Rigid self-supporting MXene separation membrane and preparation method and use thereof
The present disclosure provides a rigid self-supporting MXene separation membrane and a preparation method and use thereof, belonging to the technical field of membranes. In the present disclosure, a MXene material is mixed with an aluminum salt powder to conduct one-step membrane formation by hot-pressing. The pressure forms the powder into a membrane and imparts rigidity, enabling a self-supporting structure; the heating breaks an ionic bond of an inorganic metal salt to reach a molten ionic state, and free metal cations react with active oxygen-containing functional groups on the surface of the MXene to form new chemical bonds (such as an Al—O bond); such a chemical bond has higher energy, achieving a desirable anti-swelling effect to improve the membrane stability. The separation membrane further has excellent conductivity and hydrophilicity.
1. A preparation method of a rigid self-supporting MXene separation membrane, comprising the following steps:
conducting membrane formation on a mixed powder of MXene and an inorganic metal salt by hot-pressing to obtain the rigid self-supporting MXene separation membrane; wherein the membrane formation by hot-pressing is conducted at 150° C. to 300° C. and 5 MPa to 20 MPa for 5 min to 30 min;
the MXene and the inorganic metal salt have a mass ratio of 1:(0.02-0.1); and
the inorganic metal salt comprises an aluminum salt.
2. The preparation method according to claim 1 , wherein the aluminum salt is one or more selected from the group consisting of aluminum chloride, aluminum sulfate, aluminum nitrate, and aluminum silicate.
3. The preparation method according to claim 1 , wherein the MXene is selected from the group consisting of Ti 3 C 2 T x , Ti 2 CT x , Ti 3 CNT x , V 2 CT x , Ti 4 N 3 T x , and Nb 2 CT x .
4. The preparation method according to claim 1 , wherein a preparation method of the MXene comprises the following steps:
mixing a MAX material (corresponding to the MXene), lithium fluoride, and a hydrochloric acid solution and conducting chemical etching on an obtained mixed solution;
conducting solid-liquid separation on an etched product, and mixing an obtained solid precipitate with water; and
subjecting a resulting mixture to ultrasonic exfoliation to obtain the MXene.
5. The preparation method according to claim 4 , wherein the hydrochloric acid solution has a concentration of 8 mol/L to 12 mol/L, the MAX material and the lithium fluoride have a mass ratio of 1:(1.5-2), the MAX material and the hydrochloric acid solution have a dosage ratio of 1 g:(15-30) mL, and the chemical etching is conducted at 45° C. to 80° C. for 24 hours to 48 hours.
6. A rigid self-supporting MXene separation membrane prepared by the preparation method according to claim 1 .
7. The rigid self-supporting MXene separation membrane according to claim 6 , wherein the aluminum salt is one or more selected from the group consisting of aluminum chloride, aluminum sulfate, aluminum nitrate, and aluminum silicate.
8. The rigid self-supporting MXene separation membrane according to claim 6 , wherein the MXene is selected from the group consisting of Ti 3 C 2 T x , Ti 2 CT x , Ti 3 CNT x , V 2 CT x , Ti 4 N 3 T x , and Nb 2 CT x .
9. The rigid self-supporting MXene separation membrane according to claim 6 , wherein a preparation method of the MXene comprises the following steps:
mixing a MAX material (corresponding to the MXene), lithium fluoride, and a hydrochloric acid solution, and conducting chemical etching on an obtained mixed solution;
conducting solid-liquid separation on an etched product, and mixing an obtained solid precipitate with water; and
subjecting a resulting mixture to ultrasonic exfoliation to obtain the MXene.
10. The rigid self-supporting MXene separation membrane according to claim 9 , wherein the hydrochloric acid solution has a concentration of 8 mol/L to 12 mol/L, the MAX material and the lithium fluoride have a mass ratio of 1:(1.5-2), the MAX material and the hydrochloric acid solution have a dosage ratio of 1 g:(15-30) mL, and the chemical etching is conducted at 45° C. to 80° C. for 24 hours to 48 hours.