Granted Patent B2

US 12,484,433 · App. 18/159,087 · Granted Nov 25, 2025

Inventor: Hiroshi Ogawa (Tokyo, JP)

Assignee: MAGNOLIA WHITE CORPORATION

H10K71/231H10K59/1201

Abstract

Claims (36)

1 . A method of manufacturing a display device in which a partition including a lower portion and an upper portion arranged on the lower portion to protrude from a side surface of the lower portion is arranged on a boundary between adjacent sub-pixels, the method comprising:

forming a metal layer above a substrate;

forming the upper portion on the metal layer;

reducing a thickness of a first portion of the metal layer exposed from the upper portion by anisotropic etching;

forming the lower portion by reducing a width of a second portion of the metal layer located under the upper portion by isotropic etching; and

stopping the anisotropic etching while leaving a part of the first portion, and removing the part by the isotropic etching.

2 . The method of claim 1 , comprising:

detecting an end point predetermined based on a spectrum of plasma generated in the anisotropic etching; and

stopping the anisotropic etching in accordance with the detection of the end point.

3 . The method of claim 2 , comprising:

detecting the end point in accordance with an emission intensity of the spectrum corresponding to the metal layer of the plasma, which is varied by reducing a thickness of the metal layer.

4 . The method of claim 1 , wherein

the metal layer contains aluminum.

5 . The method of claim 1 , wherein

the metal layer includes a first aluminum layer and a second aluminum layer arranged on the first aluminum layer, and

the method comprises:

stopping the anisotropic etching in a state in which the second aluminum layer included in the first portion is entirely removed and a part of the first aluminum layer included in the first portion remains; and

removing the remaining part of the first aluminum layer by the isotropic etching.

6 . The method of claim 5 , wherein

an oxide film is formed on an upper surface of the first aluminum layer, and the oxide film is covered with the second aluminum layer.

7 . The method of claim 6 , comprising:

detecting an end point predetermined based on a spectrum of plasma generated in the anisotropic etching; and

stopping the anisotropic etching in accordance with the detection of the end point.

8 . The method of claim 7 , comprising:

detecting the end point in accordance with an emission intensity of the spectrum, which is varied by the oxide film.

9 . The method of claim 1 , comprising:

reducing a width of the second portion in the isotropic etching such that an amount of protrusion of the upper portion from a side surface of the lower portion is 2.0 μm or less.

10 . The method of claim 1 , comprising:

forming a first layer on the metal layer;

forming a second layer on the first layer;

forming a resist on the second layer; and

removing a part of the second layer which is exposed from the resist, by etching using the resist as a mask, removing a part of the first layer which is exposed from the resist, by the anisotropic etching, and thereby forming the upper portion including the first layer and the second layer.

11 . The method of claim 1 , comprising:

forming a lower electrode in the sub-pixel;

forming an organic layer covering the lower electrode; and

forming an upper electrode which covers the organic layer and is in contact with the lower portion.

Assignments (2)

Priority Claims (1)

Continuity (1)

References Cited (13)