IP Library Granted Patent US 12,136,543
Granted Patent B2
US 12,136,543 · App. 18/195,985 · Granted Nov 5, 2024

Device for reducing misalignment between sputtering target and shield

Inventor: Bo Liu (Spokane Valley, WA)
Assignee: Honeywell International Inc.
H01J37/3435C23C14/3407H01J37/3441
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Quick Facts
Patent No.
US 12,136,543
App. No.
18/195,985
Granted
Nov 5, 2024
Kind
B2
Abstract

A spacing guide for use on a dark space shield of a sputtering chamber includes a horizontal body having a first end, a second end opposite the first end and a thickness, the horizontal body configured to rest on an end of the dark space shield; a first leg extending laterally from the first end of the horizontal body and configured to rest against an outer surface of the dark space shield; and a second leg extending laterally from the second end of the horizontal body and configured to rest against the inner surface of the shield.

Claims (33)

1. A spacing guide for use on a dark space shield of a sputtering chamber, the spacing guide comprising:

a horizontal body having a first end, a second end opposite the first end and a thickness, the horizontal body configured to rest on an end of the dark space shield;

a first leg extending laterally from the first end of the horizontal body and configured to rest against an outer surface of the dark space shield; and

a second leg extending laterally from the second end of the horizontal body and configured to rest against the inner surface of the shield, wherein the horizontal body, the first leg and the second leg are formed from an insulating material.

2. The spacing guide of claim 1 wherein the horizontal body is about 1 millimeter to about 30 millimeters thick.

3. The spacing guide of claim 1 wherein the second leg has a thickness of not more than about 30 millimeters.

4. The spacing guide of claim 1 wherein the first leg and the second leg have a different width, length and thickness.

5. The spacing guide of claim 1 wherein the horizontal body, the first leg and the second leg are integrally formed.

6. A dark space shield assembly for use in a sputtering chamber, the dark space shield assembly comprising:

an annular dark space shield having a first end configured to be proximate a substrate support pedestal and a second end configured to be proximate a sputtering target; and

a plurality of spacing guides positioned on the second end of the annular dark space shield, each spacing guide comprising:

a horizontal body having a first end, a second end opposite the first end and a thickness, the horizontal body configured to rest on the second end of the annular dark space shield;

a first leg extending laterally from the first end of the horizontal body and configured to rest against an outer surface of the annular dark space shield; and

a second leg extending laterally from the second end of the horizontal body and configured to rest against the inner surface of the shield, wherein the horizontal body, the first leg and the second leg are formed from an insulating material.

7. The dark space shield assembly of claim 6 wherein the plurality of spacing guides are attached to the annular dark space shield only by friction forces.

8. The dark space shield assembly of claim 6 wherein the plurality of spacing guides are attached to the annular dark space shield by fasteners.

9. The dark space shield assembly of claim 6 wherein the spacing guides maintain the misalignment of the sputtering target and the annular dark space shield within about 5 millimeters along a horizontal axis.

10. The dark space shield assembly of claim 9 wherein the spacing guides maintain the misalignment of the sputtering target and the annular dark space shield within about 1 millimeter along horizontal axis.

11. The dark space shield assembly of claim 9 , wherein the horizontal body is not more than about 30 millimeters thick.

12. The dark space shield assembly of claim 9 wherein the second leg has a thickness of not more than about 30 millimeters.

13. A sputtering chamber assembly comprising:

a sputtering target;

an annular dark space shield having a first end configured to be proximate a substrate support pedestal and a second end configured to be proximate the sputtering target; and

a plurality of spacing guides positioned on the second end of the annular dark space shield, each spacing guide comprising:

a horizontal body having a first end, a second end opposite the first end and a thickness, the horizontal body configured to rest on the second end of the annular dark space shield;

a first leg extending laterally from the first end of the horizontal body and configured to rest against an outer surface of the annular dark space shield; and

a second leg extending laterally from the second end of the horizontal body and configured to rest against the inner surface of the shield, wherein the horizontal body, the first leg and the second leg are formed from an insulating material.

14. The sputtering chamber assembly of claim 13 wherein the plurality of spacing guides are attached to the annular dark space shield only by friction forces.

15. The sputtering chamber assembly of claim 13 wherein the plurality of spacing guides are attached to the annular dark space shield by fasteners.

16. The sputtering chamber assembly of claim 13 wherein the spacing guides maintain a misalignment of the sputtering target and the annular dark space shield within about 1 millimeter along a horizontal axis.

17. The sputtering chamber assembly of claim 16 wherein the spacing guides maintain the misalignment of the sputtering target and the annular dark space shield within 1 millimeter along a vertical axis.

18. The sputtering chamber assembly of claim 13 wherein the horizontal body is about 1 millimeter to about 30 millimeters thick.

19. The sputtering chamber assembly of claim 13 wherein the second leg has a thickness of not more than about 30 millimeters.

Assignments (3)
NUNC PRO TUNC ASSIGNMENT Recorded Apr 13, 2026
From: HONEYWELL INTERNATIONAL INC.
To: SOLSTICE ADVANCED MATERIALS US, INC.
Reel/Frame 074350/0321 →
SECURITY INTEREST Recorded Jan 12, 2026
From: SOLSTICE ADVANCED MATERIALS US, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 074569/0260 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 16, 2023
From: LIU, BO
To: HONEYWELL INTERNATIONAL INC.
Reel/Frame 063974/0767 →
Continuity (2)
Provisional Application 63390052 · Jul 18, 2022
Related Publication 20240021422A1 · Jan 18, 2024