FRONT SURFACE ANTI-REFLECTION COATING FOR SOLAR CELLS
A solar cell is disclosed. The solar cell includes a substrate and an anti-reflection coating on the substrate. The anti-reflection coating includes a coating layer on the substrate that includes SiN x , a high refractive index coating layer that includes TiO 2 on the coating layer that includes SiN x , and a coating layer on the coating layer that includes TiO 2 .
1 . A method of forming a solar cell, comprising:
forming a substrate; and
forming an anti-reflection coating on the substrate, wherein forming the anti-reflection coating comprises:
forming a coating layer that includes SiN x on the substrate;
forming a high refractive index coating layer that includes TiO 2 on the coating layer that includes SiN x ; and
forming a coating layer on the coating layer that includes TiO 2 .
2 . The method of forming a solar cell of claim 1 , wherein the coating layer on the coating layer that includes TiO 2 includes SiN x .
3 . The method of forming a solar cell of claim 2 , wherein the coating layer on the coating layer that includes TiO 2 includes SiON.
4 . The method of forming a solar cell of claim 2 , further comprising forming a coating layer that includes SiON on the coating layer that includes SiN x that is on the coating layer that includes TiO 2 .
5 . A method of forming a solar cell, comprising:
forming a substrate; and
forming an anti-reflection coating on the substrate, the anti-reflection coating comprising:
forming a coating layer that includes SiON on the substrate;
forming a high refractive index coating layer that includes TiO 2 on the coating layer that includes SiON; and
forming a coating layer on the coating layer that includes TiO 2 .
6 . The method of forming a solar cell of claim 5 , wherein the coating layer on the coating layer that includes TiO 2 includes SiN x .
7 . The method of forming a solar cell of claim 5 , wherein the coating layer on the coating layer that includes TiO 2 includes SiON.
8 . The method of forming a solar cell of claim 6 , further comprising forming a coating layer that includes SiON on the coating layer that includes SiN x that is on the coating layer that includes TiO 2 .
9 . A method of forming a solar cell, comprising:
forming a substrate; and
forming an anti-reflection coating on the substrate, the anti-reflection coating comprising:
forming a coating layer that includes SiN x on the substrate;
forming a coating layer that includes SiON on the coating layer that includes SiN x ;
forming a high refractive index coating layer that includes TiO 2 on the coating layer that that includes SiON; and
forming a coating layer on the coating layer that includes TiO 2 .
10 . The method of forming a solar cell of claim 9 , wherein the coating layer on the coating layer that includes TiO 2 includes SiN x .
11 . The method of forming a solar cell of claim 9 , wherein the coating layer on the coating layer that includes TiO 2 includes SiON.
12 . The method of forming a solar cell of claim 10 , further comprising forming a coating layer that includes SiON on the coating layer that includes SiN x that is on the coating layer that includes TiO 2 .
13 . A method of forming solar cell, comprising:
forming a substrate; and
forming an anti-reflection coating on the substrate, the anti-reflection coating comprising:
forming a coating layer on the substrate;
forming a coating layer that includes SiN x on the coating layer on the substrate;
forming a high refractive index coating layer that includes TiO 2 on the coating layer that includes SiN x ; and
forming a coating layer on the coating layer that includes TiO 2 .
14 . The method of forming a solar cell of claim 13 , wherein the coating layer on the substrate includes SiO 2 .
15 . The method of forming a solar cell of claim 13 , wherein the coating layer on the coating layer that includes TiO 2 includes SiN x .
16 . The method of forming a solar cell of claim 13 , wherein the coating layer on the coating layer that includes TiO 2 includes SiON.
17 . The method of forming a solar cell of claim 15 , further comprising forming a coating layer that includes SiON on the coating layer that includes SiN x that is on the coating layer that includes TiO 2 .
18 . A method of forming a solar cell, comprising:
forming a substrate; and
forming an anti-reflection coating on the substrate, the anti-reflection coating comprising:
forming a coating layer on the substrate;
forming a coating layer that includes SiON on the coating layer on the substrate;
forming a high refractive index coating layer that includes TiO 2 on the coating layer that includes SiON; and
forming a coating layer on the coating layer that includes TiO 2 .
19 . The method of forming a solar cell of claim 18 , wherein the coating layer on the substrate includes SiO 2 .
20 . The method of forming a solar cell of claim 18 , wherein the coating layer on the coating layer that includes TiO 2 includes SiN x .
21 . The method of forming a solar cell of claim 18 , wherein the coating layer on the coating layer that includes TiO 2 includes SiON.
22 . The method of forming a solar cell of claim 20 , further comprising forming a coating layer that includes SiON on the coating layer that includes SiN x that is on the coating layer that includes TiO 2 .
23 . A method of forming a solar cell, comprising:
forming a substrate; and
forming an anti-reflection coating on the substrate, the anti-reflection coating comprising:
forming a coating layer on the substrate;
forming a coating layer that includes SiN x on the coating layer on the substrate;
forming a coating layer that includes SiON on the coating layer that includes SiN x ;
forming a high refractive index coating layer that includes TiO 2 on the coating layer that includes SiON; and
forming a coating layer on the coating layer that includes TiO 2 .
24 . The method of forming a solar cell of claim 23 , wherein the coating layer on the substrate includes SiO 2 .
25 . The method of forming a solar cell of claim 23 , wherein the coating layer on the coating layer that includes TiO 2 includes SiN x .
26 . The method of forming a solar cell of claim 23 , wherein the coating layer on the coating layer that includes TiO 2 includes SiON.
27 . The method of forming a solar cell of claim 25 , further comprising forming a coating layer that includes SiON on the coating layer that includes SiN x that is on the coating layer that includes TiO 2 .