IP Library Granted Patent US 12,389,521
Granted Patent B2
US 12,389,521 · App. 18/130,163 · Granted Aug 12, 2025

Plasma generating system

Inventors: Leonid Yanovitz (Rishon LeZion, IL); Ilan Oleg Uchitel (Kfar-Saba, IL); Boris Kogan (Kiriat-Motzkin, IL)
Assignee: CAPS Medical Ltd.
H05H1/4652A61N1/40H01F27/28H05H2245/32
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,389,521
App. No.
18/130,163
Granted
Aug 12, 2025
Kind
B2
Abstract

Power circuitry for cold plasma generation; optionally plasma for therapeutic use. Cold plasma generation occurs at the distal end of a catheter-like device which is flexible, narrow (e.g., less than 5 mm in diameter), and longitudinally extended to reach, e.g., 50-100 cm into body cavities. A cable used for power transmission is a part of the power generating circuit, its intrinsic impedance being a major contributor to and constraint on the time constant of an entraining RC circuit whose resonant frequency entrains the frequency of power generation. In some embodiments, inductive transformer coupling to the entraining/transmission line circuit is used to generate voltage gain. In some embodiments, transformer coupling is divided into a plurality of stages. This potentially enables practically achieving high transmission frequencies with higher gain, lowered sensitivity to variability in distal portions of the entraining RC circuit, and/or longer transmission lines compared to a single-stage transformer configuration.

Claims (25)

1. A non-thermal plasma generator comprising:

a gain transformer comprising a primary coil and a secondary coil;

a driver circuit electrically connected to drive a current through the primary coil;

a load circuit having a distal end comprising a plasma generating site generating non-thermal plasma, and a proximal end coupled to the secondary coil of the gain transformer;

wherein the load circuit comprises at least one decoupling inductor, providing inductance including inductance connected in parallel to the secondary coil, and inductance connected in parallel to the plasma generating site.

2. The non-thermal plasma generator of claim 1 , wherein the load circuit has an impedance determining a frequency of oscillation of the load circuit in response to a current generated in the secondary coil.

3. The non-thermal plasma generator of claim 2 , wherein the load circuit entrains oscillation of the driver circuit.

4. The non-thermal plasma generator of claim 3 , wherein oscillation of the driver circuit is entrained via feedback from the gain transformer.

5. The non-thermal plasma generator of claim 4 , wherein the feedback from the gain transformer is provided by a feedback winding of the gain transformer, and wherein the feedback winding has an inductance in the range of about 1-10 μH.

6. The non-thermal plasma generator of claim 2 , wherein the frequency of oscillation of the load circuit is sufficiently high that plasma generation at the plasma generating site does not extinguish during at least a full oscillation cycle.

7. The non-thermal plasma generator of claim 2 , comprising pulse modulation circuitry operable to modulate the frequency of oscillation at a lower frequency within the range of 0.1-1 KHz.

8. The non-thermal plasma generator of claim 2 , wherein the driver circuit ceases oscillation when the plasma generating site is disconnected from the load circuit, but maintains oscillation for values of the frequency of oscillation of the load circuit varying within a range having at least a 10% difference between minimum and maximum values of the range.

9. The non-thermal plasma generator of claim 1 , wherein the gain transformer provides a gain of at least 20.

10. The non-thermal plasma generator of claim 9 , wherein the at least one decoupling inductor comprises at least one decoupling transformer, providing in aggregate a gain no larger than 1.

11. The non-thermal plasma generator of claim 1 , wherein the at least one decoupling inductor comprises decoupling transformers providing in aggregate a gain smaller than the gain provided by the gain transformer by a factor of at least 2.

12. The non-thermal plasma generator of claim 1 , wherein the gain transformer comprises air or ferrite core.

13. The non-thermal plasma generator of claim 1 , wherein the at least one decoupling inductor comprises a plurality of decoupling transformers.

14. The non-thermal plasma generator of claim 1 , wherein the at least one decoupling inductor comprises an inductor coil connected both in parallel to the secondary coil, and in parallel to the plasma generating site.

15. The non-thermal plasma generator of claim 1 , wherein an operating voltage amplitude at the plasma generating site produced when the current is driven through the primary coil of the gain transformer is at least 1 kV RMS.

16. The non-thermal plasma generator of claim 1 , comprising a transmission line interconnecting the plasma generating site and the at least one decoupling inductor; wherein the transmission line is at least 50 cm long, and flexible.

17. The non-thermal plasma generator of claim 16 , provided together with a gas supply lumen leading along the transmission line to the plasma generating site, the gas supply lumen and transmission line together being elements of a flexible probe having an overall diameter of less than 10 mm.

18. The non-thermal plasma generator of claim 15 , wherein the at least one decoupling inductor together with the gain transformer comprise a one or more transformers delivering the operating voltage to the plasma generating site with an amplitude at least 20 times larger than a voltage amplitude in the primary coil of the gain transformer.

19. The non-thermal plasma generator of claim 1 , wherein the primary coil of the gain transformer has an inductance in the range of about 1-5 μH, and the secondary coil of the gain transformer has an inductance in the range of about 1000-5000 μH.

20. The non-thermal plasma generator of claim 1 , wherein the at least one decoupling inductor includes at least one decoupling transformer, and a distal-side coil of the at least one decoupling transformer has an inductance in the range of about 20-80 μH, and is a coil of a distal decoupling transformer of the at least one decoupling transformer having a primary coil with an inductance in the range of about 5-20 μH.

21. The non-thermal plasma generator of claim 1 , wherein the at least one decoupling inductor is connected to the plasma generating site through releasable electrical contacts.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 11, 2024
From: YANOVITZ, LEONID; UCHITEL, ILAN OLEG; KOGAN, BORIS
To: CAPS MEDICAL LTD.
Reel/Frame 066710/0697 →
Continuity (2)
Continuation In Part 17866700 · Jul 18, 2022
Related Publication 20240023224A1 · Jan 18, 2024
References Cited (68)
US 4956582A · Bourassa · 1990 [cited by applicant]
US 5909086A · Kim et al. · 1999 [cited by applicant]
US 6321531B1 · Caren · 2001 [cited by examiner]
US 6326584B1 · Jewett · 2001 [cited by examiner]
US 6565558B1 · Lindenmeier et al. · 2003 [cited by applicant]
US 10692704B2 · Louis · 2020 [cited by examiner]
US 11166762B2 · Eckert · 2021 [cited by examiner]
US 11621587B1 · Yanovitz · 2023 [cited by applicant]
US 11627652B1 · Yanovitz · 2023 [cited by examiner]
US 20080112202A1 · Hu · 2008 [cited by examiner]
US 20100052539A1 · Choi · 2010 [cited by applicant]
US 20100247403A1 · Hancock · 2010 [cited by applicant]
US 20120168081A1 · Son · 2012 [cited by applicant]
US 20120268969A1 · Cuk · 2012 [cited by examiner]
US 20120279658A1 · Bolden, II et al. · 2012 [cited by applicant]
US 20130267943A1 · Hancock · 2013 [cited by examiner]
US 20140246364A1 · Hruska · 2014 [cited by examiner]
US 20140246381A1 · Buchanan · 2014 [cited by examiner]
US 20140319382A1 · Hancock · 2014 [cited by examiner]
US 20150078053A1 · Harrison · 2015 [cited by examiner]
US 20150097434A1 · Harrison · 2015 [cited by examiner]
US 20150157870A1 · Kalghatgi · 2015 [cited by examiner]
US 20150232353A1 · Denvir · 2015 [cited by examiner]
US 20160022347A1 · Rencher et al. · 2016 [cited by applicant]
US 20160123927A1 · Persson · 2016 [cited by examiner]
US 20160194224A1 · Buchanan · 2016 [cited by examiner]
US 20160197564A1 · Buchanan · 2016 [cited by examiner]
US 20160233059A1 · Hensley · 2016 [cited by examiner]
US 20160251240A1 · Fraser · 2016 [cited by examiner]
US 20170014184A1 · Hancock et al. · 2017 [cited by applicant]
US 20170246468A1 · Kalghatgi · 2017 [cited by examiner]
US 20170313603A1 · Fraser · 2017 [cited by examiner]
US 20180358205A1 · Long et al. · 2018 [cited by applicant]
US 20190036346A1 · Hruska · 2019 [cited by examiner]
US 20190206658A1 · Roy · 2019 [cited by examiner]
US 20190230779A1 · Sanders · 2019 [cited by examiner]
US 20190391387A1 · Neophytou · 2019 [cited by examiner]
US 20200254271A1 · Eckert et al. · 2020 [cited by applicant]
US 20200325049A1 · Roy · 2020 [cited by examiner]
US 20210051790A1 · Yancey · 2021 [cited by examiner]
US 20210068896A1 · Eckert · 2021 [cited by examiner]
US 20210385933A1 · Eckert et al. · 2021 [cited by applicant]
US 20230126911A1 · Uchitel · 2023 [cited by applicant]
US 20230132232A1 · Uchitel et al. · 2023 [cited by applicant]
US 20240022116A1 · Yanovitz et al. · 2024 [cited by applicant]
US 20240023224A1 · Yanovitz · 2024 [cited by examiner]
CN 103377869 · 2013 [cited by applicant]
EP 3773288 · 2021 [cited by applicant]
ES 2556231 · 2016 [cited by applicant]
ES 2556231T3 · 2016 [cited by examiner]
ES 2688300 · 2018 [cited by applicant]
ES 2688300T3 · 2018 [cited by examiner]
KR 1020220028774 · 2022 [cited by applicant]
PL 222184 · 2016 [cited by applicant]
WO WO2004014439 · 2004 [cited by applicant]
WO WO2022098245 · 2022 [cited by applicant]
WO WO2024018464 · 2024 [cited by applicant]
WO WO2024018465 · 2024 [cited by applicant]
European Search Report and the European Search Opinion Dated Sep. 13, 2024 From the European Patent Office Re. Application No. 24167544.6. (7 Pages). [cited by applicant]
International Search Report and the Written Opinion Dated Nov. 13, 2023 From the International Searching Authority Re. Application No. PCT/IL2023/050755 (13 Pages). [cited by applicant]
International Preliminary Report on Patentability Dated Jan. 30, 2025 From the International Bureau of WIPO Re. Application No. PCT/IL2023/050755 (6 Pages). [cited by applicant]
Notice of Allowance Dated Mar. 13, 2024 from the US Patent and Trademark Office Re. Application No. 18/129,116. (12 pages). [cited by applicant]
International Search Report and the Written Opinion Dated Nov. 8, 2023 From the International Searching Authority Re. Application No. PCT/IL2023/050754 (10 Pages). [cited by applicant]
Official Action Dated Oct. 30, 2023 from US Patent and Trademark Office Re. U.S. Appl. No. 18/129,116. (17 pages). [cited by applicant]
Notice of Allowance Dated Jan. 19, 2023 from the US Patent and Trademark Office Re. U.S. Appl. No. 17/866,700. (6 pages). [cited by applicant]
Notice of Allowance Dated Jan. 19, 2023 from the US Patent and Trademark Office Re. U.S. Appl. No. 17/971,737. (14 pages). [cited by applicant]
Official Action Dated Sep. 26, 2022 from US Patent and Trademark Office Re. U.S. Appl. No. 17/866,700. (15 pages). [cited by applicant]
Ayachit et al. “Transfer Functions of a Transformer at Different Values of Coupling Coefficient”, IET Circuits and Devices Systems, 10(4): 337-348, Jul. 1, 2016. [cited by applicant]