SEMICONDUCTOR OPTICAL DEVICE
A substrate includes first and second sides, the first side being flat, the second side including upper and lower sides, the lower side protruding from the upper side to form a step. An optical function layer is on a top of the substrate, the optical function layer including first and second end faces, the first end face being flush with the first side, the second end face being flush with the upper side of the second side. A first film continuously covers the first end face and the first side. A second film is different in reflectance from the first film, the second film continuously covering the second end face and the upper side. A first electrode is electrically connected to a top of the optical function layer. A second electrode is electrically connected to a bottom of the optical function layer.
1 . A semiconductor optical device comprising:
a substrate including a first side and a second side that are opposite to each other, the first side being flat, the second side including an upper side and a lower side, the lower side protruding from the upper side to form a step;
an optical function layer on a top of the substrate, the optical function layer including a first end face and a second end face that are opposite to each other, the first end face being flush with the first side, the second end face being flush with the upper side of the second side;
a first film continuously covering the first end face and the first side;
a second film different in reflectance from the first film, the second film continuously covering the second end face and the upper side of the second side;
a first electrode electrically connected to a top of the optical function layer; and
a second electrode electrically connected to a bottom of the optical function layer.
2 . The semiconductor optical device according to claim 1 , wherein the first film avoids overlap with an underlying surface on which the first electrode is disposed.
3 . The semiconductor optical device according to claim 2 , wherein the second film extends to the underlying surface.
4 . The semiconductor optical device according to claim 1 , further comprising a protection film attached to the lower side of the second side.
5 . The semiconductor optical device according to claim 4 , wherein
the first film continuously extends to the lower side of the second side, and
the protection film is part of the first film.
6 . The semiconductor optical device according to claim 4 , wherein the protection film is separated from the first film but comprises the same material as the first film.
7 . The semiconductor optical device according to claim 1 , further comprising a semiconductor layer on the top of the optical function layer,
the semiconductor layer including a first tip surface flush with the first end face, the semiconductor layer including a second tip surface flush with the second end face,
the first film continuously extending to the first tip surface, and
the second film continuously extending to the second tip surface.
8 . The semiconductor optical device according to claim 1 , wherein the first electrode and the second electrode are above the optical function layer.
9 . The semiconductor optical device according to claim 8 , wherein
the substrate has a recess in the top,
the optical function layer avoids being inside the recess, and
the second electrode extends to be inside the recess.
10 . The semiconductor optical device according to claim 1 , wherein
the first electrode is above the optical function layer, and
the second electrode is below the optical function layer.
11 . The semiconductor optical device according to claim 1 , wherein the second film continuously extends from the second end face to overlap under an edge of the first electrode.
12 . The semiconductor optical device according to claim 11 , further comprising an insulating film overlapping under another edge of the first electrode, the insulating film comprising the same material as the second film.
13 . The semiconductor optical device according to claim 1 , wherein an edge of the second film is spaced next to an edge of the first electrode,
the semiconductor optical device further comprising an insulating film continuously overlapping under the edge of the second film and under the edge of the first electrode, the insulating film comprises a material different from the second film.
14 . The semiconductor optical device according to claim 1 , wherein the first film is lower in the reflectance than the second film.
15 . The semiconductor optical device according to claim 1 , wherein the second film comprises an insulator.
16 . The semiconductor optical device according to claim 1 , wherein the second film comprises the same material as the first electrode.