EMITTER COMPONENT WITH A REFLECTIVE LAYER, AND METHOD FOR PRODUCING SAME
In a known method for producing an emitter component with a reflector, a flowable aqueous SiO2 slip is produced using a slip method, and the slip is applied onto a quartz glass main part in the form of a slip layer. The slip layer is then dried and glazed, thereby forming a quartz glass layer which is more or less opaque and diffusely reflective. In order to produce an optical component with a reflective layer made of opaque quartz glass with increased reflective optical power, a method is proposed having the steps of: providing a main part with a surface which is at least partly coated with a reflective layer made of opaque glass, compressing a surface region of the reflective layer made of opaque glass, and applying a mirror-reflective layer on at least one part of the compressed surface region.
1 . A method for producing an emitter component with a reflector, including the method steps:
(a) providing a main part with a surface that is at least partly coated with a reflector layer made of opaque glass,
(b) compressing a surface region of the reflector layer made of opaque glass,
(c) applying a mirror-reflective reflector layer on at least one part of the compressed surface region.
2 . The method according to claim 1 , wherein the compressing of the surface region takes place by heating to a heating temperature of at least 1,100° C. during a heating period of at least 5 seconds.
3 . The method according to claim 1 , wherein that the mirror-reflective reflecting reflector layer is produced from a metal.
4 . Method according to claim 3 , wherein the mirror-reflective reflector layer is produced from a gold-containing metal or from gold, and has a layer thickness in the range of 50 to 300 nm.
5 . The method according to claim 1 , wherein the reflector layer is made of opaque glass having a thickness in the range of 0.5 mm to 2 mm.
6 . The method according to claim 5 , wherein, upon compression according to method step (b), a surface region is formed which has less than 50% of the thickness of the reflector layer made of opaque glass.
7 . The method according to claim 1 , wherein the provision of the main part according to method step (a) includes a measure in which an emitter component that is in use, with a reflector layer made of opaque glass, is dismantled and is reworked using the method steps (b) and (c).
8 . An emitter component having a main part whose surface is at least partly coated with a reflector, which reflector comprises an inner reflector layer made of at least partially opaque glass and an outer, mirror-reflective reflector layer, wherein a sealed glass film is arranged between the inner reflector layer and the outer reflector layer.
9 . The emitter component according to claim 8 , wherein the glass film has a thickness of less than 300 μm, preferably less than 150 μm.
10 . The emitter component according to claim 8 , wherein the mirror-reflective reflector layer consists of a metal, preferably of a gold-containing metal or of gold; and in that it has a layer thickness in the range of 50 to 300 nm.
11 . The emitter component according to claim 8 , wherein the reflector layer made from opaque glass is provided with a thickness in the range of 0.5 mm to 2 mm.
12 . The emitter component according to claim 8 , wherein the main part is designed as an enveloping body for receiving a radiation emitter, wherein the reflector is arranged on the outer side of the enveloping body, facing away from the radiation emitter; or in that the main part is designed as a tile-shaped radiation emitter, wherein the reflector is arranged on a plane side of the tile.