Photostable compositions comprising para-alkoxyl phenyl substituted propenoic acid (APP) copolymer derivatives
The present disclosure relates, according to some embodiments, to photostable photoactive compositions comprising (a) at least one photoactive compound that develops within itself an excited state energy when subjected to UV radiation and (b) a block copolymer comprising a plurality of blocks, wherein the block copolymer is operable to quench the excited state energy.
1. A photostable photoactive composition comprising:
(a) at least one photoactive compound that develops within itself an excited state energy when subjected to UV radiation, and
(b) a block copolymer comprising a plurality of blocks, and having a structure according to Formula I:
H 3 C—V—W—X—Y—Z—CH 3
wherein the plurality of blocks comprises:
(i) at least one block has a structure according to Formula II:
R is C 1 -C 30 alkyl,
R 1 is selected from the group consisting of H, OH, and C 1 -C 15 alkoxyl,
R 2 is selected from the group consisting of H and C 1 -C 15 alkyl,
K is C 1 -C 15 alkyl,
B is selected from the group consisting of O and S,
A is selected from the group consisting of CN and (C═O)NR 3 (R 4 ), and
each stereoisomer is selected from the group consisting of E, Z, R, S, and
a combination thereof,
wherein R 3 and R 4 are independently C 1 -C 15 alkyl,
wherein n is a number from 1 to 5,000,
wherein m is a number from 0 to 20, and
wherein R, R 1 , R 2 , R 3 , and R 4 may be either straight chain or branched chain; and
(ii) at least one block has a structure according to Formula III:
wherein:
R 5 is C 1 -C 30 alkyl,
R 6 is selected from the group consisting of H and C 1 -C 15 alkyl,
L is C 1 -C 15 alkyl,
D is selected from the group consisting of O and S,
C is selected from the group consisting of CN and (C—O)NR 7 (R 8 ), and
each stereoisomer is selected from the group consisting of E, Z, R, S,
and a combination thereof,
wherein R 7 and R 8 are independently C 1 -C 15 alkyl,
wherein o is a number from 1 to 5,000,
wherein p is a number from 0 to 20, and
wherein R 5 , R 6 , R 7 and R 8 may be either straight chain or branched chain,
wherein the block copolymer is operable to quench the excited state energy.
2. The photostable photoactive composition according to claim 1 , wherein at least one block has a structure according to at least one of Formula IV:
wherein:
R 9 and R 10 are independently C 1 -C 15 alkyl, and
E is selected from the group consisting of O and S;
wherein q is a number from 1 to 5,000, and
wherein r is a number from 0 to 20.
3. The photostable photoactive composition according to claim 1 , wherein at least one block has a structure according to at least one of Formula V:
wherein:
F is selected from the group consisting of O and S;
wherein s is a number from 1 to 5,000;
wherein t is a number from 0 to 20; and
Formula VI:
wherein:
R 11 and R 12 are independently C 1 -C 15 alkyl, and
G is selected from the group consisting of O and S;
wherein u is a number from 1 to 5,000;
wherein v is a number from 0 to 20; and
wherein R 9 =R 10 , or R 11 =R 12 , but not both.
4. The photostable photoactive composition according to claim 1 , wherein the block copolymer is present at a concentration of about 1% by weight to about 20% by weight, based on a total weight of the composition.
5. The photostable photoactive composition according to claim 1 , wherein the at least one photoactive compound comprises 4-methyldibenzoylmethane and derivatives thereof; octyl methoxycinnamate and derivatives thereof; octocrylene and derivatives thereof; p-methoxycinnamic acid esters and derivatives thereof; 1-(4-methoxyphenyl)-3-(4-tert-butylphenyl)propane-1,3-dione and derivatives thereof; oxybenzone and derivatives thereof; bis-ethylhexyloxyphenol methoxyphenyl triazone and derivatives thereof; methylene bis-benzotriazolyl tetramethylbutylphenol and derivatives thereof; 4-methylbenzylidene camphor and derivatives thereof; diethylamino hydroxyl benzoyl hexyl benzoate and derivatives thereof; drometrizole trisiloxane and derivatives thereof; ethylhexyl triazone, diethylhexyl butamido triazone and derivatives thereof; terephthalylidene dicamphor sulfonic acid, its salts, and derivatives thereof, menthyl anthranilate and derivatives thereof; retinol and derivatives thereof; coenzyme Q and derivatives thereof; cholecalciferol and derivatives thereof; porphyrin and derivatives thereof, resveratrol and derivatives thereof; p-aminobenzoic acid, its salts, and derivatives thereof; glyceryl esters; anthranilate and derivatives thereof; cinnamic acid and derivatives thereof, coumarin and derivatives thereof; trihydroxycinnamic acid and derivatives thereof; dibenzalacetone naphtholsulfonate, its salts, and derivatives thereof; dibenzalacetone and derivatives thereof; dihydroxy-naphthoic acid, its salts, and derivatives thereof; o-hydroxydiphenyldisulfonate, its salts, and derivatives thereof; diazole derivatives; quinine derivatives, its salts, and derivatives thereof; quinoline derivatives; hydroxyl-substituted benzophenone derivatives; quinolone derivatives; benzophenone derivatives; uric acid derivatives; quinine salts; hydroxydiphenyldisulfonate, its salts, and derivatives thereof; tannic acid and derivatives thereof; violuric acid and derivatives thereof; phenylbenzimidazole tetrasulfonate, its salts, and derivatives thereof; terephthalylidene dicamphor sulfonic acid, its salts, and derivatives thereof; benzalacetophenone naphtholsulfonate, its salts, and derivatives thereof; benzoic acid, its salts, and derivatives thereof; o-hydroxydiphenyldisulfonate, its salts, and derivatives thereof; p-naphthalate derivatives; methoxy-substituted uric acid derivatives; hydroquinone, its salts, and derivatives thereof; benzophenone derivatives; dihydroxycinnamic acid, its salts, and derivatives thereof; 1, 3, 5-triazine derivatives; methylene bis-benzotriazolyl tetramethylbutylphenol, its salts, and derivatives thereof; titanium dioxide and derivatives thereof; triazole and derivatives thereof; zinc oxide; bis-ethylhexyloxyphenol methoxyphenyl triazine and its salts; salicylate and derivatives thereof; diethylamino hydroxyl benzoyl hexyl benzoate, its salts, and derivatives thereof; and combinations of the foregoing.
6. The photostable photoactive composition according to claim 1 , wherein the at least one photoactive compound is present at a concentration of about 0.000001% by weight to about 20% by weight, based on the total weight of the composition.
7. The photostable photoactive composition according to claim 1 , wherein said composition includes an oil phase having a dielectric constant of at least about 8.
8. A method of photostabilizing a photoactive composition containing a block copolymer and at least one photoactive compound, the method comprising:
(a) adding the at least one photoactive compound in an effective amount to the composition,
wherein the at one photoactive compounds develops within itself an excited state energy when subjected to UV radiation; and
(b) adding the block copolymer in an effective amount to the composition,
wherein the block copolymer comprises a plurality of blocks, and
has a structure according to Formula I:
H 3 C—V—W—X—Y—Z—CH 3
wherein the plurality of blocks comprises:
(i) at least one block has a structure according to Formula II:
R is C 1 -C 30 alkyl,
R 1 is selected from the group consisting of H, OH, and C 1 -C 15 alkoxyl,
R 2 is selected from the group consisting of H and C 1 -C 15 alkyl,
K is C 1 -C 15 alkyl,
B is selected from the group consisting of O and S,
A is selected from the group consisting of CN and (C—O)NR 3 (R 4 ), and
each stereoisomer is selected from the group consisting of E, Z, R, S, and
a combination thereof,
wherein R 3 and R 4 are independently C 1 -C 15 alkyl,
wherein n is a number from 1 to 5,000,
wherein m is a number from 0 to 20, and
wherein R, R 1 , R 2 , R 3 , and R 4 may be either straight chain or branched chain; and
(ii) at least one block has a structure according to Formula III:
wherein:
R 5 is C 1 -C 30 alkyl,
R 6 is selected from the group consisting of H and C 1 -C 15 alkyl,
L is C 1 -C 15 alkyl,
D is selected from the group consisting of O and S,
C is selected from the group consisting of CN and (C═O)NR 7 (R 8 ), and
each stereoisomer is selected from the group consisting of E, Z, R, S,
and a combination thereof,
wherein R 7 and R 8 are independently C 1 -C 15 alkyl,
wherein o is a number from 1 to 5,000,
wherein p is a number from 0 to 20, and
wherein R 5 , R 6 , R 7 and R 8 may be either straight chain or branched chain,
wherein the block copolymer is operable to quench the excited state energy.
9. The method according to claim 8 , wherein at least one block has a structure according to at least one of Formula IV:
wherein:
R 9 and R 10 are independently C 1 -C 15 alkyl, and
E is selected from the group consisting of O and S;
wherein q is a number from 1 to 5,000, and
wherein r is a number from 0 to 20.
10. The method according to claim 8 , wherein at least one block has a structure according to at least one of:
Formula V:
wherein:
F is selected from the group consisting of O and S;
wherein s is a number from 1 to 5,000; and
wherein t is a number from 0 to 20;
wherein the block copolymer is operable to quench the excited state energy; and
wherein the photoactive composition protects a substrate from oxidative stress caused by absorption of light having a wavelength in the wavelength range of about 280 nm to about 400 nm; and
Formula VI:
wherein:
R 11 and R 12 are independently C 1 -C 15 alkyl, and
G is selected from the group consisting of O and S;
wherein u is a number from 1 to 5,000;
wherein v is a number from 0 to 20; and
wherein R 9 =R 10 , or R 11 =R 12 , but not both.
11. The method according to claim 10 , wherein the substrate comprises a sunscreen, a cosmetic, a polymer, and a coating.
12. The method according to claim 8 , wherein application of said sunscreen to a skin of an animal thereby protects the skin against UV radiation.
13. The method according to claim 11 , wherein the polymer is selected from the group consisting of high-density polyethylene, low-density polyethylene, polystyrene, polyamides, nylon, polypropylene, rubber, cellulose, polyvinyl chloride, and polyvinyl alcohol.
14. The method according to claim 8 , wherein the block copolymer is present at a concentration of about 1% by weight to about 20% by weight, based on a total weight of the composition.
15. The method according to claim 8 , wherein the block copolymer is present at a concentration comprising about 15% by weight, about 10% by weight, about 5% by weight, about 1% by weight, or a combination thereof, based on the total weight of the composition.
16. The method according to claim 8 , wherein the at least one photoactive compound comprises 4-methyldibenzoylmethane and derivatives thereof; octyl methoxycinnamate and derivatives thereof; octocrylene and derivatives thereof; p-methoxycinnamic acid esters and derivatives thereof; 1-(4-methoxyphenyl)-3-(4-tert-butylphenyl)propane-1,3-dione and derivatives thereof; oxybenzone and derivatives thereof; bis-ethylhexyloxyphenol methoxyphenyl triazone and derivatives thereof; methylene bis-benzotriazolyl tetramethylbutylphenol and derivatives thereof; 4-methylbenzylidene camphor and derivatives thereof; diethylamino hydroxyl benzoyl hexyl benzoate and derivatives thereof; drometrizole trisiloxane and derivatives thereof; ethylhexyl triazone, diethylhexyl butamido triazone and derivatives thereof; terephthalylidene dicamphor sulfonic acid, its salts, and derivatives thereof, menthyl anthranilate and derivatives thereof; retinol and derivatives thereof; coenzyme Q and derivatives thereof; cholecalciferol and derivatives thereof; porphyrin and derivatives thereof, resveratrol and derivatives thereof; p-aminobenzoic acid, its salts, and derivatives thereof; glyceryl esters; anthranilate and derivatives thereof; cinnamic acid and derivatives thereof, coumarin and derivatives thereof; trihydroxycinnamic acid and derivatives thereof; dibenzalacetone naphtholsulfonate, its salts, and derivatives thereof; dibenzalacetone and derivatives thereof, dihydroxy-naphthoic acid, its salts, and derivatives thereof; o-hydroxydiphenyldisulfonate, its salts, and derivatives thereof; diazole derivatives; quinine derivatives, its salts, and derivatives thereof; quinoline derivatives; hydroxyl-substituted benzophenone derivatives; quinolone derivatives; benzophenone derivatives; uric acid derivatives; quinine salts; hydroxydiphenyldisulfonate, its salts, and derivatives thereof; tannic acid and derivatives thereof; violuric acid and derivatives thereof; phenylbenzimidazole tetrasulfonate, its salts, and derivatives thereof; terephthalylidene dicamphor sulfonic acid, its salts, and derivatives thereof; benzalacetophenone naphtholsulfonate, its salts, and derivatives thereof; benzoic acid, its salts, and derivatives thereof; o-hydroxydiphenyldisulfonate, its salts, and derivatives thereof; p-naphthalate derivatives; methoxy-substituted uric acid derivatives; hydroquinone, its salts, and derivatives thereof; benzophenone derivatives; dihydroxycinnamic acid, its salts, and derivatives thereof; 1, 3, 5-triazine derivatives; methylene bis-benzotriazolyl tetramethylbutylphenol, its salts, and derivatives thereof; titanium dioxide and derivatives thereof; triazole and derivatives thereof; zinc oxide; bis-ethylhexyloxyphenol methoxyphenyl triazine and its salts; salicylate and derivatives thereof; diethylamino hydroxyl benzoyl hexyl benzoate, its salts, and derivatives thereof; and combinations of the foregoing.
17. The method according to claim 8 , wherein the at least one photoactive compound is present at a concentration of about 0.000001% by weight to about 20% by weight, based on the total weight of the composition.
18. The method according to claim 8 , wherein the at least one photoactive compound is present at a concentration comprising about 15% by weight, about 10% by weight, about 5% by weight, about 1% by weight, about 0.5% by weight, about 0.1% by weight, or a combination thereof, based on the total weight of the composition.
19. The method according to claim 8 , wherein said photoactive composition includes an oil phase having a dielectric constant of at least about 7.
20. The method according to claim 8 , wherein said photoactive composition includes an oil phase having a dielectric constant of at least about 8.
21. A cosmetic or dermatological composition for coating a skin to protect the skin from oxidative stress caused by absorption of light having a wavelength in the wavelength range of about 280 nm to about 400 nm, the composition comprising:
(a) at least one photoactive compound that develops within itself an excited state energy when subjected to UV radiation,
(b) a block copolymer comprising a plurality of blocks,
having a structure according to Formula I:
H 3 C—V—W—X—Y—Z—CH 3
wherein the plurality of blocks comprises:
(i) at least one block has a structure according to Formula II:
R is C 1 -C 30 alkyl,
R 1 is selected from the group consisting of H, OH, and C 1 -C 15 alkoxyl,
R 2 is selected from the group consisting of H and C 1 -C 15 alkyl,
K is C 1 -C 15 alkyl,
B is selected from the group consisting of O and S,
A is selected from the group consisting of CN and (C═O)NR 3 (R 4 ), and
each stereoisomer is selected from the group consisting of E, Z, R, S, and
a combination thereof,
wherein R 3 and R 4 are independently C 1 -C 15 alkyl,
wherein n is a number from 1 to 5,000,
wherein m is a number from 0 to 20, and
wherein R, R 1 , R 2 , R 3 , and R 4 may be either straight chain or branched chain; and
(ii) at least one block has a structure according to Formula III:
wherein:
R 5 is C 1 -C 30 alkyl,
R 6 is selected from the group consisting of H and C 1 -C 15 alkyl,
L is C 1 -C 15 alkyl,
D is selected from the group consisting of O and S,
C is selected from the group consisting of CN and (C—O)NR 7 (R 8 ), and
each stereoisomer is selected from the group consisting of E, Z, R, S,
and a combination thereof,
wherein R 7 and R 8 are independently C 1 -C 15 alkyl,
wherein o is a number from 1 to 5,000,
wherein p is a number from 0 to 20, and
wherein R 5 , R 6 , R 7 and R 8 may be either straight chain or branched chain,
wherein the block copolymer is operable to quench the excited state energy.
22. The cosmetic or dermatological composition according to claim 21 , wherein the cosmetic or dermatological composition comprises at least one block has a structure according to at least one of Formula IV:
wherein:
R 9 and Rio are independently C 1 -C 15 alkyl, and
E is selected from the group consisting of O and S;
wherein q is a number from 1 to 5,000;
wherein r is a number from 0 to 20.
23. The cosmetic or dermatological composition according to claim 21 , wherein the cosmetic or dermatological composition comprises at least one block having a structure according to one or more of
Formula V:
wherein:
F is selected from the group consisting of O and S;
wherein s is a number from 1 to 5,000;
wherein t is a number from 0 to 20; and
Formula VI:
wherein:
R 11 and R 12 are independently C 1 -C 15 alkyl, and
G is selected from the group consisting of O and S;
wherein u is a number from 1 to 5,000;
wherein v is a number from 0 to 20; and
wherein R 9 =R 10 , or R 11 =R 12 , but not both.