QUANTUM WELL-BASED LED STRUCTURE ENHANCED WITH SIDEWALL HOLE INJECTION
In a general aspect, an LED structure may include regrown p-type layers and have a mesa structure formed on a substrate. The mesa structure may include preparation layers, an active multiple quantum well (MQW) structure, a first electron blocking layer (EBL), and one or more first p-type layers stacked in a c-plane direction. The sidewalls of the mesa may be substantially vertical or may exhibit a sloped profile. A second EBL may be conformally deposited over the mesa structure, followed by one or more second p-type layers deposited over the conformal second EBL layer. The second EBL and/or second p-type layer(s) deposited over the mesa structure may be referred to herein as regrown layers.
1 . An LED structure comprising:
six or more quantum wells, each of the six or more quantum wells being configured to emit light at a wavelength lambda and at a current density of at least 1 A/cm2, lambda being at least 600 nanometers;
a plurality of quantum barrier layers respectively disposed between adjacent quantum wells of the six or more quantum wells, each quantum barrier layer having a thickness of at least 6 nm;
one or more p-type layers disposed on the sidewalls of the LED structure, the p-layers and the six or more quantum wells being arranged to facilitate sidewall injection of holes into the six or more quantum wells from the one or more p-type layers,
the LED structure having:
an operating voltage that is less than or equal to V 0 +0.5V, where V 0 =1240/lambda; and
an operating current density of at least 1 A/cm2.