at predetermined access locations of the container; and
the cassette support has impinging thereon a predetermined continuous steady state mass flow plenum region that defines a continuous steady state isolation barrier of flow disposed on the support between the predetermined access locations of the container and another predetermined section of the cassette support isolating the other predetermined section from the predetermined access locations.
11. The substrate loading device of claim 10 , wherein the predetermined continuous steady state mass flow plenum region has one of:
a positive pressure relative to atmosphere,
a positive pressure relative to a pressure of escapement gas from the internal atmosphere of the at least one substrate cassette container at the predetermined access locations,
a negative pressure relative to atmosphere, or
a negative pressure relative to pressure of an escapement gas from the internal atmosphere of the at least one substrate cassette container at the predetermined access locations.
12. The substrate loading device of claim 10 , wherein the predetermined continuous steady state mass flow plenum region is bounded at least on one side by a surface of the cassette support defining the predetermined continuous steady state mass flow plenum region at least in part.
13. The substrate loading device of claim 12 , wherein the surface is a guide surface for the mass flow of the predetermined continuous steady state mass flow plenum region.
14. The substrate loading device of claim 10 , wherein the continuously steady state isolation barrier of flow of the continuous steady state mass flow plenum region is generated to provide a predetermined offset from the other predetermined section of the cassette support isolated by the continuously steady state isolation barrier of flow, and the predetermined offset is set by the mass flow of the continuous steady state mass flow plenum region.
15. The substrate loading device of claim 10 , wherein the substrate loading device includes a controller that controls the predetermined continuous steady state differential pressure plenum region depending on a configuration of the at least one substrate cassette container.
16. A method comprising:
providing a frame of a substrate loading device, the frame being adapted to connect the substrate loading device to a substrate processing apparatus, the frame having a transport opening through which substrates are transported between the substrate loading device and processing apparatus;
providing a cassette support connected to the frame for holding at least one substrate cassette container proximate the transport opening, the cassette support being configured so that an internal atmosphere of the at least one substrate cassette container is accessed from the cassette support at predetermined access locations of the at least one substrate cassette container; and
defining, with a predetermined continuous steady state differential pressure plenum region impinging on the cassette support, a continuously steady state fluidic isolation barrier disposed on the cassette support between the predetermined access locations of the at least one substrate cassette container and another predetermined section of the cassette support isolating the other predetermined section from the predetermined access locations.
17. The method of claim 16 , wherein the predetermined continuous steady state differential pressure plenum region has one of:
a positive pressure relative to atmosphere,
a positive pressure relative to a pressure of escapement gas from the internal atmosphere of the at least one substrate cassette container at the predetermined access locations,
a negative pressure relative to atmosphere, or
a negative pressure relative to pressure of an escapement gas from the internal atmosphere of the at least one substrate cassette container at the predetermined access locations.
18. The method of claim 16 , wherein the predetermined continuous steady state differential pressure plenum region is bounded at least on one side by a surface of the cassette support defining the predetermined continuous steady state differential pressure plenum region at least in part.
19. The method of claim 16 , wherein the continuously steady state fluidic isolation barrier of the continuous steady state differential pressure plenum region is generated to provide a predetermined offset from the other predetermined section of the cassette support isolated by the continuously steady state fluidic isolation barrier, and the predetermined offset is set by the flow generating the differential pressure of the continuous steady state differential pressure plenum region.
20. The method of claim 16 , further comprising controlling, with a controller, the predetermined continuous steady state differential pressure plenum region depending on a configuration of the at least one substrate cassette container.