Non-invasive IED estimation for pulsed-DC and low frequency applications
A RF power generation system includes a power source configured to generate a periodic waveform applied to a load and a controller configured to receive at least one of a voltage signal or a current signal indicating a respective voltage and current applied to an electrode of the load. The controller determines a surface potential of a workpiece in the load in accordance with the at least one of the voltage signal or the current signal and a series capacitance of the electrode. The controller further determines an ion potential in accordance with an approximation of the surface potential. The periodic waveform may be one of a pulsed DC waveform, a RF waveform, or a pulsed RF waveform.
1 . A power generation system, comprising:
a power source configured to generate a waveform applied to a load; and
a controller configured to:
receive at least one of a voltage signal or a current signal indicating a respective voltage and current applied to an electrode of the load;
determine a surface potential of a workpiece in the load in accordance with the at least one voltage signal or the current signal and a series capacitance of the electrode; and
determine an ion potential in accordance with the surface potential.
2 . The power generation system of claim 1 wherein the electrode is represented as a series capacitance between the power source and the surface potential.
3 . The power generation system of claim 1 further comprising a derivative module configured to receive the voltage signal and generating a derivative of the voltage signal.
4 . The power generation system of claim 1 further comprising a voltage generation module configured to receive the current signal and a series capacitance of the electrode and generating a determined voltage signal in accordance with the current signal and the series capacitance.
5 . The power generation system of claim 1 wherein at least one of the voltage signal or the current signal is received from a sensor that precedes a matching network, or at least one of the voltage signal or the current signal is received from a sensor that follows the matching network.
6 . The power generation system of claim 5 wherein the at least one of the voltage signal or the current signal received from a sensor that precedes a matching network is processed to remove components of the voltage signal or the current signal introduced by the matching network.
7 . The power generation system of claim 4 further comprising a derivative module configured to receive the voltage signal and generating a derivative of the voltage signal.
8 . The power generation system of claim 7 further comprising an integration module configured to receive the derivative of the voltage signal and the determined voltage signal and generate an integral of the voltage signal and the determined voltage signal.
9 . The power generation system of claim 1 further comprising a high frequency power source configured to generate a high frequency waveform applied to the load.
10 . The power generation system of claim 9 wherein the power source is configured to generate the waveform at a frequency of less than 5 MHz.
11 . The power generation system of claim 1 wherein the power source is a bias power source of the load, and the load is configured to generate a plasma.
12 . The power generation system of claim 1 wherein the power source is configured to generate the waveform in a time period less than or equal to an ion transit time of a plasma sheath contained by the load.
13 . The power generation system of claim 1 wherein the power source includes a lower frequency power source configured to generate a lower waveform at a lower frequency and a higher frequency power source configured to generate a higher waveform at a higher frequency, and the lower waveform and the higher waveform are combined to output the waveform applied to the load.
14 . A control system for a power source configured to generate a waveform applied to a load, comprising:
a derivative module configured to receive a voltage signal that varies in accordance with a sensed voltage at the load, the derivative module generating a voltage derivative signal;
a voltage generation module configured to receive a current signal that varies in accordance with a sensed current at the load and a series capacitance of an electrode that supports a workpiece in the load, the voltage generation module generating a determined voltage signal in accordance with the current signal and the series capacitance; and
an integration module configured to receive the voltage derivative signal and the determined voltage signal and to generate an integral of the voltage derivative signal and the determined voltage signal,
wherein a surface potential of a workpiece in the load varies in accordance with the sensed voltage, the sensed current, and the series capacitance of the electrode, and wherein an ion potential of a plasma sheath contained by the load varies in accordance with the surface potential.
15 . The control system of claim 14 wherein the waveform is one of a non-sinusoidal waveform, a waveform, or a pulsed waveform.
16 . The control system of claim 14 wherein at least one of the voltage signal or the current signal is received from a sensor that precedes a matching network, or at least one of the voltage signal or the current signal is received from a sensor that follows the matching network.
17 . The control system of claim 16 wherein the at least one of the voltage signal or the current signal received from a sensor that precedes a matching network is processed to remove components of the voltage signal or the current signal introduced by the matching network.
18 . The control system of claim 14 further comprising a high frequency power source configured to generate a high frequency waveform applied to the load, wherein the high frequency is greater than a frequency of the waveform.
19 . The control system of claim 18 wherein the power source is configured to generate the waveform at a frequency of less than 5 MHz.
20 . The control system of claim 14 wherein the power source is a bias power source of the load, and the load is configured to generate a plasma.
21 . The control system of claim 14 wherein the power source is configured to generate the waveform in a time period less than or equal to an ion transit time of a plasma sheath contained by the load.
22 . The control system of claim 14 wherein the power source includes a lower frequency power source configured to generate a lower waveform at a lower frequency and a higher frequency power source configured to generate a higher waveform at a higher frequency, and the lower waveform and the higher waveform are combined to output the waveform applied to the load.
23 . A non-transitory computer-readable medium storing instructions, the instructions comprising:
generating a waveform applied to a load;
receiving at least one of a voltage signal or a current signal indicating a respective voltage and current applied to the load;
determining a surface potential of a workpiece in the load in accordance with the at least one of a voltage signal or the current signal and a series capacitance of an electrode supporting the workpiece; and
determining an ion potential in accordance with an approximation from the surface potential.
24 . The non-transitory computer-readable medium storing instructions of claim 23 wherein the waveform is one of a non-sinusoidal waveform, a sinusoidal waveform, or a pulsed waveform.
25 . The non-transitory computer-readable medium storing instructions of claim 23 wherein the electrode is represented as a series capacitance between a power source generating the waveform and the surface potential.
26 . The non-transitory computer-readable medium storing instructions of claim 23 , the instructions further comprising receiving the voltage signal and generating a derivative of the voltage signal.
27 . The non-transitory computer-readable medium storing instructions of claim 23 wherein at least one of the voltage signal or the current signal is received from a sensor that precedes a matching network, or at least one of the voltage signal or the current signal is received from a sensor that follows the matching network.
28 . The non-transitory computer-readable medium storing instructions of claim 27 wherein the at least one of the voltage signal or the current signal received from a sensor that precedes a matching network is processed to remove components of the voltage signal or the current signal introduced by the matching network.
29 . The non-transitory computer-readable medium storing instructions of claim 23 , the instructions further comprising receiving the current signal and a series capacitance of the electrode and generating a determined voltage signal in accordance with the current signal and the series capacitance of the electrode.
30 . The non-transitory computer-readable medium storing instructions of claim 29 , the instructions further comprising receiving the voltage signal and generating a derivative of the voltage signal.
31 . The non-transitory computer-readable medium storing instructions of claim 30 , the instructions further comprising receiving the derivative of the voltage signal and the determined voltage signal and generate an integral of the derivative of the voltage signal and the determined voltage signal.
32 . The non-transitory computer-readable medium storing instructions of claim 23 further comprising a high frequency power source configured to generate a high frequency waveform applied to the load.
33 . The non-transitory computer-readable medium storing instructions of claim 32 , the instructions further comprising generating the waveform at a frequency of less than 5 MHz.
34 . The non-transitory computer-readable medium storing instructions of claim 23 wherein a power source generates the waveform and is a bias power source applying power to the load, and the load is configured to generate a plasma.
35 . The non-transitory computer-readable medium storing instructions of claim 23 , the instructions further comprising generating the waveform in a time period less than or equal to an ion transit time of a plasma sheath contained by the load.
36 . The non-transitory computer-readable medium storing instructions of claim 23 , the instructions further comprising generating a lower waveform at a lower frequency and a generating a higher waveform at a higher frequency, and the lower waveform and the higher waveform are combined to output the waveform applied to the load.
37 . The power generation system of claim 1 wherein the waveform is one of a non-sinusoidal waveform, a sinusoidal waveform, or a pulsed waveform.