IP Library Granted Patent US 50,875
Granted Patent E1
US 50,875 · App. 18/118,955 · Granted Apr 28, 2026

Processes for producing high-purity trifluoroiodomethane

Inventors: Christian Jungong (Depew, NY); Daniel C. Merkel (Orchard Park, NY); Haiyou Wang (Amherst, NY); Terris Yang (East Amherst, NY); Pascal Bolomey (Solon, OH)
Assignee: Solstice Advanced Materials US, Inc.
C07C17/389B01D3/143B01D53/04B01D53/1456B01D53/1493B01J20/08
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Quick Facts
Patent No.
US 50,875
App. No.
18/118,955
Granted
Apr 28, 2026
Kind
E1
Abstract

The present disclosure provides a method for purifying trifluoroiodomethane. The method includes providing a process stream comprising trifluoroiodomethane, organic impurities, and acid impurities; reacting the process stream with a basic aqueous solution, the basic aqueous solution comprising water and at least one base selected from the group of an alkali metal carbonate and an alkali metal hydroxide; and separating at least some of the organic impurities from the process stream.

Claims (35)

1 . A method for purifying trifluoroiodomethane, the method comprising:

providing a process stream comprising trifluoroiodomethane, organic impurities, and acid impurities;

reacting the process stream with a basic aqueous solution, the basic aqueous solution comprising water and an alkali metal carbonate, wherein a concentration of the alkali metal carbonate in the basic aqueous solution is from about 0.5 wt. % to about 5 wt. %; and

separating at least some of the organic impurities from the process stream.

2 . The method of claim 1 , wherein the alkali metal carbonate comprises sodium carbonate.

3 . The method of claim 1 , wherein in the reacting step, a temperature of the process stream is from about 5° C. to about 80° C. and a pressure of the process stream is from about 1 psig to about 100 psig.

4 . The method of claim 1 , wherein in the providing step, the organic impurities include methyl iodide, and a concentration of the methyl iodide in the process stream, in GC area % area% of total organic compounds, is reduced by from about 1% to about 70% by the reacting step.

5 . The method of claim 1 , further comprising an additional step of drying to remove at least some of the water from the process stream immediately after the reacting step.

6 . The method of claim 5 , wherein after the reacting step, the drying step, and the separation step, the process stream includes at least about 99 wt. % trifluoroiodomethane, less than about 50 ppm methyl iodide, less than about 100 ppm water, and less than about 20 ppm acid impurities.

7 . A method for purifying trifluoroiodomethane, the method comprising:

providing a process stream comprising trifluoroiodomethane, organic impurities, and acid impurities;

contacting the process stream in the liquid phase with an acid reactive active agent comprising an adsorbent; and

separating at least some of the organic impurities from the process stream.

8 . The method of claim 7 , wherein the acid reactive active agent comprises an alumina adsorbent.

9 . The method of claim 7 , wherein in the contacting step, the process stream is in a liquid phase, a temperature of the process stream is from about −50° C. to about 50° C. and a pressure of the process stream is from about 1 psig to about 100 psig.

10 . The method of claim 7 , wherein in the contacting step, the process stream is in a gas phase, a temperature of the process stream is from about −20° C. to about 60° C. and a pressure of the process stream is from about 1 psig to about 100 psig.

11 . The method of claim 7 , wherein the contacting step precedes the separation step.

12 . The method of claim 7 , further comprising an additional step of drying to remove at least some of the water from the process stream immediately after the contacting step.

13 . The method of claim 12 , wherein after the contacting step, the drying step, and the separation step, the process stream includes at least about 99 wt. % trifluoroiodomethane, less than about 50 ppm methyl iodide, less than about 100 ppm water, and less than about 20 ppm acid impurities.

14 . A method for purifying trifluoroiodomethane, the method comprising:

providing a process stream comprising trifluoroiodomethane, organic impurities comprising methyl iodide, and acid impurities;

reacting the process stream with a basic aqueous solution, the basic aqueous solution comprising water and an alkali metal hydroxide, wherein a concentration of the alkali metal hydroxide in the basic aqueous solution is from about 0.01 wt. % to about 0.5 wt. % 5 wt.%; wherein a temperature of the process stream is from about 5° C. to about 80° and a pressure of the process stream is from about 1 psig to about 100 psig; and a concentration of the methyl iodide in the process stream, in GC area % of total organic compounds, is reduced by at least about 5%; and

separating at least some of the organic impurities from the process stream.

15 . The method of claim 14 , wherein the alkali metal hydroxide includes potassium hydroxide.

16 . The method of claim 14 , wherein in the reacting step, a temperature of the process stream is from about 5° C. to about 80° C. and a pressure of the process stream is from about 1 psig to about 100 psig.

17 . The method of claim 14 , wherein in the providing step, the organic impurities include methyl iodide, and a the concentration of the methyl iodide in the process stream, in GC area % area% of total organic compounds, is reduced by from about 1% 5% to about 70% by the reacting step.

18 . The method of claim 14 , further comprising an additional step of drying to remove at least some of the water from the process stream immediately after the reacting step.

19 . The method of claim 18 , wherein after the reacting step, the drying step, and the separation step, the process stream includes at least about 99 wt. % trifluoroiodomethane, less than about 50 ppm methyl iodide, less than about 100 ppm water, and less than about 20 ppm acid impurities.

20. The method of claim 14 , wherein a concentration of the alkali metal hydroxide in the basic aqueous solution is from about 0.01 wt.% to about 2 wt.%.

21. The method of claim 14 , wherein a concentration of the alkali metal hydroxide in the basic aqueous solution is from about 0.01 wt.% to about 1 wt.%.

22. The method of claim 14 , wherein a concentration of the alkali metal hydroxide in the basic aqueous solution is from about 0.01 wt.% to about 0.5 wt.%.

23. The method of claim 14 , wherein a concentration of the alkali metal hydroxide in the basic aqueous solution is from about 0.1 wt.% to about 5 wt.%.

24. The method of claim 14 , wherein a concentration of the alkali metal hydroxide in the basic aqueous solution is from about 0.1 wt.% to about 2 wt.%.

25. The method of claim 14 , wherein a concentration of the alkali metal hydroxide in the basic aqueous solution is from about 0.1 wt.% to about 1 wt.%.

26. The method of claim 14 , wherein a concentration of the alkali metal hydroxide in the basic aqueous solution is from about 0.1 wt.% to about 0.5 wt.%.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 13, 2026
From: HONEYWELL INTERNATIONAL INC.
To: SOLSTICE ADVANCED MATERIALS US, INC.
Reel/Frame 074068/0266 →
SECURITY INTEREST Recorded Jan 12, 2026
From: SOLSTICE ADVANCED MATERIALS US, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 074569/0260 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 12, 2025
From: JUNGONG, CHRISTIAN; MERKEL, DANIEL C.; WANG, HAIYOU; YANG, TERRIS; BOLOMEY, PASCAL
To: HONEYWELL INTERNATIONAL INC.
Reel/Frame 070491/0486 →