SILICON BEAM-STEERING APPARATUS AND METHOD FOR MANUFACTURING
An optical silicon beam-steering apparatus made from one or more silicon wafers. The apparatus includes a bonded stack of one or more wafers including a mirror wafer and a possibly distinct wafer for actuation which allows the device to achieve a large scan range, a large mirror size and a high scan frequency.
1 . A beam steering apparatus comprising:
a movable mirror;
flexure hinges configured to suspend said movable mirror;
an electrostatic actuator configured to move said movable mirror; and
wherein said movable mirror has a dimension of at least 2.5 mm in a direction perpendicular to an axis of motion and an angular range of said movable mirror is at least 30 mechanical degrees.
2 . The beam steering apparatus of claim 1 , wherein the electrostatic actuator contains a trench structure configured to generate a portion of the forces needed to move said movable mirror.
3 . The beam steering apparatus of claim 2 , further comprising:
a bonded stack of two silicon wafers; and
an insulating layer between the two silicon wafers.
4 . The beam steering apparatus of claim 2 , wherein said movable mirror comprises a honeycomb structure.
5 . The beam steering apparatus of claim 1 , further comprising:
a system of bump stops configured to prevent damage due to external forces, wherein the system of bump stops comprises pillars and sidewalls.
6 . The beam steering apparatus of claim 1 , where the flexure hinges comprise a rotated serpentine hinge.
7 . The beam steering apparatus of claim 1 , where the flexure hinges comprise a multiple bar rotated serpentine hinge.
8 . The beam steering apparatus of claim 1 , where the flexure hinges comprise a symmetric serpentine hinge.
9 . The beam steering apparatus of claim 1 , where the flexure hinges comprise a coaxial serpentine hinge.
10 . The beam steering apparatus of claim 1 , wherein the electrostatic actuator comprises multiple independently controllable electrodes configured to increase the force exerted by each electrode on said movable mirror as said movable mirror moves past that electrode, and further configured such that the full deflection of said movable mirror can be achieved by applying a unique sequence of voltages to two or more electrodes of the multiple independently controllable electrodes.
11 . The beam steering apparatus of claim 10 , wherein two or more of the multiple independently controllable electrodes are configured to optimize cycle speed.
12 . A beam-steering apparatus comprising:
a movable mirror, wherein the trajectory of the movable mirror comprises of a resonant portion with a sinusoidal profile, ending when the angular velocity of the mirror is zero, followed by a stationary portion.
13 . The beam-steering apparatus of claim 12 , wherein the stationary portion of the trajectory is adjustable in duration according to the requirements of the application.
14 . The beam-steering apparatus of claim 12 , wherein the movable mirror is actuated with electrostatic actuators, and multiple independently controllable actuators are used to provide deflection forces to the movable mirror.
15 . The beam-steering apparatus of claim 14 , wherein electrodes at the end of the mirror's trajectory are larger than electrodes at the beginning of the movable mirror's trajectory to catch and hold the movable mirror at the end of the sinusoidal portion of its trajectory.
16 . A method for fabricating the apparatus of claim 2 , the method comprising the actions of:
growing an oxide or nitride layer on a silicon wafer;
bonding said silicon wafer to a second silicon wafer using a dielectric-to-silicon bond; and
using anisotropic wet etching to open a trench structure.
17 . A method for fabricating the beam-steering apparatus of claim 4 , wherein the movable mirror comprises a honeycomb structure, and further comprising the action of using photolithography and etching processes to create the movable mirror from a thin silicon layer of a silicon-on-insulator wafer.
18 . A method for fabricating the beam-steering apparatus of claim 5 , by using a photolithography and etching processes utilizing anisotropic wet etching to create pillars and sidewalls, which are then subsequently transformed into the bump stops using additional release and wet etch steps.
19 . A method for designing the apparatus of claim 1 , further comprising the action of using a computer optimization program or generative algorithm to optimize the parameters of the flexure hinges according to a particular figure of merit.