Methods for manufacturing highly efficient wide-gap perovskite solar cells
The present disclosure relates to a device that includes a layer that includes a perovskite, where the layer has a first side and a second side defining a thickness, the perovskite has a bulk composition as defined by AB(X 1-y X y ′) 3 , where A includes a first cation, B includes a second cation, X includes iodide, and X′ includes bromide, y is between 0.2 and 0.8, inclusively, and the thickness has a bromide concentration gradient across the thickness with a maximum concentration at or in the proximity of the first side and a minimum concentration at the second side.
1. A device comprising:
a perovskite layer comprising a FA 1-a Cs a Pb(I 1-y Br y ) 3 , and
a layer comprising a self-assembling monolayer (SAM), wherein: FA is formamidinium
the perovskite layer has a first side and a second side defining a thickness,
the first side has no visible perovskite grain boundaries with a characteristic grain length between 100 nm and 1 μm, when viewed by scanning electron microscopy,
the second side of the perovskite layer is positioned adjacent to the SAM,
the perovskite layer and the SAM are positioned in parallel and in physical contact with each other,
the SAM comprises 2-(3,6-dimethoxy-9H-carbazol-9-yl)ethyl)phosphonic acid (MeO-2PACZ) and 4-(3,6-dimethyl-9H-carbazol-9-yl)butyl)phosphonic acid (Me-4PACZ),
0.2≤y≤0.8, 0.01≤a≤0.7, and
the thickness comprises a bromide concentration gradient across the thickness with a maximum concentration at or in the proximity of the first side and a minimum concentration at the second side.
2. The device of claim 1 , wherein the thickness is between 100 nm and 1500 nm.
3. The device of claim 1 , wherein the perovskite layer further comprises tin.
4. The device of claim 1 , wherein the perovskite layer is characterized by a bandgap greater than 1.5 eV.
5. The device of claim 1 , wherein the perovskite layer comprises perovskite grains oriented substantially across the thickness.
6. The device of claim 1 , wherein the perovskite layer is characterized by X-ray diffraction by the absence of peaks in at least one of a first range between 17 degrees 2θ and 26 degrees 2θ or a second range between 30 degrees 2θ and 33 degrees 2θ.
7. The device of claim 1 , wherein the bromide concentration is evident when testing the layer by transient absorption (TA).
8. The device of claim 1 , wherein the MeO-2PACz and the Me-4PACZ are present at a molar ratio between 1:2 and 20:1.
9. The device of claim 1 , wherein the perovskite layer further comprises at least one of methylammonium (MA), dimethylammonium (DMA), guanidinium, or rubidium.
10. The device of claim 9 , wherein
the perovskite comprises FA 1-a-b Cs a DMA b Pb(I 1-y Br y ) 3
and 0.01≤b≤0.2.
11. A method comprising:
forming a self-assembling monolayer (SAM) on a substrate;
depositing a liquid layer of a solution comprising a perovskite precursor onto the SAM;
contacting a surface of the liquid layer with a gas, wherein:
the contacting results in the transforming of the liquid layer to a solid perovskite layer comprising FA 1-a Cs a Pb(I 1-y Br y ) 3 , 0.2≤y≤0.8, 0.01≤a≤0.7,
the solid perovskite layer has a first side and a second side defining a thickness,
the first side has no visible perovskite grain boundaries with a characteristic grain length between 100 nm and 1 μm, when viewed by scanning electron microscopy,
the second side of the solid perovskite layer is positioned adjacent to the SAM,
the solid perovskite layer and the SAM are positioned in parallel and in physical contact with each other,
the SAM layer comprises 2-(3,6-dimethoxy-9H-carbazol-9-yl)ethyl)phosphonic acid (MeO-2PACZ) and 4-(3,6-dimethyl-9H-carbazol-9-yl)butyl)phosphonic acid (Me-4PACZ), and
the thickness comprises a bromide concentration gradient across the thickness with a maximum concentration at or in the proximity of the first side and a minimum concentration at the second side.
12. The method of claim 11 , wherein the gas comprises at least one of an inert gas or air.
13. The method of claim 11 , wherein the gas is provided at a temperature between 20° C. and 100° C.
14. The method of claim 11 , wherein the gas is provided at a supply pressure between 20 psig and 70 psig.
15. The method of claim 11 , wherein, at the start of the contacting, the liquid layer is provided at a temperature between 20° C. and 100° C.
16. The method of claim 11 , wherein the solid perovskite layer comprises perovskite grains oriented substantially across the thickness.
17. The method of claim 11 , wherein the solid perovskite layer is characterized by X-ray diffraction by the absence of peaks in at least one of a first range between 17 degrees 2θ and 26 degrees 2θ or a second range between 30 degrees 2θ and 33 degrees 2θ.
18. The method of claim 11 , wherein the contacting is performed for a period of time between 1 second and 1 hour.
19. The method of claim 18 , wherein the period of time is between 10 seconds and 100 seconds.