Integrated pump control for dynamic control of plasma field

1. A method of controlling a surgical pump system, the method comprising the steps of:

providing a pump system for motivating fluid to and from a surgical site during a surgical procedure;

providing a pump controller connected to the pump system for controlling a fluid flow rate inflow to the surgical site and for controlling suction of the fluid from the surgical site;

providing a surgical device for performing the surgical procedure, the surgical device having an associated electrical characteristic value at a given time; and

the pump controller performing the following steps:

(a) retrieving and recording a sampling of surgical device electrical characteristic values during a sample duration;

(b) determining whether the sampled duration has met a predetermined length of time;

(c) calculating an average electrical characteristic value based on the sampling of the surgical device electrical characteristic values if the sampled duration has met the predetermined length;

(d) modifying an amount of the suction if the average electrical characteristic value is outside a predetermined range.

2. The method of claim 1 , further comprising providing the predetermined range between a predetermined upper threshold electrical characteristic value and a predetermined lower threshold electrical characteristic value and communicating the predetermined upper threshold electrical characteristic value and the predetermined lower threshold electrical characteristic value to the pump controller.

3. The method of claim 1 , further comprising providing a low suction amount value and communicating the low suction amount value to the pump controller.

4. The method of claim 3 , wherein the step of modifying the amount of the suction comprises decreasing the amount of the suction to the low suction amount value.

5. The method of claim 4 , wherein a low suction amount level is maintained until the pump controller detects a stable plasma field.

6. The method of claim 3 , wherein the amount of the suction is modified to a rate not less than the low suction amount value.

7. The method of claim 1 , wherein the step of modifying the amount of the suction includes increasing the amount of the suction if the average electrical characteristic value is greater than a predetermined upper threshold electrical characteristic value.

8. The method of claim 1 , wherein the step of modifying the amount of the suction includes decreasing the amount of the suction if the average electrical characteristic value is less than a predetermined lower threshold electrical characteristic value.

9. The method of claim 1 , further comprising the step of initializing a suction value to zero if the surgical device was just activated.

10. The method of claim 1 , further comprising the step of the pump controller setting a suction increment value.

11. The method of claim 10 , wherein the step of modifying the amount of the suction comprises increasing the suction using the suction increment value.

12. The method of claim 10 , wherein the step of modifying the amount of the suction comprises decreasing the amount of the suction using the suction increment value.

13. The method of claim 1 , wherein if the calculated average electrical characteristic value is inside the predetermined range, the pump controller maintains a current suction rate.

14. The method of claim 1 , wherein if the average electrical characteristic value calculated is below the predetermined range, then a suction rate is incrementally decreased until a stable plasma field is achieved.

15. A method of controlling a surgical pump system, the method comprising the steps of:

providing a pump system for motivating fluid to and from a surgical site during a surgical procedure;

providing a pump controller connected to the pump system for controlling a fluid flow rate inflow to the surgical site and for controlling suction of the fluid from the surgical site;

providing a surgical device for performing the surgical procedure, the surgical device having an associated electrical characteristic value at a given time;

retrieving and recording a sampling of surgical device electrical characteristic values during a sample duration;

determining whether the sampled duration has met a predetermined length of time;

calculating an average electrical characteristic value based on the sampling of the surgical device electrical characteristic values if the sampled duration has met the predetermined length;

modifying an amount of the suction if the average electrical characteristic value falls outside a predetermined range.

16. The method of claim 15 , further comprising providing the predetermined range between a predetermined upper threshold electrical characteristic value and a predetermined lower threshold electrical characteristic value and communicating the predetermined upper threshold electrical characteristic value and the predetermined lower threshold electrical characteristic value to the pump controller.

17. The method of claim 15 , further comprising providing a low suction amount value and communicating the low suction amount value to the pump controller.

18. The method of claim 15 , wherein a low suction amount level is maintained until the pump controller detects a stable plasma field.

19. The method of claim 15 , wherein the step of modifying the amount of the suction includes increasing the amount of the suction if the average electrical characteristic value is greater than a predetermined upper threshold electrical characteristic value.

20. The method of claim 15 , wherein the step of modifying the amount of the suction includes decreasing the amount of the suction if the average electrical characteristic value is less than a predetermined lower threshold electrical characteristic value.