APPARATUS FOR IMPROVED INJECTION FOR A PLASMA REACTOR
An apparatus for improved injection for a plasma reactor is disclosed. The apparatus includes at least a reservoir, a plasma reactor, an ignition unit, and an injector, wherein the injector is configured to feed at least a fluid from the at least a reservoir through reaction region of the plasma reactor and the injector includes at least a fluid outlet, wherein the at least a fluid outlet is configured to output the at least a fluid in a cone distribution to the plasma reactor, wherein the cone distribution includes a distribution angle and droplets of the at least a fluid.
1 . An apparatus for improved injection for a plasma reactor, wherein the apparatus comprises: at least:
a reservoir;
a plasma reactor;
an ignition unit;
and an injector,
wherein:
the plasma reactor comprises at least a pair of electrodes comprising a first electrode and a second electrode, wherein the at least a pair of electrodes is configured to produce an electrical discharge; and wherein
the injector is configured to feed at least a fluid from the at least a reservoir through reaction region of the plasma reactor; and
the injector comprises at least a fluid outlet, wherein:
the at least a fluid outlet is configured to output the at least a fluid in a cone distribution to the plasma reactor, wherein the cone distribution comprises:
a distribution angle; and
droplets of the at least a
fluid.
2 . The apparatus of claim 1 , wherein the at least a reservoir comprises: a first reservoir configured to contain a first fluid; and
a second reservoir configured to contain a second fluid,
wherein: the first fluid comprises at least a gas; and
the second fluid comprises at least a liquid.
3 . The apparatus of claim 2 , wherein the injector further comprises:
a first fluid inlet in fluidic connection with the first reservoir, wherein the first fluid inlet is configured to accept the first fluid from the first reservoir; and
a second fluid inlet in fluidic connection with the second reservoir, wherein the second fluid inlet is configured to accept the second fluid from the second reservoir.
4 . The apparatus of claim 3 , wherein the at least a fluid outlet is further configured to output a mixture of the first fluid and the second fluid in the cone distribution of the at least a fluid to the plasma reactor.
5 . (canceled)
6 . The apparatus of claim 1 , wherein:
each of the at least a pair of electrodes comprises a pitch angle of 12 degrees; and the distribution angle of the cone distribution comprises 12 degrees.
7 . The apparatus of claim 6 , wherein the first electrode of the at least a pair of electrodes and the second electrode of the at least a pair of electrodes comprise different shapes.
8 . The apparatus of claim 7 , wherein the plasma reactor comprises a reaction region disposed between the first electrode and the second electrode, wherein the reaction region is configured to enable an interaction between the electrical discharge and a growth medium.
9 . The apparatus of claim 8 , further comprising a treatment chamber, wherein the treatment chamber is configured to contain the growth medium.
10 . The apparatus of claim 8 , wherein the reaction region comprises a plurality of points on an arc between the first electrode of the at least a pair of electrodes and the second electrode of the at least a pair of electrodes.
11 . The apparatus of claim 1 , wherein the droplets of the at least a fluid of the cone distribution comprises microfine droplets.
12 . The apparatus of claim 11 , wherein the microfine droplets comprises a diameter of 5μ.
13 . The apparatus of claim 1 , wherein the at least a fluid outlet of the injector comprises a nozzle.
14 . The apparatus of claim 1 , wherein the injector is mounted externally to the plasma reactor.
15 . The apparatus of claim 1 , wherein the injector comprises a flow adjustment component configured to regulate a flow of the at least a fluid entering the reaction region.
16 . The apparatus of claim 1 , wherein the injector comprises one or more valves, wherein the one or more valves are configured to control the flow of the at least a fluid fed through the reaction region of the plasma reactor.
17 . The apparatus of claim 1 , wherein the injector comprises a piezo water vapor injector.
18 . The apparatus of claim 1 , wherein the cone distribution of the at least a fluid is further configured to produce a nitrogen oxide concentration.
19 . The apparatus of claim 1 , further comprising a pressure regulator, wherein the pressure regulator is configured to transfer the at least a fluid to the injector.
20 . The apparatus of claim 19 , wherein the pressure regulator is further configured to pressurize the at least a fluid entering the reaction region.