Method of manufacturing flexible substrate
According to one embodiment, a method of manufacturing a flexible substrate, includes forming a release layer on a glass substrate, forming an insulating base, forming a plurality of insulating layers, wiring lines and electrical elements, asking the release layer, the insulating base and the plurality of insulating layers from above to the glass substrate via a mask, forming an upper resin layer, removing the glass substrate and the release layer by peeling off an interface between the release layer and the insulating base and forming a lower resin layer so as to be in contact with a lower surface of the insulating base and a lower surface of the upper resin layer.
1. A method of manufacturing a flexible substrate, comprising:
forming a release layer on a glass substrate;
forming an insulating base on the release layer;
forming a plurality of insulating layers, wiring lines and electrical elements on the insulating base;
ashing the release layer, the insulating base and the plurality of insulating layers from above to the glass substrate via a mask;
forming an upper resin layer which covers the release layer, the insulating base, and the plurality of insulating layers;
removing the glass substrate and the release layer by peeling off at an interface between the release layer and the insulating base; and
forming a lower resin layer so as to be in contact with a lower surface of the insulating base and a lower surface of the upper resin layer.
2. The method of claim 1 , wherein
after removing the glass substrate and the release layer by peeling off at the interface between the release layer and the insulating base, residue of the release layer is maintained to be adhered to the lower surface of the insulating base.
3. The method of claim 1 , wherein
the release layer is formed of a silicon material.
4. A method of manufacturing a flexible substrate, comprising:
forming a release layer on a glass substrate;
forming a barrier layer on the release layer;
patterning the barrier layer;
forming an insulating base on the barrier layer and the release layer;
forming a plurality of insulating layers, wiring lines and electrical elements on the insulating base;
attaching a temporary film above the electrical elements;
removing the glass substrate and the release layer by peeling off at an interface between the release layer and the barrier layer;
etching the insulating base and the plurality of insulating layers from below to the temporary film by laser irradiation using the barrier layer as a mask;
forming a lower resin layer which covers the barrier layer, the insulating base and the plurality of insulating layers from below;
removing the temporary film; and
forming an upper resin layer so as to be in contact with an upper surface of the lower resin layer.
5. The method of claim 4 , wherein
after removing the glass substrate and the release layer by peeling off at the interface between the release layer and the barrier layer, residue of the release layer is maintained to be adhered to a lower surface of the barrier layer.
6. The method of claim 4 , wherein
the barrier layer is formed of any one of an inorganic material, an organic material and a metal material.
7. The method of claim 4 , wherein
the barrier layer absorbs less laser light than the insulating base.
8. The method of claim 4 , wherein
the release layer is formed of a silicon material.