Solar cell, manufacturing method thereof, and photovoltaic module
Provided are a solar cell, a manufacturing method thereof, and a photovoltaic module. The solar cell includes: a semiconductor substrate, in which a rear surface of the semiconductor substrate having a first texture structure, the first texture structure includes two or more first substructures at least partially stacked on one another, and a one-dimensional size of the top surface of the outermost first substructure is less than or equal to 45 μm; a first passivation layer located on a front surface of the semiconductor substrate; a tunnel oxide layer located on the first texture structure; a doped conductive layer located on a surface of the tunnel oxide layer, the doped conductive layer includes a P-type doped conductive layer and an N-type doped conductive layer; and a second passivation layer located on a surface of the doped conductive layer.
1. A solar cell, comprising:
a semiconductor substrate, wherein a rear surface of the semiconductor substrate include a first texture structure, the first texture structure has a non-pyramid-shaped microstructure and includes two or more first substructures at least partially stacked on one another, a top surface of the first substructure is a polygonal plane, and a one-dimensional size of the top surface of the outermost first substructure is less than or equal to 45 μm; and wherein a front surface of the semiconductor substrate has a second texture structure, the second texture structure includes a pyramid-shaped microstructure, the pyramid-shaped microstructure includes a top portion away from the front surface of the semiconductor substrate and a bottom portion close to the front surface of the semiconductor substrate, and in a direction away from the front surface and perpendicular to the front surface, a distance between the top portion and the bottom portion of the pyramid-shaped microstructure is less than or equal to 5 μm;
a first passivation layer located on the second texture structure of the front surface of the semiconductor substrate;
a tunnel oxide layer located on the first texture structure of the rear surface of the semiconductor substrate;
a doped conductive layer located on a surface of the tunnel oxide layer, wherein the doped conductive layer includes a P-type doped conductive layer and an N-type doped conductive layer; and
a second passivation layer located on a surface of the doped conductive layer.
2. The solar cell according to claim 1 , wherein the P-type doped conductive layer and the N-type doped conductive layer are spaced from each other.
3. The solar cell according to claim 1 , wherein the tunnel oxide layer includes a first tunnel oxide layer corresponding to the N-type doped conductive layer and a second tunnel oxide layer corresponding to the P-type doped conductive layer.
4. The solar cell according to claim 1 , wherein for the two or more first substructures at least partially stacked on one another, in the direction away from the rear surface and perpendicular to the rear surface, a distance between the top surface of the outermost first substructure and the top surface of the adjacent first substructure is equal to or less than 2 μm.
5. The solar cell according to claim 1 , wherein a shape of the polygonal plane includes at least one of a diamond, a square, a trapezoid, a substantially diamond, a substantially square or a substantially trapezoid.
6. The solar cell according to claim 1 , wherein the first texture structure further includes two or more adjacent second substructures that do not stacked on one another, and a one-dimensional size of a top surface of the second substructure away from the rear surface is less than or equal to 45 μm.
7. The solar cell according to claim 6 , wherein the top surface of the second substructure is a polygonal plane.
8. The solar cell according to claim 1 , wherein the second passivation layer includes at least one of a silicon nitride layer, a silicon oxide layer or a silicon oxynitride layer.
9. The solar cell according to claim 8 , wherein the second passivation layer has a thickness ranging from 70 nm to 120 nm.
10. The solar cell according to claim 1 , wherein the first passivation layer includes at least one of a silicon oxide layer, a silicon nitride layer, an aluminum oxide layer or a silicon oxynitride layer.
11. A photovoltaic module, comprising:
a plurality of solar cell strings, wherein each of the plurality of solar cell strings comprises solar cells, and at least one of the solar cells comprises
a semiconductor substrate, wherein a rear surface of the semiconductor substrate include a first texture structure, the first texture structure has a non-pyramid-shaped microstructure and includes two or more first substructures at least partially stacked on one another, a top surface of the first substructure is a polygonal plane, and a one-dimensional size of the top surface of the outermost first substructure is less than or equal to 45 μm; and wherein a front surface of the semiconductor substrate has a second texture structure, the second texture structure includes a pyramid-shaped microstructure, the pyramid-shaped microstructure includes a top portion away from the front surface of the semiconductor substrate and a bottom portion close to the front surface of the semiconductor substrate, and in a direction away from the front surface and perpendicular to the front surface, a distance between the top portion and the bottom portion of the pyramid-shaped microstructure is less than or equal to 5 μm;
a first passivation layer located on the second texture structure of the front surface of the semiconductor substrate;
a tunnel oxide layer located on the first texture structure of the rear surface of the semiconductor substrate;
a doped conductive layer located on a surface of the tunnel oxide layer, wherein the doped conductive layer includes a P-type doped conductive layer and an N-type doped conductive layer; and
a second passivation layer located on a surface of the doped conductive layer.
12. The photovoltaic module according to claim 11 , wherein the P-type doped conductive layer and the N-type doped conductive layer are spaced from each other.
13. The photovoltaic module according to claim 11 , wherein the tunnel oxide layer includes a first tunnel oxide layer corresponding to the N-type doped conductive layer and a second tunnel oxide layer corresponding to the P-type doped conductive layer.
14. The photovoltaic module according to claim 11 , wherein for the two or more first substructures at least partially stacked on one another, in the direction away from the rear surface and perpendicular to the rear surface, a distance between the top surface of the outermost first substructure and the top surface of the adjacent first substructure is equal to or less than 2 μm.
15. The photovoltaic module according to claim 11 , wherein a shape of the polygonal plane includes at least one of a diamond, a square, a trapezoid, a substantially diamond, a substantially square or a substantially trapezoid.
16. The photovoltaic module according to claim 11 , wherein the first texture structure further includes two or more adjacent second substructures that do not stacked on one another, and a one-dimensional size of a top surface of the second substructure away from the rear surface is less than or equal to 45 μm.
17. The photovoltaic module according to claim 16 , wherein the top surface of the second substructure is a polygonal plane.
18. The photovoltaic module according to claim 11 , wherein the second passivation layer includes at least one of a silicon nitride layer, a silicon oxide layer or a silicon oxynitride layer.
19. The photovoltaic module according to claim 18 , wherein the second passivation layer has a thickness ranging from 70 nm to 120 nm.
20. The photovoltaic module according to claim 11 , wherein the first passivation layer includes at least one of a silicon oxide layer, a silicon nitride layer, an aluminum oxide layer or a silicon oxynitride layer.